CA2761872C - Pecvd coating using an organosilicon precursor - Google Patents

Pecvd coating using an organosilicon precursor Download PDF

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Publication number
CA2761872C
CA2761872C CA2761872A CA2761872A CA2761872C CA 2761872 C CA2761872 C CA 2761872C CA 2761872 A CA2761872 A CA 2761872A CA 2761872 A CA2761872 A CA 2761872A CA 2761872 C CA2761872 C CA 2761872C
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CA
Canada
Prior art keywords
organosilicon precursor
coating
plasma
generating
setting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CA2761872A
Other languages
French (fr)
Other versions
CA2761872A1 (en
Inventor
John T. Felts
Thomas E. Fisk
Robert S. Abrams
Robert J. Pangborn
Peter J. Sagona
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SIO2 Medical Products Inc
Original Assignee
SIO2 Medical Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SIO2 Medical Products Inc filed Critical SIO2 Medical Products Inc
Priority claimed from EP10162755.2A external-priority patent/EP2253735B1/en
Priority claimed from PCT/US2010/034586 external-priority patent/WO2010132591A2/en
Publication of CA2761872A1 publication Critical patent/CA2761872A1/en
Application granted granted Critical
Publication of CA2761872C publication Critical patent/CA2761872C/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Abstract

A method for coating a substrate surface by PECVD is provided, the method comprising generating a plasma from a gaseous reactant comprising an organosilicon precursor and optionally O2.
The lubricity, hydrophobicity and/or barrier properties of the coating are set by setting the ratio of the O2 to the organosilicon precursor in the gaseous reactant, and/or by setting the electric power used for generating the plasma. In particular, a lubricity coating made by said method is provided. Vessels coated by said method and the use of such vessels protecting a compound or composition contained or received in said coated vessel against mechanical and/or chemical effects of the surface of the uncoated vessel material are also provided.
CA2761872A 2009-05-13 2010-05-12 Pecvd coating using an organosilicon precursor Active CA2761872C (en)

Applications Claiming Priority (35)

Application Number Priority Date Filing Date Title
US17798409P 2009-05-13 2009-05-13
US61/177,984 2009-05-13
US22272709P 2009-07-02 2009-07-02
US61/222,727 2009-07-02
US21390409P 2009-07-24 2009-07-24
US61/213,904 2009-07-24
US23450509P 2009-08-17 2009-08-17
US61/234,505 2009-08-17
US26132109P 2009-11-14 2009-11-14
US61/261,321 2009-11-14
US26328909P 2009-11-20 2009-11-20
US61/263,289 2009-11-20
US28581309P 2009-12-11 2009-12-11
US61/285,813 2009-12-11
US29815910P 2010-01-25 2010-01-25
US61/298,159 2010-01-25
US29988810P 2010-01-29 2010-01-29
US61/299,888 2010-01-29
US31819710P 2010-03-26 2010-03-26
US61/318,197 2010-03-26
US33362510P 2010-05-11 2010-05-11
US61/333,625 2010-05-11
EP10162760.2 2010-05-12
EP10162756.0 2010-05-12
EP10162758.6 2010-05-12
EP10162755.2A EP2253735B1 (en) 2009-05-13 2010-05-12 Vessel processing
EP10162755.2 2010-05-12
EP10162761.0 2010-05-12
EP10162756.0A EP2251452B1 (en) 2009-05-13 2010-05-12 Pecvd apparatus for vessel coating
PCT/US2010/034586 WO2010132591A2 (en) 2009-05-13 2010-05-12 Pecvd coating using an organosilicon precursor
EP10162760.2A EP2251454B1 (en) 2009-05-13 2010-05-12 Vessel coating and inspection
EP10162761.0A EP2251455B1 (en) 2009-05-13 2010-05-12 PECVD coating using an organosilicon precursor
EP10162758.6A EP2251671B1 (en) 2009-05-13 2010-05-12 Outgassing method for inspecting a coated surface
EP10162757.8 2010-05-12
EP10162757.8A EP2251453B1 (en) 2009-05-13 2010-05-12 Vessel holder

Publications (2)

Publication Number Publication Date
CA2761872A1 CA2761872A1 (en) 2010-11-18
CA2761872C true CA2761872C (en) 2021-10-26

Family

ID=45470135

Family Applications (2)

Application Number Title Priority Date Filing Date
CA2761905A Active CA2761905C (en) 2009-05-13 2010-05-12 Outgassing method for inspecting a coated surface
CA2761872A Active CA2761872C (en) 2009-05-13 2010-05-12 Pecvd coating using an organosilicon precursor

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CA2761905A Active CA2761905C (en) 2009-05-13 2010-05-12 Outgassing method for inspecting a coated surface

Country Status (1)

Country Link
CA (2) CA2761905C (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111270209B (en) * 2018-12-05 2023-12-12 东君新能源有限公司 Steam sputtering device, control system and control method
CN111239147B (en) * 2020-01-19 2023-04-14 山东电力工业锅炉压力容器检验中心有限公司 Darkroom-free fluorescence permeation detection method for tube bank clamping block on high-temperature heating surface of power station boiler
CN113894696B (en) * 2021-10-29 2023-01-24 北京烁科精微电子装备有限公司 Polishing monitoring device and polishing monitoring method

Also Published As

Publication number Publication date
CA2761905A1 (en) 2010-11-18
CA2761905C (en) 2017-11-28
CA2761872A1 (en) 2010-11-18

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Effective date: 20150507