CA3137084C - Stereo lithographic 3d printing assembly and stereo lithographic3d printing method - Google Patents

Abstract

The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a digitally defined first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution and said second pattern and said first pattern aligned with one another at said projection location, said photo mask system providing at least one photo mask between said digital projection system and said projection location. This provides a fast 3D printing assembly allowing high resolution details.

Description

1 STEREO LITHOGRAPIDC 3D PRINTING ASSEMBLY AND STEREO LITHOGRAPHIC3D PRINTING METHOD FIELD 5 The invention relates to a stereo lithographic 3D printing assembly, a stereo lithographic 3D printing method, and a computer program product for controlling a stereo lithographic 3D printing assembly.

BACKGROUND 10 US9733429 according to its abstract describes "A system and method for forming microlattice structures of large thickness.

In one embodiment, a photomonomer resin is secured in a mold having a transparent bottom, the interior surface of which is coated with a mold-release agent. A substrate is placed in contact with the top surface of the photomonomer resin.

The photomonomer resin is 15 illuminated from below by one or more sources of collimated light, through a photomask, causing polymer waveguides to form, extending up to the substrate, forming a microlattice structure connected with the substrate.

After a layer of microlattice structure has formed, the substrate is raised using a translation-rotation system, additional photomonomer resin is added to the mold, and the photomonomer 20 resin is again illuminated through the photomask, to form an additional layer of microlattice structure.

The process is repeated multiple times to form a stacked microlattice structure." US9862147 according to its abstract describes "A method of photo-curing a photo-sensitive resin is disclosed in the present invention.

The method includes the 25 following steps: generating a sub-pixel pattern having an outer contour region and an inner contour region based on a vector file taken from a cross-section of a model; providing the sub-pixel pattern to a photomask module, wherein the photomask module includes a panel having a pixel matrix including plural square pixels, each of which includes three color-filtered sub-pixels; flood-filling color in each of the color- 30 :filtered sub-pixels to distinguish the outer contour region from the inner contour region; and exposing the photo-sensitive resin to a light source emitting a light passing through the panel." Date Re9ue/Date Received 2024-04-15 2 US20180056605 according to its abstract describes "A three-dimensional printing system includes a build device and an optical projection engine.

The build device includes a curing tank, a photocurable material and a build platform, and the photocurable material and the build platform is disposed in the curing tank.

The optical 5 projection engine has a zoom lens for projecting image beams with at least a first pixel size and a second pixel size on the build platform to cure the photocurable material, and the first pixel size is different to the second pixel size." US2018126647 according to its abstract describes "The invention relates to a device for correcting an inhomogeneous intensity distribution of a radiation field 10 generated by a radiation source, in particular a radiation source for a device for producing three-dimensional articles by the layer-by-layer solidifying, in a build plane, of a material that is solidifiable under the action of radiation.

The device comprises a correcting or filtering device that is to be introduced, between the radiation source and the build plane, into a radiation path of a device for producing three-dimensional 15 articles by the layer-by-layer solidifying of a material that is solidifiable under the action of radiation.

Further, improved methods for producing a device for correcting an inhomogeneous intensity distribution of a radiation field generated by a radiation source, and methods and devices for producing a three-dimensional article are proposed." 20 WO2015007772 according to its abstract describes "The invention relates to a method for producing a three-dimensional object (12) by solidifying layer by layer a material (16) that can be solidified by the action of radiation (14) using exposure masks (28), wherein at least one, preferably a single digital exposure mask is generated for forming each object layer to be solidified of the object (12) in a construction plane 25 (22), by means of which exposure mask the radiation is projected selectively into the construction plane.

According to the invention, the method is improved in that threedimensional objects having an improved, smoother surface can be produced simply by exposing the construction plane (22) in an oscillating manner during an exposure time.

The invention also relates to an improved exposure mask generation device and an 30 improved device for producing a three-dimensional object." CHI ZHOU et al: "A Novel Low-Cost Process Based on Vector Projection for High-Speed, and Large-Area Stereo lithography Scanning and Mask High-Accuracy, High-Throughput, Fabrication", published 1 March 2015, in its abstract states: Date Re9ue/Date Received 2024-04-15 3 "Photopolymerization based process is one of the most popular additive manufacturing (AM) processes.

