CH494416A - Verfahren zur Herstellung von Metallisierungsmustern - Google Patents

Verfahren zur Herstellung von Metallisierungsmustern

Info

Publication number
CH494416A
CH494416A CH1175568A CH1175568A CH494416A CH 494416 A CH494416 A CH 494416A CH 1175568 A CH1175568 A CH 1175568A CH 1175568 A CH1175568 A CH 1175568A CH 494416 A CH494416 A CH 494416A
Authority
CH
Switzerland
Prior art keywords
production
metallization patterns
metallization
patterns
Prior art date
Application number
CH1175568A
Other languages
English (en)
Inventor
Albert Bertrand
Bochard Francois
Coquard Jacques
Lenoble Jean-Paul
Norture Roger
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of CH494416A publication Critical patent/CH494416A/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1603—Process or apparatus coating on selected surface areas
    • C23C18/1605—Process or apparatus coating on selected surface areas by masking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/62—Metal compounds reducible to metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CH1175568A 1967-08-16 1968-08-07 Verfahren zur Herstellung von Metallisierungsmustern CH494416A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR6008645A FR1548401A (de) 1967-08-16 1967-08-16

Publications (1)

Publication Number Publication Date
CH494416A true CH494416A (de) 1970-07-31

Family

ID=8970608

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1175568A CH494416A (de) 1967-08-16 1968-08-07 Verfahren zur Herstellung von Metallisierungsmustern

Country Status (7)

Country Link
US (1) US3615471A (de)
BE (1) BE718674A (de)
CH (1) CH494416A (de)
DE (1) DE1765942A1 (de)
FR (1) FR1548401A (de)
GB (1) GB1232883A (de)
NL (1) NL6810219A (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3839039A (en) * 1969-11-18 1974-10-01 Fuji Photo Optical Co Ltd Process for producing color stripe filter
US3900320A (en) * 1971-09-30 1975-08-19 Bell & Howell Co Activation method for electroless plating
DE2635457C2 (de) * 1976-08-04 1985-06-05 Schering AG, 1000 Berlin und 4709 Bergkamen Katalytischer Lack und seine Verwendung zur Herstellung von gedruckten Schaltungen
US4107351A (en) * 1976-10-15 1978-08-15 Rca Corporation Method of depositing or repairing a patterned metal layer on a substrate
US4054479A (en) * 1976-12-22 1977-10-18 E. I. Du Pont De Nemours And Company Additive process for producing printed circuit elements using a self-supported photosensitive sheet
DE2728465C2 (de) * 1977-06-24 1982-04-22 Preh, Elektrofeinmechanische Werke, Jakob Preh, Nachf. Gmbh & Co, 8740 Bad Neustadt Gedruckte Schaltung
US4157407A (en) * 1978-02-13 1979-06-05 E. I. Du Pont De Nemours And Company Toning and solvent washout process for making conductive interconnections
JPS6318692A (ja) * 1986-07-11 1988-01-26 日立化成工業株式会社 印刷配線板の製造方法
US4910072A (en) * 1986-11-07 1990-03-20 Monsanto Company Selective catalytic activation of polymeric films
US5075037A (en) * 1986-11-07 1991-12-24 Monsanto Company Selective catalytic activation of polymeric films
US5631753A (en) * 1991-06-28 1997-05-20 Dai Nippon Printing Co., Ltd. Black matrix base board and manufacturing method therefor, and liquid crystal display panel and manufacturing method therefor
US5382483A (en) * 1992-01-13 1995-01-17 International Business Machines Corporation Self-aligned phase-shifting mask
US5424009A (en) * 1994-05-24 1995-06-13 Monsanto Company Catalytic, crosslinked polymeric films for electroless deposition of metal
DE602004009595T2 (de) * 2003-08-19 2008-07-24 Mallinckrodt Baker, Inc. Ablös- und reinigungszusammensetzungen für die mikroelektronik
US7833695B2 (en) 2007-05-31 2010-11-16 Corning Incorporated Methods of fabricating metal contact structures for laser diodes using backside UV exposure
WO2016159974A1 (en) * 2015-03-31 2016-10-06 Uni-Pixel Displays, Inc. Catalytic photoresist for photolithographic metal mesh touch sensor fabrication

Also Published As

Publication number Publication date
DE1765942A1 (de) 1972-01-13
BE718674A (de) 1968-12-31
US3615471A (en) 1971-10-26
FR1548401A (de) 1968-12-06
GB1232883A (de) 1971-05-19
NL6810219A (de) 1969-02-18

Similar Documents

Publication Publication Date Title
CH498825A (de) Verfahren zur Herstellung von 2-C-Methyl-nukleosiden
CH526600A (de) Verfahren zur Herstellung von Polyimiden
AT275491B (de) Verfahren zur Herstellung von Cabonsäuren
AT306765B (de) Verfahren zur Herstellung von Ferrovanadin
CH494416A (de) Verfahren zur Herstellung von Metallisierungsmustern
CH507999A (de) Verfahren zur Herstellung von Blockcopolyestern
CH554365A (de) Verfahren zur herstellung von 5-chromenolaethern.
AT278846B (de) Verfahren zur kontinuierlichen Herstellung von Isobutylidendiharnstoff
CH507326A (de) Verfahren zur Herstellung von Poly-e-caproamid
CH507998A (de) Verfahren zur Herstellung von Blockcopolyestern
AT281286B (de) Verfahren zur Herstellung von therapeutischen Wirkstoffen
CH479636A (de) Verfahren zur Herstellung von Copolymerisaten
CH469091A (de) Verfahren zur Herstellung von Enduracidin
CH555800A (de) Verfahren zur herstellung von naphthylisopropylaminen.
CH506602A (de) Verfahren zur Herstellung von Farbstoffen
CH482211A (de) Verfahren zur Herstellung von Hologrammen
CH496731A (de) Verfahren zur Herstellung von Penicillinen
CH485002A (de) Verfahren zur Herstellung von Farbstoffen
CH514528A (de) Verfahren zur Herstellung von Aldehyden
AT277140B (de) Verfahren zur Herstellung von Vliesstoffen
CH499461A (de) Verfahren zur Herstellung von Dicyan
AT315477B (de) Verfahren zur Herstellung von Formkörpern
AT311072B (de) Verfahren zur Herstellung von Vliesstoffen
AT294417B (de) Verfahren zur Herstellung von unvernetzten Terpolymerisaten
AT283591B (de) Verfahren zur Herstellung von Penicillinen

Legal Events

Date Code Title Description
PL Patent ceased