CA762634A - Semiconductor device fabrication - Google Patents

Semiconductor device fabrication

Info

Publication number
CA762634A
CA762634A CA762634A CA762634DA CA762634A CA 762634 A CA762634 A CA 762634A CA 762634 A CA762634 A CA 762634A CA 762634D A CA762634D A CA 762634DA CA 762634 A CA762634 A CA 762634A
Authority
CA
Canada
Prior art keywords
semiconductor device
device fabrication
fabrication
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA762634A
Inventor
C. Marinage John
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Publication date
Application granted granted Critical
Publication of CA762634A publication Critical patent/CA762634A/en
Expired legal-status Critical Current

Links

CA762634A Semiconductor device fabrication Expired CA762634A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA762634T

Publications (1)

Publication Number Publication Date
CA762634A true CA762634A (en) 1967-07-04

Family

ID=36199767

Family Applications (1)

Application Number Title Priority Date Filing Date
CA762634A Expired CA762634A (en) Semiconductor device fabrication

Country Status (1)

Country Link
CA (1) CA762634A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116988049A (en) * 2023-09-22 2023-11-03 新美光(苏州)半导体科技有限公司 Chemical vapor deposition equipment and method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116988049A (en) * 2023-09-22 2023-11-03 新美光(苏州)半导体科技有限公司 Chemical vapor deposition equipment and method
CN116988049B (en) * 2023-09-22 2024-01-16 新美光(苏州)半导体科技有限公司 Chemical vapor deposition equipment and method

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