CH500768A - Einrichtung zum Beschichten von Materialien durch kathodische Zerstäubung - Google Patents

Einrichtung zum Beschichten von Materialien durch kathodische Zerstäubung

Info

Publication number
CH500768A
CH500768A CH1625469A CH1625469A CH500768A CH 500768 A CH500768 A CH 500768A CH 1625469 A CH1625469 A CH 1625469A CH 1625469 A CH1625469 A CH 1625469A CH 500768 A CH500768 A CH 500768A
Authority
CH
Switzerland
Prior art keywords
coating materials
cathodic sputtering
cathodic
sputtering
coating
Prior art date
Application number
CH1625469A
Other languages
English (en)
Inventor
Andrew Bruch Charles
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of CH500768A publication Critical patent/CH500768A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
CH1625469A 1968-11-22 1969-10-31 Einrichtung zum Beschichten von Materialien durch kathodische Zerstäubung CH500768A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77815568A 1968-11-22 1968-11-22

Publications (1)

Publication Number Publication Date
CH500768A true CH500768A (de) 1970-12-31

Family

ID=25112461

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1625469A CH500768A (de) 1968-11-22 1969-10-31 Einrichtung zum Beschichten von Materialien durch kathodische Zerstäubung

Country Status (5)

Country Link
US (1) US3594301A (de)
CH (1) CH500768A (de)
DE (1) DE1956761A1 (de)
FR (1) FR2023919A1 (de)
NL (1) NL6917456A (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4938858A (en) * 1989-04-14 1990-07-03 Leybold Aktiengesellschaft Cathode sputtering system
US4943363A (en) * 1989-04-14 1990-07-24 Leybold Aktiengesellschaft Cathode sputtering system
US4984531A (en) * 1989-04-14 1991-01-15 Leybold Aktiengesellschaft Device for accepting and holding a workpiece in vacuum coating apparatus

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2098563A5 (de) * 1970-07-10 1972-03-10 Progil
US4049533A (en) * 1975-09-10 1977-09-20 Golyanov Vyacheslav Mikhailovi Device for producing coatings by means of ion sputtering
CH611938A5 (de) * 1976-05-19 1979-06-29 Battelle Memorial Institute
US4137142A (en) * 1977-12-27 1979-01-30 Stork Brabant B.V. Method and apparatus for sputtering photoconductive coating on endless flexible belts or cylinders
CA2123479C (en) * 1993-07-01 1999-07-06 Peter A. Sieck Anode structure for magnetron sputtering systems
US5415753A (en) * 1993-07-22 1995-05-16 Materials Research Corporation Stationary aperture plate for reactive sputter deposition
US6264812B1 (en) * 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
US6368469B1 (en) 1996-05-09 2002-04-09 Applied Materials, Inc. Coils for generating a plasma and for sputtering
KR100489918B1 (ko) * 1996-05-09 2005-08-04 어플라이드 머티어리얼스, 인코포레이티드 플라즈마발생및스퍼터링용코일
US6254746B1 (en) 1996-05-09 2001-07-03 Applied Materials, Inc. Recessed coil for generating a plasma
US6231725B1 (en) 1998-08-04 2001-05-15 Applied Materials, Inc. Apparatus for sputtering material onto a workpiece with the aid of a plasma
US6238528B1 (en) 1998-10-13 2001-05-29 Applied Materials, Inc. Plasma density modulator for improved plasma density uniformity and thickness uniformity in an ionized metal plasma source
US6409890B1 (en) 1999-07-27 2002-06-25 Applied Materials, Inc. Method and apparatus for forming a uniform layer on a workpiece during sputtering
DE102006020004B4 (de) * 2006-04-26 2011-06-01 Systec System- Und Anlagentechnik Gmbh & Co.Kg Vorrichtung und Verfahren zur homogenen PVD-Beschichtung

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4938858A (en) * 1989-04-14 1990-07-03 Leybold Aktiengesellschaft Cathode sputtering system
US4943363A (en) * 1989-04-14 1990-07-24 Leybold Aktiengesellschaft Cathode sputtering system
DE3912295A1 (de) * 1989-04-14 1990-10-18 Leybold Ag Katodenzerstaeubungsanlage
DE3912297A1 (de) * 1989-04-14 1990-10-18 Leybold Ag Katodenzerstaeubungsanlage
US4984531A (en) * 1989-04-14 1991-01-15 Leybold Aktiengesellschaft Device for accepting and holding a workpiece in vacuum coating apparatus

Also Published As

Publication number Publication date
DE1956761A1 (de) 1970-06-18
FR2023919A1 (de) 1970-08-21
NL6917456A (de) 1970-05-26
US3594301A (en) 1971-07-20

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Legal Events

Date Code Title Description
PL Patent ceased