CA994152A - Photoresist and method of making same - Google Patents

Photoresist and method of making same

Info

Publication number
CA994152A
CA994152A CA163,457A CA163457A CA994152A CA 994152 A CA994152 A CA 994152A CA 163457 A CA163457 A CA 163457A CA 994152 A CA994152 A CA 994152A
Authority
CA
Canada
Prior art keywords
photoresist
making same
making
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA163,457A
Other languages
English (en)
Other versions
CA163457S (en
Inventor
James M. Lewis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horizons Research Inc
Original Assignee
Horizons Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horizons Research Inc filed Critical Horizons Research Inc
Application granted granted Critical
Publication of CA994152A publication Critical patent/CA994152A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA163,457A 1972-02-09 1973-02-06 Photoresist and method of making same Expired CA994152A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22493972A 1972-02-09 1972-02-09

Publications (1)

Publication Number Publication Date
CA994152A true CA994152A (en) 1976-08-03

Family

ID=22842857

Family Applications (1)

Application Number Title Priority Date Filing Date
CA163,457A Expired CA994152A (en) 1972-02-09 1973-02-06 Photoresist and method of making same

Country Status (4)

Country Link
JP (1) JPS496914A (enExample)
CA (1) CA994152A (enExample)
DE (1) DE2306353A1 (enExample)
GB (1) GB1420351A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925077A (en) * 1974-03-01 1975-12-09 Horizons Inc Photoresist for holography and laser recording with bleachout dyes
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
CA1164710A (en) * 1978-05-09 1984-04-03 Edward J. Reardon, Jr. Phototropic photosensitive compositions containing fluoran colorformer
CA1153610A (en) * 1978-05-09 1983-09-13 Edward J. Reardon, Jr. Carbonylic halides as activators for phototropic compositions
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
JPS5569265A (en) * 1978-11-15 1980-05-24 Hitachi Ltd Pattern-forming method
JPS6057337A (ja) * 1983-09-07 1985-04-03 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JPS6080843A (ja) * 1983-10-08 1985-05-08 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物

Also Published As

Publication number Publication date
JPS496914A (enExample) 1974-01-22
DE2306353A1 (de) 1973-08-23
GB1420351A (en) 1976-01-07

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