CA991470A - Halation protection for multilayer imaging of photopolymers - Google Patents

Halation protection for multilayer imaging of photopolymers

Info

Publication number
CA991470A
CA991470A CA150,971A CA150971A CA991470A CA 991470 A CA991470 A CA 991470A CA 150971 A CA150971 A CA 150971A CA 991470 A CA991470 A CA 991470A
Authority
CA
Canada
Prior art keywords
photopolymers
multilayer imaging
halation protection
halation
protection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA150,971A
Other languages
English (en)
Inventor
Robert P. Held
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of CA991470A publication Critical patent/CA991470A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132—Anti-ultraviolet fading

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CA150,971A 1972-06-09 1972-09-05 Halation protection for multilayer imaging of photopolymers Expired CA991470A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00261204A US3854950A (en) 1972-06-09 1972-06-09 Halation protection for multilayer imaging of photopolymers

Publications (1)

Publication Number Publication Date
CA991470A true CA991470A (en) 1976-06-22

Family

ID=22992325

Family Applications (1)

Application Number Title Priority Date Filing Date
CA150,971A Expired CA991470A (en) 1972-06-09 1972-09-05 Halation protection for multilayer imaging of photopolymers

Country Status (8)

Country Link
US (1) US3854950A (xx)
JP (1) JPS5443369B2 (xx)
AU (1) AU462190B2 (xx)
BE (1) BE788560A (xx)
CA (1) CA991470A (xx)
DE (1) DE2243182C3 (xx)
GB (1) GB1398104A (xx)
ZA (1) ZA725771B (xx)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2660921C3 (de) * 1975-11-17 1987-07-30 E.I. Du Pont De Nemours And Co., Wilmington, Del. Verfahren zur Herstellung von punktgeätzten Masken
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4124384A (en) * 1977-02-07 1978-11-07 E. I. Du Pont De Nemours And Company Image reproduction process using sublimable colorants and photohardenable layers
US4226981A (en) * 1977-09-28 1980-10-07 Shin-Etsu Chemical Co., Ltd. Ether-ester derivatives of cellulose and their applications
US4311773A (en) * 1979-02-28 1982-01-19 Hitachi, Ltd. Method of producing color filters
US4326010A (en) * 1979-06-15 1982-04-20 E. I. Du Pont De Nemours And Company Additive in a photopolymerizable composition for reducing its adhesion to a support film
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
GB8414867D0 (en) * 1984-06-11 1984-07-18 Minnesota Mining & Mfg Pre-press proofing system
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
US4684688A (en) * 1986-08-25 1987-08-04 Gaf Corporation UV stabilizer for polyacetylenic recording media
DE3842781A1 (de) * 1987-12-18 1989-06-29 Konishiroku Photo Ind Verfahren und vorrichtung zur herstellung von farbprobeabzuegen
USRE35537E (en) * 1987-12-18 1997-06-17 Konica Corporation Method and apparatus for forming color proof
US4869993A (en) * 1988-08-29 1989-09-26 Wahib Farahat Optical brightener containing positive working color proofing system
JPH0341106A (ja) * 1989-07-10 1991-02-21 Denki Kagaku Kogyo Kk 光硬化性樹脂組成物及びガラス積層体
US5112721A (en) * 1990-01-29 1992-05-12 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing sensitizer mixtures
US5578412A (en) * 1994-12-20 1996-11-26 E. I. Dupont De Nemours And Company Photosensitive films having a thermally sensitive material containing layer and process for using the same
US5707781A (en) * 1995-05-05 1998-01-13 Bayer Corporation Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner
US6166852A (en) * 1997-10-04 2000-12-26 Film Technologies International, Inc. Window film with optical brightener
US20030186165A1 (en) * 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
DE102004030019A1 (de) * 2004-06-22 2006-01-19 Xetos Ag Photopolymerisierbare Zusammensetzung
US20060154180A1 (en) * 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
US7846639B2 (en) * 2006-06-30 2010-12-07 E. I. Du Pont De Nemours And Company Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element
CN101034257B (zh) * 2007-04-06 2010-09-08 上海复旦天臣新技术有限公司 用于全息记录的感光薄膜及其制备方法
EP3508924B1 (en) * 2016-08-30 2022-05-04 Sony Group Corporation Photosensitive composition for hologram recording, hologram recording medium, and hologram
ES2955365T3 (es) 2021-02-11 2023-11-30 Xetos Ag Composición fotopolimerizable
EP4043961B1 (de) 2021-02-11 2023-08-16 Xetos AG 2k-system
ES2969163T3 (es) 2021-02-11 2024-05-16 Xetos Ag Composición HOE fotopolimerizable
CN113705544B (zh) * 2021-10-28 2022-02-08 季华实验室 汽车内饰清洁方法、装置、电子设备及存储介质

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL219906A (xx) * 1956-08-14
US2948611A (en) * 1957-10-30 1960-08-09 Du Pont Photopolymerizable compositions, elements, and processes
BE579710A (xx) * 1958-06-16
BE592259A (xx) * 1959-06-26
NL132290C (xx) * 1959-09-11
BE596694A (xx) * 1959-11-03
BE604100A (xx) * 1960-06-03
DE1146752B (de) * 1960-11-16 1963-04-04 Agfa Ag Lichtschutzschicht bzw. Lichtschutzlack fuer farbenphotographische Bilder
US3307943A (en) * 1963-05-14 1967-03-07 Du Pont Image reproduction elements and processes
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3617287A (en) * 1967-08-30 1971-11-02 Du Pont Photopolymerizable elements containing a yellow dye
US3582327A (en) * 1968-01-31 1971-06-01 Du Pont Process for transferring particle images from photopolymerized image-bearing layers
US3649268A (en) * 1969-02-05 1972-03-14 Du Pont Process for forming images by photohardening and applying a colorant
JPS5512586B1 (xx) * 1971-03-11 1980-04-02

Also Published As

Publication number Publication date
AU462190B2 (en) 1975-06-19
BE788560A (fr) 1973-03-08
AU4646772A (en) 1974-03-14
JPS5443369B2 (xx) 1979-12-19
US3854950A (en) 1974-12-17
ZA725771B (en) 1974-04-24
DE2243182C3 (de) 1982-01-14
DE2243182A1 (de) 1973-12-20
GB1398104A (en) 1975-06-18
DE2243182B2 (de) 1978-05-11
JPS4933629A (xx) 1974-03-28

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