Two primary configurations for this process are laser based vector by vector scanning (OD) and projection based layer by layer exposing (2D).

With the highly focused fine laser, the scanning based process can accomplish very high surface 5 finishing and precision, however, due to the serial nature of scanning, this process suffers from the problem of slow speed.

In contrast with laser scanning, projection based process can form the whole layer in one exposure, which leads to higher fabrication efficiency.

However, due to the limited resolution of projection device and various optical defects, the surface quality will be significantly deteriorated for large 10 area fabrication.

To solve this problem, a novel hybrid process by integrating vector scanning and mask projection has been presented.

In this process, laser is focused into a fine spot and used to scan the boundary of the layer, whereas the projector is focused onto a large platform surface and used to form the interior area of the layer.

An efficient slicing method is proposed for extracting the contour for laser scanning. A 15 slice to image conversion algorithm is also developed to convert the offset contour to grayscale image for mask projection.

Experimental results have verified that the proposed hybrid process can significantly improve the fabrication speed without losing the surface quality." OS2019/084241 m its abstract states: "A multiscale multiphoton 20 photolithography system for fabricating a 3D object may comprise a support structure configured to support a light-sensitive composition from which the 3D object is to be fabricated; a microscope objective configured to focus light on the light-sensitive composition via an optical path; a first optical assembly configured to provide light of a first wavelength to the microscope objective, the first wavelength selected to induce 25 a single photon process in the light-sensitive composition; a second optical assembly configured to provide light of a second wavelength to the microscope objective, the second wavelength selected to induce a multiphoton process in the light-sensitive composition; and a controller operably coupled to the first and second optical assemblies.

The controller comprises a processor and a non-transitory computer- 30 readable medium operably coupled to the processor, the computer-readable medium comprising instructions that, when executed by the processor, perform operations comprising illuminating, via the first optical assembly, the light-sensitive material with the first wavelength of light via the optical path to generate a first region of the 3D Date Re9ue/Date Received 2024-04-15 4 object v1a single photon photolithography; illuminating, v1a the second optical assembly, the light-sensitive material with the second wavelength of light via the optical path to generate a second region of the 3D object via multiphoton photolithography; and repeating steps (a) and (b) until the 3D object is complete." 5 US 2004/019408 in its abstract states: "A lithography tool includes an exposure chamber and a reticle handler that exchanges a reticle being exposed as prescribed by the user of the lithography tool.

The reticle handler can include a vacuum-compatible robot, a vacuum chamber to house the robot, a load-lock to input reticles and transition them from atmospheric pressure to vacuum, a processing station for processing the 10 reticle, and a reticle library for storing at least one extra reticle so that it is quickly available for exchange during an exposure process.

The robot can have a two or more handed gripper to simultaneously hold multiple reticles.

This allows a first reticle to be removed from the reticle stage with a first hand and a second reticle to be loaded onto the reticle stage with a second hand, and so on, which minimizes exchange time." SUMMARY One or more disadvantages of the prior art amongst others that these different methods offer a trade-off between resolution and printable object size.

Methods to print large objects cannot currently provide sub-μm resolutions and high-resolution 20 printing techniques cannot 3d-print objects (several cm3 in volume) within reasonable timeframes.

Hence, it is an aspect of the invention to provide an alternative 3D printing method, which preferably further at least partly obviates one or more of abovedescribed drawbacks. 25 There is currently provided a stereo lithographic 3D pnntmg assembly comprising a digital projection system for projecting a digitally defined first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution and said second pattern and said first pattern aligned with one another at said projection location, said photo mask 30 system providing at least one photo mask between said digital projection system and said projection location.

There is further provided a stereo lithographic 3D printing add-on assembly for use on a stereo lithographic 3D printing assembly that comprises a digital projection Date Re9ue/Date Received 2024-04-15 system for projecting a digitally defined first pattern having a first resolution at a projection location, said stereo lithographic 3D printing add-on assembly comprising: - at least one photo-mask for creating at least one micro-feature, such as cavities or channels, at a second resolution higher than 200 dots per inch, in particular higher 5 than 250 dots per inch, more in particular higher than 300 dots per inch; - an actuator for displacing said photo-mask between photocuring of layers in said stereo lithographic 3D printing assembly, and - a controller for controlling said actuator for positioning said at least one photo mask, with respect to at least one selected form said digital projection system and said 10 projection location of said stereo lithographic 3D printing assembly for producing said at least one micro feature on said digitally defined first pattern.

