CA959145A - Electro-optical displacement sensor - Google Patents

Electro-optical displacement sensor

Info

Publication number
CA959145A
CA959145A CA075,012A CA75012A CA959145A CA 959145 A CA959145 A CA 959145A CA 75012 A CA75012 A CA 75012A CA 959145 A CA959145 A CA 959145A
Authority
CA
Canada
Prior art keywords
electro
displacement sensor
optical displacement
optical
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA075,012A
Other languages
English (en)
Inventor
Randolph D. House
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RTX Corp
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Application granted granted Critical
Publication of CA959145A publication Critical patent/CA959145A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F23/00—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm
    • G01F23/22—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water
    • G01F23/28—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water by measuring the variations of parameters of electromagnetic or acoustic waves applied directly to the liquid or fluent solid material
    • G01F23/284—Electromagnetic waves
    • G01F23/292—Light, e.g. infrared or ultraviolet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Electromagnetism (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Optical Distance (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CA075,012A 1969-03-13 1970-02-16 Electro-optical displacement sensor Expired CA959145A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80695669A 1969-03-13 1969-03-13

Publications (1)

Publication Number Publication Date
CA959145A true CA959145A (en) 1974-12-10

Family

ID=25195217

Family Applications (1)

Application Number Title Priority Date Filing Date
CA075,012A Expired CA959145A (en) 1969-03-13 1970-02-16 Electro-optical displacement sensor

Country Status (6)

Country Link
US (1) US3574650A (enrdf_load_stackoverflow)
CA (1) CA959145A (enrdf_load_stackoverflow)
DE (1) DE2012075A1 (enrdf_load_stackoverflow)
FR (1) FR2037794A5 (enrdf_load_stackoverflow)
GB (1) GB1294234A (enrdf_load_stackoverflow)
SE (1) SE366832B (enrdf_load_stackoverflow)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3740563A (en) * 1971-06-25 1973-06-19 Monsanto Co Electroptical system and method for sensing and controlling the diameter and melt level of pulled crystals
US3958129A (en) * 1974-08-05 1976-05-18 Motorola, Inc. Automatic crystal diameter control for growth of semiconductor crystals
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US4046100A (en) * 1975-10-20 1977-09-06 Trw Inc. Apparatus for thermal deposition of metal
DE2931199A1 (de) * 1979-08-01 1981-02-19 Endress Hauser Gmbh Co Anordnung zur messung des badspiegels in einer giessanlage, insbesondere in der kokille einer stranggiessanlage
FR2482290A1 (fr) * 1980-05-09 1981-11-13 Poncet Pierre Perfectionnements a la detection photoelectrique du niveau du bain dans les lingotieres de coulee continue
US4396005A (en) * 1981-07-06 1983-08-02 Corning Glass Works Solar collector and control
US4508970A (en) * 1982-07-15 1985-04-02 Motorola, Inc. Melt level sensing system and method
DE3336210C2 (de) * 1982-10-06 1986-04-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Verfahren und Vorrichtung zur Füllstandsmessung
DE3740227C2 (de) * 1987-11-27 1994-03-24 Schenck Ag Carl Verfahren und Vorrichtung zur Messung von Verformungen an Proben oder Prüfkörpern in Prüfmaschinen
DE3720303C2 (de) * 1987-06-19 1993-09-30 Schenck Ag Carl Probeneinspannvorrichtung für Prüfmaschinen
DE3720248A1 (de) * 1987-06-19 1989-01-05 Schenck Ag Carl Verfahren und anordnung zur messung von verformungen an proben oder pruefkoerpern in pruefmaschinen
US5746844A (en) * 1995-09-08 1998-05-05 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of molten metal and using a stress-reducing annealing process on the deposited metal
US5787965A (en) * 1995-09-08 1998-08-04 Aeroquip Corporation Apparatus for creating a free-form metal three-dimensional article using a layer-by-layer deposition of a molten metal in an evacuation chamber with inert environment
US5617911A (en) * 1995-09-08 1997-04-08 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a support material and a deposition material
US5718951A (en) * 1995-09-08 1998-02-17 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a molten metal and deposition of a powdered metal as a support material
US6342265B1 (en) * 1997-08-20 2002-01-29 Triumf Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
DE10040942A1 (de) * 2000-08-21 2002-03-07 Endress Hauser Gmbh Co Vorrichtung zur Bestimmung des Füllstands eines Füllguts in einem Behälter
US20080160171A1 (en) * 2006-12-29 2008-07-03 United Technologies Corporation Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
US20170072461A1 (en) * 2015-09-15 2017-03-16 Retech Systems Llc Laser sensor for melt control of hearth furnaces and the like
US11213912B2 (en) 2018-06-25 2022-01-04 Bwxt Nuclear Operations Group, Inc. Methods and systems for monitoring a temperature of a component during a welding operation
CN115917033A (zh) * 2020-06-30 2023-04-04 马克思-普朗克科学促进协会 控制源材料的蒸发速率的方法、测量在源表面上反射的电磁辐射的检测器及利用电磁辐射进行热蒸发的系统
JP2023534894A (ja) * 2020-06-30 2023-08-15 マツクス－プランク－ゲゼルシヤフト ツール フエルデルング デル ヴイツセンシヤフテン エー フアウ 蒸発したソース材料のフラックス分布を制御するための方法、ソース表面で反射された電磁放射を測定するための検出器、及び、電磁放射を用いた熱蒸発のためのシステム

Also Published As

Publication number Publication date
DE2012075A1 (enrdf_load_stackoverflow) 1970-09-10
SE366832B (enrdf_load_stackoverflow) 1974-05-06
US3574650A (en) 1971-04-13
GB1294234A (en) 1972-10-25
FR2037794A5 (enrdf_load_stackoverflow) 1970-12-31

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