CH366103A - Process for the surface treatment of semiconductor bodies - Google Patents

Process for the surface treatment of semiconductor bodies

Info

Publication number
CH366103A
CH366103A CH7173959A CH7173959A CH366103A CH 366103 A CH366103 A CH 366103A CH 7173959 A CH7173959 A CH 7173959A CH 7173959 A CH7173959 A CH 7173959A CH 366103 A CH366103 A CH 366103A
Authority
CH
Switzerland
Prior art keywords
surface treatment
semiconductor bodies
bodies
semiconductor
treatment
Prior art date
Application number
CH7173959A
Other languages
German (de)
Inventor
Plust Heinz-Guenther Dipl Chem
Weisshaar Erich Dipl-Phys Nat
Original Assignee
Bbc Brown Boveri & Cie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL121808D priority Critical patent/NL121808C/xx
Priority to NL249127D priority patent/NL249127A/xx
Application filed by Bbc Brown Boveri & Cie filed Critical Bbc Brown Boveri & Cie
Priority to CH7173959A priority patent/CH366103A/en
Priority to DEA31868A priority patent/DE1129795B/en
Priority to FR820376A priority patent/FR1256154A/en
Priority to BE589201A priority patent/BE589201A/en
Priority to GB12380/60A priority patent/GB878441A/en
Publication of CH366103A publication Critical patent/CH366103A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/32—Anodisation of semiconducting materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/12—Etching of semiconducting materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CH7173959A 1959-04-08 1959-04-08 Process for the surface treatment of semiconductor bodies CH366103A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
NL121808D NL121808C (en) 1959-04-08
NL249127D NL249127A (en) 1959-04-08
CH7173959A CH366103A (en) 1959-04-08 1959-04-08 Process for the surface treatment of semiconductor bodies
DEA31868A DE1129795B (en) 1959-04-08 1959-04-18 Process for the electrolytic surface treatment of semiconductor bodies made of silicon
FR820376A FR1256154A (en) 1959-04-08 1960-03-04 Process for the surface treatment of semiconductors
BE589201A BE589201A (en) 1959-04-08 1960-03-30 Process for the surface treatment of semiconductors.
GB12380/60A GB878441A (en) 1959-04-08 1960-04-07 Method of treating the surface of semi-conductor elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH7173959A CH366103A (en) 1959-04-08 1959-04-08 Process for the surface treatment of semiconductor bodies

Publications (1)

Publication Number Publication Date
CH366103A true CH366103A (en) 1962-12-15

Family

ID=4531245

Family Applications (1)

Application Number Title Priority Date Filing Date
CH7173959A CH366103A (en) 1959-04-08 1959-04-08 Process for the surface treatment of semiconductor bodies

Country Status (5)

Country Link
BE (1) BE589201A (en)
CH (1) CH366103A (en)
DE (1) DE1129795B (en)
GB (1) GB878441A (en)
NL (2) NL121808C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1556778A (en) * 1977-03-11 1979-11-28 Post Office Preparation of semiconductor surfaces

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2653085A (en) * 1952-08-09 1953-09-22 Westinghouse Electric Corp Etching solution and process

Also Published As

Publication number Publication date
BE589201A (en) 1960-07-18
NL121808C (en)
GB878441A (en) 1961-09-27
NL249127A (en)
DE1129795B (en) 1962-05-17

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