There is furthermore provided a stereo lithographic 3D printing method, compnsmg: - projecting a digitally defined first pattern having a first resolution at a 15 projection location in a resin container during a stereo lithographic 3D printing process using projection optics; - providing at least one photo-mask between said a resin container and said projecting optics; - projecting at least one photo mask pattern at said projection location using said 20 at least one photo-mask to project a second pattern having a second resolution at said projection location for providing said second pattern on said first pattern.

There is furthermore provided a computer program product to align the stereolithographic and photolithographic patterns, i.e., the first and second patterns.

The combination of stereo- and photo-lithographic polymerization-based 3D- 25 printing process allows for a high-volume and high-resolution 3D-printing using a stereolithographic process. A computer program product is provided to align the stereolithographic and photolithographic patterns.

The method and assembly described herein comprises a digital illumination system (e.g. digital mirror device, LCD, Liquid Crystal on Silicon, or laser-scanning 30 methods) to 3D-print larger features (named here as macro-patterns) with full threedimensional conformity.

This provides the first pattern.

The method and assembly also includes a photo-mask system comprising a photo-mask patterns to print smaller features (named here as micro-patterns), a translation or rotation stage to switch Date Re9ue/Date Received 2024-04-15 6 between different photo-mask patterns.

This provides the second pattern.

The photomask system uses a permanently defined pattern on a substrate.

It can use one complete pattern on one substrate.

In an embodiment, several basic patterns are provided each on a separate substrate.

These substrates can be combined to form the 5 second pattern.

In yet another embodiment, subsequent patterns can be used on separate substrates in order to print various fine details on an object.

Just in order to avoid confusion, 3D printing in also referred to as additive manufacturing.

It allows the production of 3D objects by adding layer after layer of material. 10 Combining the two approaches allows for producing parts that neither method can by itself (with resolution, scale and three-dimensional conformity).

For example, the shapes for a large object (up to 500 x 500 cm using current stereolithographic methods) at low resolutions while simultaneously, one or more photo-mask patterns with sub-μm features can be cycled through as the piece is printed.

This would create 15 large parts with ordered, repeating micro-structures.

The macro-structure (i.e. the general shape of the object) would be defined digitally whereas the micro-features would be defined by the photo-mask system.

The method described here can therefore produce a 100-1000-fold improvement m resolution compared to traditional stereolithographic methods without 20 compromising on the size of the printed objects.

Alternatively, the method is a 100- 1000-fold reduction in printing time compared to high-resolution printing methods such as two-photon polymerization.

The method is particularly useful where repeating, ordered micro-structures are necessary while the large macro-structure with full conformity. 25 The current assembly can be used in different fields.

Examples are the following.

Tissue Scaffolds: Printing organs with porous structures to promote cell growth and create made-to-order organs for every patient.

In this case, the organs themselves are the macro-features with feature sizes> 500 μm.

Porous lattices with high surface area to volume ratios can be created using photo-mask patterning to create the micro- 30 features necessary for cell growth.

Metamaterials: Ultra-light weight, robust lattices known as "metamaterials" have been a key application in high resolution 3D-printing (i.e. feature sizes of< 100 μm).

Sectors as diverse as aerospace, furniture design and the automotive field can benefit Date Re9ue/Date Received 2024-04-15 7 from the current assembly and method. A limitation of known technologies 1s combining resolution and part size for functional parts.

Liquid Chromatography Columns: Current liquid chromatography relies on particles under 5 μm that are random packed into a column.

The benefits or an entirely 5 ordered porous media that 3D-printing can create have been demonstrated using simulations and experiments.

However, low printing resolutions ( or long build times with two-polymerization) have limited the development of 3D-printed columns at a scale that is applicable to preparative or analytical scale separations.

The proposed assembly and method allows for the creation of simple repeating porous grids while 10 meeting the physical requirements of a liquid chromatography column; both in terms ofresolution and build volume.

Microfluidic Devices: Microfluidic and lab-on-a-chip devices have traditionally used planar photo-lithographic techniques, are highly time consuming and often require cleanroom facilities.

