CH472698A - Lichtempfindlicher Lack - Google Patents

Lichtempfindlicher Lack

Info

Publication number
CH472698A
CH472698A CH1431765A CH1431765A CH472698A CH 472698 A CH472698 A CH 472698A CH 1431765 A CH1431765 A CH 1431765A CH 1431765 A CH1431765 A CH 1431765A CH 472698 A CH472698 A CH 472698A
Authority
CH
Switzerland
Prior art keywords
photosensitive paint
photosensitive
paint
Prior art date
Application number
CH1431765A
Other languages
English (en)
Inventor
Nicolaas Van Der Sand Cornelis
Johannes Veenendaal Hendrikes
Tjalke Boersma Theo
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH472698A publication Critical patent/CH472698A/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CH1431765A 1964-10-20 1965-10-18 Lichtempfindlicher Lack CH472698A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6412172A NL6412172A (de) 1964-10-20 1964-10-20

Publications (1)

Publication Number Publication Date
CH472698A true CH472698A (de) 1969-05-15

Family

ID=19791281

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1431765A CH472698A (de) 1964-10-20 1965-10-18 Lichtempfindlicher Lack

Country Status (9)

Country Link
US (1) US3471294A (de)
AT (1) AT262057B (de)
BE (1) BE671173A (de)
CH (1) CH472698A (de)
DE (1) DE1572219C3 (de)
ES (1) ES318623A1 (de)
GB (1) GB1122008A (de)
NL (1) NL6412172A (de)
SE (1) SE316370B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6605244A (de) * 1966-04-20 1967-10-23
US3652273A (en) * 1967-09-11 1972-03-28 Ibm Process using polyvinyl butral topcoat on photoresist layer
US4556626A (en) * 1983-08-24 1985-12-03 North American Philips Consumer Electronics Corporation Negative-working dichromate photoresist composition, process for applying it to a polymethyl methacrylate surface, and article produced
US4647519A (en) * 1983-08-24 1987-03-03 North American Philips Consumer Electronics Corp. Negative-working photoresist method of making rear-projection television screen viewing surface

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE395286A (de) * 1933-03-25
NL83171C (de) * 1952-11-29
GB1058690A (en) * 1964-01-22 1967-02-15 Powers Chemco Inc Photosensitive resist and coatings

Also Published As

Publication number Publication date
GB1122008A (en) 1968-07-31
SE316370B (de) 1969-10-20
US3471294A (en) 1969-10-07
DE1572219C3 (de) 1975-09-11
NL6412172A (de) 1966-04-21
DE1572219B2 (de) 1975-02-06
ES318623A1 (es) 1966-05-16
DE1572219A1 (de) 1970-01-08
BE671173A (de) 1966-04-20
AT262057B (de) 1968-05-27

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Legal Events

Date Code Title Description
PL Patent ceased