CA972167A - Abrasive polishing suspensions and method for making same - Google Patents

Abrasive polishing suspensions and method for making same

Info

Publication number
CA972167A
CA972167A CA166,932A CA166932A CA972167A CA 972167 A CA972167 A CA 972167A CA 166932 A CA166932 A CA 166932A CA 972167 A CA972167 A CA 972167A
Authority
CA
Canada
Prior art keywords
making same
abrasive polishing
polishing suspensions
suspensions
abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA166,932A
Other versions
CA166932S (en
Inventor
Paul J. Yancey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Application granted granted Critical
Publication of CA972167A publication Critical patent/CA972167A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
CA166,932A 1972-03-17 1973-03-14 Abrasive polishing suspensions and method for making same Expired CA972167A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00235651A US3817727A (en) 1972-03-17 1972-03-17 Abrasive polishing suspensions and method for making same

Publications (1)

Publication Number Publication Date
CA972167A true CA972167A (en) 1975-08-05

Family

ID=22886391

Family Applications (1)

Application Number Title Priority Date Filing Date
CA166,932A Expired CA972167A (en) 1972-03-17 1973-03-14 Abrasive polishing suspensions and method for making same

Country Status (4)

Country Link
US (1) US3817727A (en)
JP (1) JPS536755B2 (en)
CA (1) CA972167A (en)
FR (1) FR2176798B1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50144989A (en) * 1974-05-13 1975-11-21
JPS5131793A (en) * 1974-09-13 1976-03-18 Hitachi Chemical Co Ltd YUYOSEIFUENOORUHOKOZOKUHORUMUARUDEHITOJUSHI NO SEIHO
US4038048A (en) * 1975-02-14 1977-07-26 Thrower Jr Herbert T Lapping composition containing a carboxy vinyl polymer
FR2414071A1 (en) * 1978-01-05 1979-08-03 Essilor Int POLISHING MATERIAL, ESPECIALLY FOR OPHTHALMIC LENSES IN ORGANIC MATTER
US4260396A (en) * 1978-01-16 1981-04-07 W. R. Grace & Co. Compositions for polishing silicon and germanium
US4242842A (en) * 1979-08-08 1981-01-06 La Pierre Synthetique Baikowski, S.A. Precision polishing suspension and method for making same
US4358295A (en) * 1980-03-27 1982-11-09 Matsushita Electric Industrial Co., Ltd. Polishing method
RU2034889C1 (en) * 1993-04-02 1995-05-10 Научно-производственное объединение "Алтай" Composition for superfinishing honing surface of material
WO1996016436A1 (en) * 1994-11-18 1996-05-30 Advanced Micro Devices, Inc. Method of making a chemical-mechanical polishing slurry and the polishing slurry
DE19642908A1 (en) * 1996-10-17 1998-04-23 Wacker Siltronic Halbleitermat Sawing suspension and method for cutting wafers from a crystal
US5916855A (en) * 1997-03-26 1999-06-29 Advanced Micro Devices, Inc. Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films
US5855633A (en) * 1997-06-06 1999-01-05 Lockheed Martin Energy Systems, Inc. Lapping slurry
US7332457B2 (en) 2000-09-18 2008-02-19 Honeywell International Inc. Agricultural chemical suspensions
CN113718328B (en) * 2021-11-04 2022-02-11 山东裕航特种合金装备有限公司 Surface treatment method for aluminum alloy casting for ship

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2783137A (en) * 1951-06-08 1957-02-26 Dow Chemical Co Grinding compositions and making of same
US3053646A (en) * 1960-07-15 1962-09-11 Dow Chemical Co Grinding and polishing compositions and method of making same
BE616166A (en) * 1962-04-10

Also Published As

Publication number Publication date
DE2312372B2 (en) 1976-02-12
DE2312372A1 (en) 1973-09-20
JPS4913232A (en) 1974-02-05
FR2176798B1 (en) 1976-05-21
FR2176798A1 (en) 1973-11-02
US3817727A (en) 1974-06-18
JPS536755B2 (en) 1978-03-10

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