Known 3D-printing offers the opportunity to create fully 15 three-dimensional designs at a fraction of the time and cost.

However, the resolutions of known stereo lithographic assemblies can only create "milli-fluidic" devices rather than microfluidic devices, often defeating the purpose of miniaturization.

The current assembly and method combines the advantages of both techniques to create ultra-high resolution, intricate chip designs with production times and costs that can make the 20 sale of microfluidic devices an attractive commercial proposition.

Macro-features such as connecting ports, and solvent reservoirs can be defined by the known process part while the micro-channels can be created using proposed additional features.

In an embodiment of the assembly, said second resolution is at least ten times higher than said first resolution at said projection location. 25 In an embodiment, the first resolution is lower than 200 dots per inch, and said second resolution is higher than 200 dots per inch.

In a particular embodiment said first resolution is lower than 250 dots per inch, and said second resolution is higher than 250 dots per inch.

In yet a more particular embodiment, said first resolution is lower than 100 dots per inch, and said second resolution is higher than 300 dots per 30 inch.

In embodiments, the first resolution is even lower, for allowing faster printing of certain structures, while the second resolution may even be higher, even up to 600 dots per inch and higher.

Date Re9ue/Date Received 2024-04-15 8 In an embodiment of the assembly, the photo mask system comprises at least substrate comprising at least part of said second pattern permanently defined on said substrate.

In an embodiment thereof, the photo mask system comprises a series of substrates each comprising at least part of said second pattern permanently defined on 5 said respective substrate.

In an embodiment, the stereo lithographic 3D printing assembly further comprises an alignment system having or adapter for having said second pattern and said first pattern aligned to create a combined image to be photopolymerized.

In an embodiment thereof, the alignment system comprises an alignment provision on said 10 digital projection system and on said photo mask system, a detector for detecting said alignment provision, and an alignment actuator for aligning said digital projection system and said photo mask system with respect to one another.

In an embodiment, said digital projection system comprises a source of electromagnetic radiation for producing a beam of electromagnetic radiation, 15 collimating optics downstream of said source of electromagnetic radiation for collimating said beam of electromagnetic radiation, a digital mirror device downstream of said collimating optics, and an at least one axis translation device for translating said projection location, wherein said photo mask system is provided for positioning at least one photomask in a collimated beam of said collimating optics.

In an 20 embodiment, the electromagnetic radiation is in the ultra-violet or visible light range.

In an embodiment, said digital projection system comprises a light source, collimating optics downstream of said light source, a digital mirror device downstream of said collimating optics, and an at least one axis translation device for translating said projection location. 25 In an embodiment, said digital projection system comprises a patterned light source, collimating optics downstream of said patterned light source, and an at least one axis translation device for translating said projection location.

In an embodiment, the stereo lithographic 3D printing assembly further comprises a container for holding a photo-curable resin and a target surface for 30 defining said projection location for receiving a solidified layer that is polymerized with radiation from said digital projection system.

In an embodiment, the photo-mask system comprises a series of photo-masks and selection system for selecting at least one of said photo-masks for generating said Date Re9ue/Date Received 2024-04-15 9 second pattern.

This makes the assembly even more versatile. A fine pattern can be disassembled into a combination of base patterns, and photo-masks representing these base patterns can be combined, even dynamically, to produce the fine pattern.

This allows for instance a fine pattern to change during the process.

In this way, for instance 5 channels that run in a 3D complex manner can be created.

In an embodiment, the photo-mask system comprises an actuator for displacing said at least one photo-mask during projecting of said first pattern for generating said second pattern, in particular said actuator comprises at least one selected from a translation stage and a rotation stage.

This allows for a pattern to be created for 10 instance at a selected position in the lower resolution first pattern.

In an embodiment, the photo mask system is provided as an add-on system to a stereo lithographic 3D printing assembly.

This allows spectacular improvements on existing stereo lithographic 3D printing systems.

