CH434923A - Dispositivo per depositare sotto vuoto una pellicola metallica su corpi di supporto in materiale ceramico di piccole dimensioni - Google Patents

Dispositivo per depositare sotto vuoto una pellicola metallica su corpi di supporto in materiale ceramico di piccole dimensioni

Info

Publication number
CH434923A
CH434923A CH727666A CH727666A CH434923A CH 434923 A CH434923 A CH 434923A CH 727666 A CH727666 A CH 727666A CH 727666 A CH727666 A CH 727666A CH 434923 A CH434923 A CH 434923A
Authority
CH
Switzerland
Prior art keywords
metal film
support bodies
ceramic support
vacuum depositing
small ceramic
Prior art date
Application number
CH727666A
Other languages
English (en)
Italian (it)
Inventor
Tassara Luigi
Original Assignee
Elettronica Metal Lux S P A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elettronica Metal Lux S P A filed Critical Elettronica Metal Lux S P A
Publication of CH434923A publication Critical patent/CH434923A/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by vapour deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
CH727666A 1965-05-24 1966-05-17 Dispositivo per depositare sotto vuoto una pellicola metallica su corpi di supporto in materiale ceramico di piccole dimensioni CH434923A (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT1152765 1965-05-24

Publications (1)

Publication Number Publication Date
CH434923A true CH434923A (it) 1967-04-30

Family

ID=11135419

Family Applications (1)

Application Number Title Priority Date Filing Date
CH727666A CH434923A (it) 1965-05-24 1966-05-17 Dispositivo per depositare sotto vuoto una pellicola metallica su corpi di supporto in materiale ceramico di piccole dimensioni

Country Status (2)

Country Link
CH (1) CH434923A (cs)
NL (1) NL6607042A (cs)

Also Published As

Publication number Publication date
NL6607042A (cs) 1966-11-25

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