CH465081A - Verfahren zur Herstellung von Schichten aus den zweikomponentigen supraleitenden intermetallischen Verbindungen Vanadium-Gallium bzw. Niob-Gallium - Google Patents
Verfahren zur Herstellung von Schichten aus den zweikomponentigen supraleitenden intermetallischen Verbindungen Vanadium-Gallium bzw. Niob-GalliumInfo
- Publication number
- CH465081A CH465081A CH1187566A CH1187566A CH465081A CH 465081 A CH465081 A CH 465081A CH 1187566 A CH1187566 A CH 1187566A CH 1187566 A CH1187566 A CH 1187566A CH 465081 A CH465081 A CH 465081A
- Authority
- CH
- Switzerland
- Prior art keywords
- gallium
- niobium
- layers
- production
- intermetallic compounds
- Prior art date
Links
- BPAABJIBIBFRST-UHFFFAOYSA-N [V].[V].[V].[Ga] Chemical compound [V].[V].[V].[Ga] BPAABJIBIBFRST-UHFFFAOYSA-N 0.000 title 1
- 229910052733 gallium Inorganic materials 0.000 title 1
- 229910000765 intermetallic Inorganic materials 0.000 title 1
- 229910000999 vanadium-gallium Inorganic materials 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0184—Manufacture or treatment of devices comprising intermetallic compounds of type A-15, e.g. Nb3Sn
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES0098971 | 1965-08-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH465081A true CH465081A (de) | 1968-11-15 |
Family
ID=7521876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1187566A CH465081A (de) | 1965-08-21 | 1966-08-18 | Verfahren zur Herstellung von Schichten aus den zweikomponentigen supraleitenden intermetallischen Verbindungen Vanadium-Gallium bzw. Niob-Gallium |
Country Status (4)
| Country | Link |
|---|---|
| AT (1) | AT264246B (de) |
| CH (1) | CH465081A (de) |
| GB (1) | GB1085050A (de) |
| NL (1) | NL6611724A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3731374A (en) * | 1971-07-20 | 1973-05-08 | Atomic Energy Commission | Method of fabricating a hard intermetallic superconductor by means of diffusion |
| US4272355A (en) * | 1980-02-26 | 1981-06-09 | International Business Machines Corporation | Process of bonding sputtering targets to target electrodes |
| GB2177119B (en) * | 1985-06-26 | 1989-04-26 | Plessey Co Plc | Organometallic chemical vapour deposition |
| WO2002086188A1 (en) * | 2001-04-20 | 2002-10-31 | N.V. Bekaert S.A. | Apparatus and method for the deposition of metal or metal oxide coatings on an elongated substrate |
-
1966
- 1966-07-27 AT AT719066A patent/AT264246B/de active
- 1966-08-18 CH CH1187566A patent/CH465081A/de unknown
- 1966-08-19 NL NL6611724A patent/NL6611724A/xx unknown
- 1966-08-22 GB GB37599/66A patent/GB1085050A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AT264246B (de) | 1968-08-26 |
| NL6611724A (de) | 1967-02-22 |
| GB1085050A (en) | 1967-09-27 |
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