There is further provided a stereo lithographic 3D printing add-on assembly, in 15 particular for the stereo lithographic 3D printing add-on assembly described earlier, compnsmg: - at least one photo-mask for creating at least one micro-feature, such as cavities or channels, in particular, at a second resolution higher than 200 dots per inch, in particular higher than 250 dots per inch, more in particular higher than 300 dots per 20 inch; - an actuator for displacing said photo-mask during operation in, in particular between photocuring oflayers of, said 3D stereo lithographic printing assembly, and - a controller for controlling said actuator for positioning said at least one photo mask, with respect to at least one selected from said digital projection system and said 25 projection location of said stereo lithographic 3D printing assembly for producing said predefined at least one micro feature on said digitally defined first pattern.

In an embodiment, the stereo lithographic 3D printing add-on assembly comprises a series of said photo-masks, and - a photo-mask selection system for selecting at least one photo-mask from said 30 series of photo-masks for creating predefined micro-features such as ordered lattices; - a controller for selecting at least one photo mask from said series of said photomasks for making said at least one micro features and for controlling said actuator for positioning said selected at least one photo mask, said projection optics and said Date Re9ue/Date Received 2024-04-15 projection location with respect to one another for producing said at least one micro feature.

In an embodiment of the stereo lithographic 3D printing method, it further compnses: 5 -providing an actuator for displacing the at least one photo mask; - moving, in particular selected from rotating, translating, and a combination thereof, said at least one photo-mask during said stereo lithographic printing process in coordination with said projecting of said first pattern.

In an embodiment of the stereo lithographic 3D printing method, it further 10 compnsmg: - providing a series of said at least one photo-mask; - selecting at least one photo mask from said series of said at least one photo-mask; - changing said second pattern during said projecting of said first pattern, said changing comprising at least one selected from removing, adding, replacing at least 15 one of said selected at least one photo-mask, and a combination thereof.

In an embodiment of the stereo lithographic 3D printing method, at least one photo-mask is provided that comprises a repeating pattern, for generating a second pattern producing at least one three-dimensional ordered lattice having said second resolution. 20 There is further provided a computer program product for controlling the stereo lithographic 3D printing assembly for producing a three-dimensional object, which computer program product, when running on a data processor: - decomposes said three-dimensional object into separate slices to be projected at said projection location; 25 - decomposes each slice into a said digitally defined first pattern with said first resolution; - decomposes each slice into a said second pattern with said second resolution; - decomposes said said second pattern into a selection of at least one basic photomask from a series of basic photomasks, each basic photomask having a basic pattern; 30 - decomposes subsequent slices into a displacement of said said first pattern; - decomposes subsequent slices into a displacement of said said second pattern, and Date Re9ue/Date Received 2024-04-15 11 - provides control instructions to control said digital projection system and said photomask system to generate said said digitally defined first pattern and said said second pattern simultaneously for producing said three-dimensional object.

There is further provided a computer program product for controlling the stereo 5 lithographic 3D printing add-on assembly for producing a three-dimensional object, which computer program product, when running on a data processor: - retrieves a decomposition of said three-dimensional object into separate slices to be projected at said projection location; - retrieves a said first pattern having a first resolution and corresponding to each 10 slice; - subtracts said first pattern from said corresponding slice providing amended slices; - decomposes each amended slice into a said second pattern with said second resolution; 15 - decomposes said second pattern into a selection of at least one basic photomask from a series of basic photomasks, each basic photomask having a basic pattern; - retrieving for subsequent slices a displacement of said first pattern; - decomposes subsequent slices into a displacement of said second pattern, and - provides control instructions to control said photomask system in 20 synchronization with said further stereo lithographic 3D printing system to generate said first pattern and said second pattern simultaneously for producing said threedimensional object.

This computer program product allows an improvement on existing assemblies.

The invention further pertains to a stereo lithographic 3D printing assembly 25 comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location.

The invention further pertains to a stereo lithographic 3D printing add-on assembly comprising: 30 - at least one photo-mask for creating at least one micro-feature, such as cavities or channels; - an actuator for displacing said photo-mask during operation of said stereo lithographic system, and Date Re9ue/Date Received 2024-04-15 12 - a controller for controlling said actuator for positioning said at least one photo mask, said projection optics and said projection location with respect to one another for producing said predefined repeating micro features.

The invention further pertains to a stereo lithographic 3D printing add-on 5 assembly comprising: - at least one photo-mask for creating at least one micro-feature, such as cavities or channels; - an actuator for displacing said photo-mask during operation of said stereo lithographic system, and 10 - a controller for controlling said actuator for positioning said at least one photo mask, said projection optics and said projection location with respect to one another for producing said predefined repeating micro features.

