FR2037794A5 - - Google Patents
Info
- Publication number
- FR2037794A5 FR2037794A5 FR7008248A FR7008248A FR2037794A5 FR 2037794 A5 FR2037794 A5 FR 2037794A5 FR 7008248 A FR7008248 A FR 7008248A FR 7008248 A FR7008248 A FR 7008248A FR 2037794 A5 FR2037794 A5 FR 2037794A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F23/00—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm
- G01F23/22—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water
- G01F23/28—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measuring physical variables, other than linear dimensions, pressure or weight, dependent on the level to be measured, e.g. by difference of heat transfer of steam or water by measuring the variations of parameters of electromagnetic or acoustic waves applied directly to the liquid or fluent solid material
- G01F23/284—Electromagnetic waves
- G01F23/292—Light, e.g. infrared or ultraviolet
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electromagnetism (AREA)
- Thermal Sciences (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Measurement Of Optical Distance (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US80695669A | 1969-03-13 | 1969-03-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2037794A5 true FR2037794A5 (fr) | 1970-12-31 |
Family
ID=25195217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7008248A Expired FR2037794A5 (fr) | 1969-03-13 | 1970-03-09 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3574650A (fr) |
CA (1) | CA959145A (fr) |
DE (1) | DE2012075A1 (fr) |
FR (1) | FR2037794A5 (fr) |
GB (1) | GB1294234A (fr) |
SE (1) | SE366832B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2482290A1 (fr) * | 1980-05-09 | 1981-11-13 | Poncet Pierre | Perfectionnements a la detection photoelectrique du niveau du bain dans les lingotieres de coulee continue |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3740563A (en) * | 1971-06-25 | 1973-06-19 | Monsanto Co | Electroptical system and method for sensing and controlling the diameter and melt level of pulled crystals |
US3958129A (en) * | 1974-08-05 | 1976-05-18 | Motorola, Inc. | Automatic crystal diameter control for growth of semiconductor crystals |
US4061800A (en) * | 1975-02-06 | 1977-12-06 | Applied Materials, Inc. | Vapor desposition method |
US4046100A (en) * | 1975-10-20 | 1977-09-06 | Trw Inc. | Apparatus for thermal deposition of metal |
DE2931199A1 (de) * | 1979-08-01 | 1981-02-19 | Endress Hauser Gmbh Co | Anordnung zur messung des badspiegels in einer giessanlage, insbesondere in der kokille einer stranggiessanlage |
US4396005A (en) * | 1981-07-06 | 1983-08-02 | Corning Glass Works | Solar collector and control |
US4508970A (en) * | 1982-07-15 | 1985-04-02 | Motorola, Inc. | Melt level sensing system and method |
DE3336210C2 (de) * | 1982-10-06 | 1986-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München | Verfahren und Vorrichtung zur Füllstandsmessung |
DE3720248A1 (de) * | 1987-06-19 | 1989-01-05 | Schenck Ag Carl | Verfahren und anordnung zur messung von verformungen an proben oder pruefkoerpern in pruefmaschinen |
DE3720303C2 (de) * | 1987-06-19 | 1993-09-30 | Schenck Ag Carl | Probeneinspannvorrichtung für Prüfmaschinen |
DE3740227C2 (de) * | 1987-11-27 | 1994-03-24 | Schenck Ag Carl | Verfahren und Vorrichtung zur Messung von Verformungen an Proben oder Prüfkörpern in Prüfmaschinen |
US5718951A (en) * | 1995-09-08 | 1998-02-17 | Aeroquip Corporation | Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a molten metal and deposition of a powdered metal as a support material |
US5617911A (en) * | 1995-09-08 | 1997-04-08 | Aeroquip Corporation | Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of a support material and a deposition material |
US5746844A (en) * | 1995-09-08 | 1998-05-05 | Aeroquip Corporation | Method and apparatus for creating a free-form three-dimensional article using a layer-by-layer deposition of molten metal and using a stress-reducing annealing process on the deposited metal |
US5787965A (en) * | 1995-09-08 | 1998-08-04 | Aeroquip Corporation | Apparatus for creating a free-form metal three-dimensional article using a layer-by-layer deposition of a molten metal in an evacuation chamber with inert environment |
US6342265B1 (en) * | 1997-08-20 | 2002-01-29 | Triumf | Apparatus and method for in-situ thickness and stoichiometry measurement of thin films |
DE10040942A1 (de) * | 2000-08-21 | 2002-03-07 | Endress Hauser Gmbh Co | Vorrichtung zur Bestimmung des Füllstands eines Füllguts in einem Behälter |
US20080160171A1 (en) * | 2006-12-29 | 2008-07-03 | United Technologies Corporation | Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination |
US20170072461A1 (en) * | 2015-09-15 | 2017-03-16 | Retech Systems Llc | Laser sensor for melt control of hearth furnaces and the like |
US11213912B2 (en) * | 2018-06-25 | 2022-01-04 | Bwxt Nuclear Operations Group, Inc. | Methods and systems for monitoring a temperature of a component during a welding operation |
EP4143361A1 (fr) * | 2020-06-30 | 2023-03-08 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Procédé de régulation d'un taux d'évaporation d'un matériau source, détecteur permettant de mesurer un rayonnement électromagnétique réfléchi sur une surface source et système d'évaporation thermique à rayonnement électromagnétique |
-
1969
- 1969-03-13 US US806956A patent/US3574650A/en not_active Expired - Lifetime
-
1970
- 1970-02-16 CA CA075,012A patent/CA959145A/en not_active Expired
- 1970-02-24 GB GB8855/70A patent/GB1294234A/en not_active Expired
- 1970-03-09 FR FR7008248A patent/FR2037794A5/fr not_active Expired
- 1970-03-11 SE SE03250/70A patent/SE366832B/xx unknown
- 1970-03-13 DE DE19702012075 patent/DE2012075A1/de active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2482290A1 (fr) * | 1980-05-09 | 1981-11-13 | Poncet Pierre | Perfectionnements a la detection photoelectrique du niveau du bain dans les lingotieres de coulee continue |
Also Published As
Publication number | Publication date |
---|---|
SE366832B (fr) | 1974-05-06 |
DE2012075A1 (fr) | 1970-09-10 |
CA959145A (en) | 1974-12-10 |
US3574650A (en) | 1971-04-13 |
GB1294234A (en) | 1972-10-25 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |