CH472116A - Method and device for producing a resist pattern on a semiconductor body - Google Patents

Method and device for producing a resist pattern on a semiconductor body

Info

Publication number
CH472116A
CH472116A CH637468A CH637468A CH472116A CH 472116 A CH472116 A CH 472116A CH 637468 A CH637468 A CH 637468A CH 637468 A CH637468 A CH 637468A CH 472116 A CH472116 A CH 472116A
Authority
CH
Switzerland
Prior art keywords
producing
resist pattern
semiconductor body
semiconductor
resist
Prior art date
Application number
CH637468A
Other languages
German (de)
Inventor
Emeis Reimer Dr Dipl-Phys
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Priority to CH637468A priority Critical patent/CH472116A/en
Priority to DE19681814408 priority patent/DE1814408A1/en
Priority to JP3323369A priority patent/JPS5021234B1/ja
Publication of CH472116A publication Critical patent/CH472116A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Die Bonding (AREA)
CH637468A 1968-04-29 1968-04-29 Method and device for producing a resist pattern on a semiconductor body CH472116A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CH637468A CH472116A (en) 1968-04-29 1968-04-29 Method and device for producing a resist pattern on a semiconductor body
DE19681814408 DE1814408A1 (en) 1968-04-29 1968-12-13 Method and device for producing a resist pattern on a semiconductor body
JP3323369A JPS5021234B1 (en) 1968-04-29 1969-04-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH637468A CH472116A (en) 1968-04-29 1968-04-29 Method and device for producing a resist pattern on a semiconductor body

Publications (1)

Publication Number Publication Date
CH472116A true CH472116A (en) 1969-04-30

Family

ID=4308573

Family Applications (1)

Application Number Title Priority Date Filing Date
CH637468A CH472116A (en) 1968-04-29 1968-04-29 Method and device for producing a resist pattern on a semiconductor body

Country Status (3)

Country Link
JP (1) JPS5021234B1 (en)
CH (1) CH472116A (en)
DE (1) DE1814408A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54180547U (en) * 1978-06-12 1979-12-20
JP6614554B2 (en) 2016-11-15 2019-12-04 株式会社スギノマシン Nozzle cleaning method and nozzle cleaning structure of atomizer

Also Published As

Publication number Publication date
JPS5021234B1 (en) 1975-07-21
DE1814408A1 (en) 1969-11-06

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Legal Events

Date Code Title Description
PL Patent ceased