The terms "upstream" and "downstream" relate to an arrangement of items or features relative to the propagation of the light from a light generating means (here the 15 especially the first light source), wherein relative to a first position within a beam of light from the light generating means, a second position in the beam of light closer to the light generating means is ''upstream", and a third position within the beam of light further away from the light generating means is "downstream".

The term "substantially" herein, such as in "substantially consists", will be 20 understood by the person skilled in the art.

The term "substantially" may also include embodiments with "entirely", "completely", "all", etc.

Hence, in embodiments the adjective substantially may also be removed.

Where applicable, the term "substantially" may also relate to 90% or higher, such as 95% or higher, especially 99% or higher, even more especially 99.5% or higher, including 100%.

The term 25 "comprise" includes also embodiments wherein the term "comprises" means "consists of'.

The term "functionally" will be understood by, and be clear to, a person skilled m the art.

The term "substantially" as well as "functionally" may also include embodiments with "entirely", "completely", "all", etc.

Hence, in embodiments the 30 adjective functionally may also be removed.

When used, for instance in "functionally parallel", a skilled person will understand that the adjective "functionally" includes the term substantially as explained above.

Functionally in particular is to be understood to include a configuration of features that allows these features to function as if the Date Re9ue/Date Received 2024-04-15 13 adjective "functionally" was not present.

The term "functionally" is intended to cover variations in the feature to which it refers, and which variations are such that in the functional use of the feature, possibly in combination with other features it relates to in the invention, that combination of features is able to operate or function.

For instance, 5 if an antenna is functionally coupled or functionally connected to a communication device, received electromagnetic signals that are receives by the antenna can be used by the communication device.

The word "functionally" as for instance used in "functionally parallel" is used to cover exactly parallel, but also the embodiments that are covered by the word "substantially" explained above.

For instance, "functionally 10 parallel" relates to embodiments that in operation function as if the parts are for instance parallel.

This covers embodiments for which it is clear to a skilled person that it operates within its intended field of use as if it were parallel.

Furthermore, the terms first, second, third and the like as used herein, are used for distinguishing between similar elements and not necessarily for describing a 15 sequential or chronological order.

It is to be understood that the terms so used are interchangeable under appropriate circumstances and that the embodiments of the invention described herein are capable of operation in other sequences than described or illustrated herein.

The devices or apparatus herein are amongst others described during operation. 20 As will be clear to the person skilled in the art, the invention is not limited to methods of operation or devices in operation.

It should be noted that the above-mentioned embodiments illustrate rather than limit the invention, and that those skilled in the art will be able to design many alternative embodiments without departing from the scope of the teachings herein.

In 25 this description, any reference signs placed between parentheses shall not be construed as limiting.

Use of the verb "to comprise" and its conjugations does not exclude the presence of elements or steps other than those stated in a described combination.

The article "a" or "an" preceding an element does not exclude the presence of a plurality of such elements.

The invention may be implemented by means of hardware comprising 30 several distinct elements, and by means of a suitably programmed computer.

In combinations enumerating several means, several of these means may be embodied by one and the same item of hardware.

The mere fact that certain measures are recited in Date Re9ue/Date Received 2024-04-15 14 mutually different paragraphs does not indicate that a combination of these measures cannot be used to advantage.

The invention further applies to an apparatus or device comprising one or more of the characterising features described in the description and/or shown in the attached 5 drawings.

The invention further pertains to a method or process comprising one or more of the characterising features described in the description and/or shown in the attached drawings.

The various aspects discussed in this patent can be combined in order to provide additional advantages.

Furthermore, some of the features can form the basis for one or 10 more divisional applications.

BRIEF DESCRIPTION OF THE DRAWINGS Embodiments of the invention will now be described, by way of example only, 15 with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which: Figure 1 schematically depicts a side view of an embodiment of the assembly; Figure 2 a perspective view of figure 1; Figure 3 a cross sectional view of figure 1; 20 Figure 4 an expanded view of figure 1; Figure 5 an alternative setup showing an object being printed; Figure 6 a photograph showing an object with a micro pattern; Figure 7 a detail photograph of the object of figure 6.

