CH427502A - Procédé de fabrication d'une plaque photosensible - Google Patents

Procédé de fabrication d'une plaque photosensible

Info

Publication number
CH427502A
CH427502A CH1358663A CH1358663A CH427502A CH 427502 A CH427502 A CH 427502A CH 1358663 A CH1358663 A CH 1358663A CH 1358663 A CH1358663 A CH 1358663A CH 427502 A CH427502 A CH 427502A
Authority
CH
Switzerland
Prior art keywords
manufacturing process
photosensitive plate
photosensitive
plate
manufacturing
Prior art date
Application number
CH1358663A
Other languages
English (en)
Inventor
Yves Coutaud Germain
Armand Facquet Louis
Rene Lehmann Leon
Joseph Schuh Harry Andre
Original Assignee
Nobel Bozel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nobel Bozel filed Critical Nobel Bozel
Publication of CH427502A publication Critical patent/CH427502A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D271/00—Heterocyclic compounds containing five-membered rings having two nitrogen atoms and one oxygen atom as the only ring hetero atoms
    • C07D271/12—Heterocyclic compounds containing five-membered rings having two nitrogen atoms and one oxygen atom as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CH1358663A 1962-12-14 1963-11-05 Procédé de fabrication d'une plaque photosensible CH427502A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR918720A FR1352192A (fr) 1962-12-14 1962-12-14 Couche photosensible pour plaques présensibilisées destinées à l'impression offset et aux câblages gravés pour circuits imprimés

Publications (1)

Publication Number Publication Date
CH427502A true CH427502A (fr) 1966-12-31

Family

ID=8792933

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1358663A CH427502A (fr) 1962-12-14 1963-11-05 Procédé de fabrication d'une plaque photosensible

Country Status (9)

Country Link
US (1) US3288608A (fr)
BE (1) BE639500A (fr)
CH (1) CH427502A (fr)
DE (1) DE1447024C3 (fr)
ES (1) ES293875A1 (fr)
FR (1) FR1352192A (fr)
GB (1) GB1072685A (fr)
LU (1) LU44760A1 (fr)
NL (1) NL301574A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
ZA6705261B (fr) * 1966-09-02
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
US4379827A (en) * 1971-12-08 1983-04-12 Energy Conversion Devices, Inc. Imaging structure with tellurium metal film and energy sensitive material thereon
DE2558812C2 (de) * 1975-12-27 1987-04-30 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares Gemisch
CN104974107A (zh) * 2015-05-03 2015-10-14 上虞日月星科技化学有限公司 一种重氮萘醌感光材料中间体及其制备方法

Also Published As

Publication number Publication date
US3288608A (en) 1966-11-29
DE1447024C3 (de) 1978-03-09
FR1352192A (fr) 1964-02-14
DE1447024B2 (de) 1977-07-14
GB1072685A (en) 1967-06-21
ES293875A1 (es) 1964-03-01
LU44760A1 (fr) 1964-05-06
DE1447024A1 (de) 1968-10-24
BE639500A (fr)
NL301574A (fr)

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