CH311827A - Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material. - Google Patents

Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material.

Info

Publication number
CH311827A
CH311827A CH311827DA CH311827A CH 311827 A CH311827 A CH 311827A CH 311827D A CH311827D A CH 311827DA CH 311827 A CH311827 A CH 311827A
Authority
CH
Switzerland
Prior art keywords
photosensitive material
material made
diazo compounds
diazo
compounds
Prior art date
Application number
Other languages
German (de)
English (en)
Inventor
Aktiengesellschaft Kalle Co
Original Assignee
Kalle & Co Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle & Co Ag filed Critical Kalle & Co Ag
Publication of CH311827A publication Critical patent/CH311827A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31844—Of natural gum, rosin, natural oil or lac

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CH311827D 1952-01-05 1953-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material. CH311827A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK12749A DE918848C (de) 1952-01-05 1952-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material

Publications (1)

Publication Number Publication Date
CH311827A true CH311827A (de) 1955-12-15

Family

ID=25793124

Family Applications (1)

Application Number Title Priority Date Filing Date
CH311827D CH311827A (de) 1952-01-05 1953-01-05 Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material.

Country Status (7)

Country Link
US (1) US3046131A (ja)
BE (1) BE516716A (ja)
CH (1) CH311827A (ja)
DE (1) DE918848C (ja)
FR (1) FR1069408A (ja)
GB (1) GB735129A (ja)
NL (1) NL77599C (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL77599C (ja) * 1952-01-05 1954-10-15
US3046114A (en) * 1955-03-01 1962-07-24 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
JPS5421089B2 (ja) * 1973-05-29 1979-07-27
JPS50125805A (ja) * 1974-03-19 1975-10-03
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material
US4093463A (en) * 1977-02-22 1978-06-06 Eastman Kodak Company Water soluble binder overcoat on vesicular element containing N2 -releasing agent
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4784936A (en) * 1985-10-24 1988-11-15 General Electric Company Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer
DE4040117C2 (de) * 1990-12-13 1994-02-17 Fotochem Werke Gmbh Stahlenempfindliches Material für die Elektronenstrahl- und Röntgenstrahllithographie und Verfahren zur Trockenentwicklung des Materials
US5506090A (en) * 1994-09-23 1996-04-09 Minnesota Mining And Manufacturing Company Process for making shoot and run printing plates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL70798C (ja) * 1948-10-15
NL80569C (ja) * 1949-07-23
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
NL77599C (ja) * 1952-01-05 1954-10-15

Also Published As

Publication number Publication date
NL77599C (ja) 1954-10-15
BE516716A (ja) 1900-01-01
DE918848C (de) 1954-10-07
US3046131A (en) 1962-07-24
FR1069408A (fr) 1954-07-07
GB735129A (en) 1955-08-17

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