Figure 8 a further detail of figure 6. 25 The drawings are not necessarily on scale DESCRIPTION OF PREFERRED EMBODIMENTS Figures 1-4 schematically depicts an embodiment of a stereo lithographic printing assembly 1.

The assembly 1 comprises a digital projection system 2.

This 30 digital projection system as such is well known in the arts.

The light source for the digital projection system can comprise a UV or visible-light LED system or mercuryarc lamp.

The projected image can be defined by a digital mirror device (DMD), laser- Date Re9ue/Date Received 2024-04-15 rastering or laser screening, liquid crystal display (LCD) or a liquid crystal on siliconbased illumination system.

The stereo lithographic printing system 1 compnses a surface 4 defining a projection location.

Often, such a surface will be a flat surface.

The surface is attached 5 to a displacement system 5.

Often, such a displacement system 5 will comprise a socalled Z-axis displacement table.

This can move the surface 4 up and down, i.e., as indicated in figure 1.

The stereo lithographic printing system 1 further comprises a container 6 for holding a polymerizable resin 7. 10 The stereo lithographic printing system 1 further comprises a photo mask system 3.

The photo mask system 3 comprises a frame holding a first mask 8 and, in this embodiment, also a second mask 8'.

The photo mask system 3 further comprises an actuator 9 for translating the masks 8, 8' in the X-Y plane (indicated).

In an embodiment, the actuator has a micro translation setting for moving or translating a 15 mask 8, 8' just a minor amount, usually in the order of microns, and a macro translation setting, for instance for replacing mask 8 with mask 8' and vice versa.

Masks 8, 8' used in the photo mask system comprise a pattern that 1s permanently defined on a substrate.

As mentioned before, many options are possible and have been explored.

For instance, the second pattern can be provided completely 20 on a substrate.

For one object to be printed, several subsequent second patterns can be used one after that other in combination with a first pattern.

This first pattern cab change during printing of an object as is evident.

In alternative embodiments, a series of basic patterns can be provided each on a separate substrate.

Combining these basic substrates can form or result in a second pattern.

The photo masks can be made as 25 known to a skilled person, for instance on a substrate of soda lime, quartz, or te:flon, for instance.

In order to 3D print an object, the first pattern and second pattern are aligned in such a way that the features defined by the second pattern are on the proper position on the features defined by the first pattern.

This creates a combined image to be 30 photopolymerized.

To that end, an alignment system is provided.

This can be provided in many ways.

In an embodiment, one or more alignment features are added to the photo mask.

In an embodiment, an image detector like a digital camera records the alignment feature on the photo mask, and details of the digital projection system.

The Date Re9ue/Date Received 2024-04-15 16 control system then controls an actuator, for instance a photo mask system translation table, to set and calibrate the photo mask position.

Other more simple or complex systems may be used to align and calibrate the digital projection system and the photo mask system with respect to one another.

Thus, a combined image is created for each 5 slice.

In figure 5, a further schematic embodiment of a stereo lithographic printing system 1 is depicted, showing details of an embodiment of the digital projection system 2.

In this embodiment, a light source and collimating optics system 10 are provided to produce a collimated optical beam 14.

The system 10 projects a beam 14 10 on a mirror 11 set here at 45 degrees with respect to the surface 4.

In this embodiment, the mirror 11 is provided with a first pattern 12.

Such a pattern 12 can be static.

In an embodiment, the pattern 12 is dynamic, for instance comprising an LCD or DMD element allowing the pattern 12 to be changed.

In figure 5, formation of an object 13 is indicated in an embodiment of the 15 current system.

In this embodiment, a next layer of the object is formed at projection surface 4'.

This projection surface 4' is in fact one end of the object 13 that is being formed.

The displacement system 5 translates the object in the Z-direction, pulling it in fact out of the resin 7.

When pulling the object in the Z-direction, new resin flows between the just-formed new layer of the object 13 and the (optically transparent) 20 bottom 15 ofresin container 6.

In figure 6, a picture of an object is shown that was 3D printed.

The object has a first pattern showing relatively broad walls.

In the relatively broad walls, a second pattern of a lower resolution is printed.

In figures 7 and 8, pictures are shown of these second patterns. 25 It will also be clear that the above description and drawings are included to illustrate some embodiments of the invention, and not to limit the scope of protection.

