CH448287A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- CH448287A CH448287A CH1016966A CH1016966A CH448287A CH 448287 A CH448287 A CH 448287A CH 1016966 A CH1016966 A CH 1016966A CH 1016966 A CH1016966 A CH 1016966A CH 448287 A CH448287 A CH 448287A
- Authority
- CH
- Switzerland
- Prior art keywords
- ion source
- ion
- source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/10—Duoplasmatrons ; Duopigatrons
- H01J27/12—Duoplasmatrons ; Duopigatrons provided with an expansion cup
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US475617A US3238414A (en) | 1965-07-28 | 1965-07-28 | High output duoplasmatron-type ion source |
Publications (1)
Publication Number | Publication Date |
---|---|
CH448287A true CH448287A (en) | 1967-12-15 |
Family
ID=23888380
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1016966A CH448287A (en) | 1965-07-28 | 1966-07-13 | Ion source |
Country Status (3)
Country | Link |
---|---|
US (1) | US3238414A (en) |
CH (1) | CH448287A (en) |
GB (1) | GB1101293A (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3340425A (en) * | 1966-08-31 | 1967-09-05 | George G Kelley | Ion generator having beam stabilization accelrating electrodes |
US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
US3458743A (en) * | 1966-12-19 | 1969-07-29 | Radiation Dynamics | Positive ion source for use with a duoplasmatron |
US3409529A (en) * | 1967-07-07 | 1968-11-05 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability |
US3513351A (en) * | 1968-06-26 | 1970-05-19 | Atomic Energy Commission | Duoplasmatron-type ion source including a gas reservoir |
FR2061809A5 (en) * | 1969-04-04 | 1971-06-25 | Commissariat Energie Atomique | |
FR2156978A5 (en) * | 1971-10-13 | 1973-06-01 | Anvar | |
US3740554A (en) * | 1972-04-13 | 1973-06-19 | Atomic Energy Commission | Multi-ampere duopigatron ion source |
USRE34806E (en) * | 1980-11-25 | 1994-12-13 | Celestech, Inc. | Magnetoplasmadynamic processor, applications thereof and methods |
US4714834A (en) * | 1984-05-09 | 1987-12-22 | Atomic Energy Of Canada, Limited | Method and apparatus for generating ion beams |
US20160133426A1 (en) * | 2013-06-12 | 2016-05-12 | General Plasma, Inc. | Linear duoplasmatron |
US9711318B2 (en) | 2013-12-20 | 2017-07-18 | Nicholas R. White | Ribbon beam ion source of arbitrary length |
CN108112153A (en) * | 2017-12-26 | 2018-06-01 | 兰州大学 | A kind of double-plasma ion source |
-
1965
- 1965-07-28 US US475617A patent/US3238414A/en not_active Expired - Lifetime
-
1966
- 1966-01-17 GB GB2040/66A patent/GB1101293A/en not_active Expired
- 1966-07-13 CH CH1016966A patent/CH448287A/en unknown
Also Published As
Publication number | Publication date |
---|---|
GB1101293A (en) | 1968-01-31 |
US3238414A (en) | 1966-03-01 |
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