CH467873A - Method and device for obtaining thin films containing a metal oxide - Google Patents

Method and device for obtaining thin films containing a metal oxide

Info

Publication number
CH467873A
CH467873A CH1859066A CH1859066A CH467873A CH 467873 A CH467873 A CH 467873A CH 1859066 A CH1859066 A CH 1859066A CH 1859066 A CH1859066 A CH 1859066A CH 467873 A CH467873 A CH 467873A
Authority
CH
Switzerland
Prior art keywords
metal oxide
thin films
films containing
obtaining thin
obtaining
Prior art date
Application number
CH1859066A
Other languages
French (fr)
Inventor
Melnick Igor
Pruniaux Bernard
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Publication of CH467873A publication Critical patent/CH467873A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CH1859066A 1966-01-18 1966-12-27 Method and device for obtaining thin films containing a metal oxide CH467873A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR46341 1966-01-18

Publications (1)

Publication Number Publication Date
CH467873A true CH467873A (en) 1969-01-31

Family

ID=8599048

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1859066A CH467873A (en) 1966-01-18 1966-12-27 Method and device for obtaining thin films containing a metal oxide

Country Status (5)

Country Link
BE (1) BE691418A (en)
CH (1) CH467873A (en)
ES (1) ES335297A1 (en)
GB (1) GB1148188A (en)
LU (1) LU52832A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2308921A1 (en) * 1975-04-25 1976-11-19 Anvar Strain gauge with high mechanical strength - consists of steel substrate, alumina insulating layer and a metal layer
DE3627151A1 (en) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg METHOD AND DEVICE FOR REACTIVELY EVAPORATING METAL COMPOUNDS

Also Published As

Publication number Publication date
ES335297A1 (en) 1968-08-16
BE691418A (en) 1967-05-29
LU52832A1 (en) 1967-03-17
GB1148188A (en) 1969-04-10

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