Starting from this disclosure, many more embodiments will be evident to a skilled person.

These embodiments are within the scope of the teachings herein and the essence of this invention and may be obvious combinations of prior art techniques and 30 the disclosure of this patent.

Date Re9ue/Date Received 2024-04-15 Reference numbers 1 stereolithographic printing assembly; 2 digital projection system; 3 photo mask system 5 4 printing surface; 17 5 displacement system (of an object that is printed) 6 container 7 polymerizable resin 8, 8' mask 10 9 actuator 10 collimating optics system 11 mirror 12 first pattern 13 object being printed 15 14 projection beam. 15 optically transparent bottom of the resin container Date Re9ue/Date Received 2024-04-15

Claims (15)

18 EMBODIMENTS IN WHICH AN EXCLUSIVE PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS: 1. A stereo lithographic 3D printing assembly comprising: a digital projection system configured to project a digitally defined first pattern having a first resolution at a projection location, and a photo mask system configured to project a second pattern having a second resolution, said second pattern and said first pattern aligned with one another at said projection location and said photo mask system providing at least one photo mask between said digital projection system and said projection location.

2. The stereo lithographic 3D printing assembly of claim 1, wherein said second resolution is at least ten times higher than said first resolution at said projection location.

3. The stereo lithographic 3D printing assembly of claim 1, wherein said first resolution is lower than 200 dots per inch and said second resolution is higher than 200 dots per inch, or wherein said first resolution is lower than 250 dots per inch and said second resolution is higher than 250 dots per inch, or wherein said first resolution is lower than 100 dots per inch and said second resolution is higher than 300 dots per inch.

4. The stereo lithographic 3D printing assembly of claim 1, wherein said photo mask system comprises a substrate comprising at least part of said second pattern permanently defined on said substrate.

5. The stereo lithographic 3D printing assembly of claim 4, wherein said photo mask system comprises a series of substrates each comprising at least part of said second pattern permanently defined on said respective substrate.

6. The stereo lithographic 3D printing assembly of claim 1, comprising an alignment system having said second pattern and said first pattern aligned.

7. The stereo lithographic 3D printing assembly of claim 6, wherein said alignment system comprises an alignment provision on said digital projection system and on said photo mask system, a detector for detecting said alignment provision, and an alignment actuator for aligning said digital projection system and said photo mask system with respect to one another. Date Re9ue/Date Received 2024-04-15 19

8. The stereo lithographic 3D printing assembly of claim 1, wherein said digital projection system compnses: a source of electromagnetic radiation for producing a beam of electromagnetic radiation; collimating optics downstream of said source of electromagnetic radiation for collimating said beam of electromagnetic radiation; a digital mirror device downstream of said collimating optics; and an at least one axis translation device for translating said projection location, wherein said photo mask system is provided for positioning at least one photomask in a collimated beam of said collimating optics.

9. The stereo lithographic 3D printing assembly of claim 1, wherein said digital projection system compnses: a light source; collimating optics downstream of said light source; a digital mirror device downstream of said collimating optics; and an at least one axis translation device for translating said projection location.

10. The stereo lithographic 3D printing assembly of claim 1, wherein said digital projection system compnses: a patterned light source; collimating optics downstream of said patterned light source; and an at least one axis translation device for translating said projection location.

11. The stereo lithographic 3D printing assembly of claim 1, further comprising a container for holding a photo-curable resin and a target surface for defining said projection location for receiving a solidified layer that is polymerized with radiation from said digital projection system. Date Re9ue/Date Received 2024-04-15

12. The stereo lithographic 3D printing assembly of claim 1, wherein said photo mask system comprises a series of photo masks and a selection system for selecting at least one of said photo masks for generating said second pattern.

13. The stereo lithographic 3D printing assembly of claim 1, wherein said photo mask system comprises an actuator for displacing said at least one photo mask during projecting of said first pattern for generating said second pattern.

14. The stereo lithographic 3D printing assembly of claim 1, wherein said actuator comprises at least one selected from a translation stage and a rotation stage.

15. The stereo lithographic 3D printing assembly of claim 1, wherein said photo mask system is provided as an add-on system to a stereo lithographic 3D printing assembly. Date Re9ue/Date Received 2024-04-15