CH454614A - Photosensitive material - Google Patents

Photosensitive material

Info

Publication number
CH454614A
CH454614A CH847165A CH847165A CH454614A CH 454614 A CH454614 A CH 454614A CH 847165 A CH847165 A CH 847165A CH 847165 A CH847165 A CH 847165A CH 454614 A CH454614 A CH 454614A
Authority
CH
Switzerland
Prior art keywords
photosensitive material
photosensitive
Prior art date
Application number
CH847165A
Other languages
German (de)
Inventor
Wilhelm Dr Saleck
Karl Dr Dinges
Erwin Dr Mueller
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of CH454614A publication Critical patent/CH454614A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52—Amides or imides
    • C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F20/58—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-acryloylmorpholine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CH847165A 1964-07-04 1965-06-17 Photosensitive material CH454614A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEA0046506 1964-07-04

Publications (1)

Publication Number Publication Date
CH454614A true CH454614A (en) 1968-04-15

Family

ID=6935281

Family Applications (1)

Application Number Title Priority Date Filing Date
CH847165A CH454614A (en) 1964-07-04 1965-06-17 Photosensitive material

Country Status (5)

Country Link
US (1) US3408199A (en)
BE (1) BE666067A (en)
CH (1) CH454614A (en)
GB (1) GB1069944A (en)
NL (1) NL6508535A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1101409A (en) * 1965-06-01 1968-01-31 Fuji Photo Film Co Ltd Improvements in and relating to photographic light sensitive materials
BE790872A (en) * 1971-11-08 1973-05-03 Agfa Gevaert Nv DEVELOPMENT TREATMENT OF PHOTOGRAPHIC SILVER HALOGENIDE MATERIALS AT HIGH TEMPERATURES
JPS4993013A (en) * 1973-01-08 1974-09-04

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2593888A (en) * 1945-10-16 1952-04-22 Gen Aniline & Film Corp Production of hydroxyalkyl amides of acrylic acids
US2533166A (en) * 1945-10-16 1950-12-05 Gen Aniline & Film Corp Process for polymerizing watersoluble polyacrylamides and poly-alpha-substituted acrylamides
US3069263A (en) * 1958-12-17 1962-12-18 Polaroid Corp Photographic products and processes using alkali permeable polymeric layers
BE620515A (en) * 1961-07-27
BE620658A (en) * 1961-07-27
US3341332A (en) * 1963-07-24 1967-09-12 Fuji Photo Film Co Ltd Light-sensitive photographic material containing polyalkenoylmorpholine

Also Published As

Publication number Publication date
GB1069944A (en) 1967-05-24
US3408199A (en) 1968-10-29
DE1447582A1 (en) 1969-05-29
DE1447582B2 (en) 1975-11-27
BE666067A (en) 1965-12-29
NL6508535A (en) 1965-12-27

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