CH370967A - Lichtempfindliches Material - Google Patents

Lichtempfindliches Material

Info

Publication number
CH370967A
CH370967A CH6171958A CH6171958A CH370967A CH 370967 A CH370967 A CH 370967A CH 6171958 A CH6171958 A CH 6171958A CH 6171958 A CH6171958 A CH 6171958A CH 370967 A CH370967 A CH 370967A
Authority
CH
Switzerland
Prior art keywords
photosensitive material
photosensitive
Prior art date
Application number
CH6171958A
Other languages
German (de)
English (en)
Inventor
Wilhelm Dr Neugebauer
Oskar Dr Sues
Hans-Reiner Dr Stumpf
Original Assignee
Kalle & Co Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle & Co Ag filed Critical Kalle & Co Ag
Publication of CH370967A publication Critical patent/CH370967A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
CH6171958A 1957-08-01 1958-07-14 Lichtempfindliches Material CH370967A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK32598A DE1053930B (de) 1957-08-01 1957-08-01 Lichtempfindliches Material fuer die Herstellung von Druckplatten auf photomechanischem Wege

Publications (1)

Publication Number Publication Date
CH370967A true CH370967A (de) 1963-07-31

Family

ID=7219491

Family Applications (1)

Application Number Title Priority Date Filing Date
CH6171958A CH370967A (de) 1957-08-01 1958-07-14 Lichtempfindliches Material

Country Status (8)

Country Link
US (1) US3050387A (h)
BE (1) BE569763A (h)
CH (1) CH370967A (h)
DE (1) DE1053930B (h)
FR (1) FR1210042A (h)
GB (1) GB836341A (h)
NL (2) NL230099A (h)
SE (1) SE310842B (h)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130712C (h) * 1959-07-29
NL130926C (h) * 1959-09-04
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
NL132291C (h) * 1961-01-25
NL280959A (h) * 1961-07-28
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
DE58908411D1 (de) * 1989-03-20 1994-10-27 Siemens Ag Hochauflösender Photoresist.
DE58908699D1 (de) * 1989-03-20 1995-01-12 Siemens Ag Verfahren zum Erzeugen einer Photoresiststruktur.
US5212042A (en) * 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1981102A (en) * 1932-08-10 1934-11-20 Agfa Ansco Corp Photographic material and process of making the same
CH307356A (de) * 1951-08-08 1955-05-31 Kalle & Co Ag Lichtempfindliches Material für die photomechanische Reproduktion.
US2754209A (en) * 1952-06-10 1956-07-10 Azoplate Corp Light-sensitive para quinone diazides for making printing plates
NL94867C (h) * 1955-02-25
DE1003576B (de) * 1955-02-25 1957-02-28 Kalle & Co Ag Aus Schichttraeger und lichtempfindlicher, wasserloeslicher oder wasserquellbarer Kolloidschicht bestehendes Material fuer die Herstellung von Gerbbildern

Also Published As

Publication number Publication date
BE569763A (h)
FR1210042A (fr) 1960-03-04
US3050387A (en) 1962-08-21
DE1053930B (de) 1959-03-26
SE310842B (h) 1969-05-12
NL230099A (h)
NL103895C (h)
GB836341A (en) 1960-06-01

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