FR2037794A5 - - Google Patents

Info

Publication number
FR2037794A5
FR2037794A5 FR7008248A FR7008248A FR2037794A5 FR 2037794 A5 FR2037794 A5 FR 2037794A5 FR 7008248 A FR7008248 A FR 7008248A FR 7008248 A FR7008248 A FR 7008248A FR 2037794 A5 FR2037794 A5 FR 2037794A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7008248A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Technologies Corp
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Application granted granted Critical
Publication of FR2037794A5 publication Critical patent/FR2037794A5/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F23/00—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm
    • G01F23/22—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water
    • G01F23/28—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water by measuring the variations of parameters of electromagnetic or acoustic waves applied directly to the liquid or fluent solid material
    • G01F23/284—Electromagnetic waves
    • G01F23/292—Light, e.g. infrared or ultraviolet
FR7008248A 1969-03-13 1970-03-09 Expired FR2037794A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80695669A 1969-03-13 1969-03-13

Publications (1)

Publication Number Publication Date
FR2037794A5 true FR2037794A5 (fr) 1970-12-31

Family

ID=25195217

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7008248A Expired FR2037794A5 (fr) 1969-03-13 1970-03-09

Country Status (6)

Country Link
US (1) US3574650A (fr)
CA (1) CA959145A (fr)
DE (1) DE2012075A1 (fr)
FR (1) FR2037794A5 (fr)
GB (1) GB1294234A (fr)
SE (1) SE366832B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2482290A1 (fr) * 1980-05-09 1981-11-13 Poncet Pierre Perfectionnements a la detection photoelectrique du niveau du bain dans les lingotieres de coulee continue

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3740563A (en) * 1971-06-25 1973-06-19 Monsanto Co Electroptical system and method for sensing and controlling the diameter and melt level of pulled crystals
US3958129A (en) * 1974-08-05 1976-05-18 Motorola, Inc. Automatic crystal diameter control for growth of semiconductor crystals
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US4046100A (en) * 1975-10-20 1977-09-06 Trw Inc. Apparatus for thermal deposition of metal
DE2931199A1 (de) * 1979-08-01 1981-02-19 Endress Hauser Gmbh Co Anordnung zur messung des badspiegels in einer giessanlage, insbesondere in der kokille einer stranggiessanlage
US4396005A (en) * 1981-07-06 1983-08-02 Corning Glass Works Solar collector and control
US4508970A (en) * 1982-07-15 1985-04-02 Motorola, Inc. Melt level sensing system and method
DE3336210C2 (de) * 1982-10-06 1986-04-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Verfahren und Vorrichtung zur Füllstandsmessung
DE3720248A1 (de) * 1987-06-19 1989-01-05 Schenck Ag Carl Verfahren und anordnung zur messung von verformungen an proben oder pruefkoerpern in pruefmaschinen
DE3740227C2 (de) * 1987-11-27 1994-03-24 Schenck Ag Carl Verfahren und Vorrichtung zur Messung von Verformungen an Proben oder Prüfkörpern in Prüfmaschinen
DE3720303C2 (de) * 1987-06-19 1993-09-30 Schenck Ag Carl Probeneinspannvorrichtung für Prüfmaschinen
US5617911A (en) * 1995-09-08 1997-04-08 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a support material and a deposition material
US5718951A (en) * 1995-09-08 1998-02-17 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a molten metal and deposition of a powdered metal as a support material
US5746844A (en) * 1995-09-08 1998-05-05 Aeroquip Corporation Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of molten metal and using a stress-reducing annealing process on the deposited metal
US5787965A (en) * 1995-09-08 1998-08-04 Aeroquip Corporation Apparatus for creating a free-form metal three-dimensional article using a layer-by-layer deposition of a molten metal in an evacuation chamber with inert environment
US6342265B1 (en) * 1997-08-20 2002-01-29 Triumf Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
DE10040942A1 (de) * 2000-08-21 2002-03-07 Endress Hauser Gmbh Co Vorrichtung zur Bestimmung des Füllstands eines Füllguts in einem Behälter
US20080160171A1 (en) * 2006-12-29 2008-07-03 United Technologies Corporation Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
WO2017048523A1 (fr) * 2015-09-15 2017-03-23 Retech Systems Llc Capteur laser de contrôle de fusion de fours à sole et assimilés
US11213912B2 (en) * 2018-06-25 2022-01-04 Bwxt Nuclear Operations Group, Inc. Methods and systems for monitoring a temperature of a component during a welding operation
WO2022002371A1 (fr) * 2020-06-30 2022-01-06 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Procédé de régulation d'un taux d'évaporation d'un matériau source, détecteur permettant de mesurer un rayonnement électromagnétique réfléchi sur une surface source et système d'évaporation thermique à rayonnement électromagnétique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2482290A1 (fr) * 1980-05-09 1981-11-13 Poncet Pierre Perfectionnements a la detection photoelectrique du niveau du bain dans les lingotieres de coulee continue

Also Published As

Publication number Publication date
GB1294234A (en) 1972-10-25
DE2012075A1 (fr) 1970-09-10
SE366832B (fr) 1974-05-06
CA959145A (en) 1974-12-10
US3574650A (en) 1971-04-13

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Legal Events

Date Code Title Description
ST Notification of lapse