CA2761872C - Revetement de pecvd a l'aide d'un precurseur d'organosilicium - Google Patents
Revetement de pecvd a l'aide d'un precurseur d'organosilicium Download PDFInfo
- Publication number
- CA2761872C CA2761872C CA2761872A CA2761872A CA2761872C CA 2761872 C CA2761872 C CA 2761872C CA 2761872 A CA2761872 A CA 2761872A CA 2761872 A CA2761872 A CA 2761872A CA 2761872 C CA2761872 C CA 2761872C
- Authority
- CA
- Canada
- Prior art keywords
- organosilicon precursor
- coating
- plasma
- generating
- setting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Medical Preparation Storing Or Oral Administration Devices (AREA)
Abstract
L'invention porte sur un procédé de revêtement d'une surface de substrat par dépôt en phase vapeur par procédé chimique assisté par plasma (PECVD). Le procédé comprend la génération d'un plasma à partir d'un réactif gazeux comprenant un précurseur d'organosilicium et facultativement O2. Le pouvoir lubrifiant, l'hydrophobicité et/ou les propriétés de barrière du revêtement sont réglées par le réglage du rapport de l'O2 au précurseur d'organosilicium dans le réactif gazeux, et/ou par la réglage de la puissance électrique utilisée pour générer le plasma. En particulier, l'invention porte sur un revêtement à pouvoir lubrifiant obtenu par ledit procédé. L'invention porte également sur des récipients revêtus par ledit procédé et sur l'utilisation de tels récipients protégeant un composé ou composition contenu ou reçu dans ledit récipient revêtu à l'encontre des effets mécaniques et/ou chimiques de la surface du matériau de récipient non revêtu.
Applications Claiming Priority (35)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17798409P | 2009-05-13 | 2009-05-13 | |
US61/177,984 | 2009-05-13 | ||
US22272709P | 2009-07-02 | 2009-07-02 | |
US61/222,727 | 2009-07-02 | ||
US21390409P | 2009-07-24 | 2009-07-24 | |
US61/213,904 | 2009-07-24 | ||
US23450509P | 2009-08-17 | 2009-08-17 | |
US61/234,505 | 2009-08-17 | ||
US26132109P | 2009-11-14 | 2009-11-14 | |
US61/261,321 | 2009-11-14 | ||
US26328909P | 2009-11-20 | 2009-11-20 | |
US61/263,289 | 2009-11-20 | ||
US28581309P | 2009-12-11 | 2009-12-11 | |
US61/285,813 | 2009-12-11 | ||
US29815910P | 2010-01-25 | 2010-01-25 | |
US61/298,159 | 2010-01-25 | ||
US29988810P | 2010-01-29 | 2010-01-29 | |
US61/299,888 | 2010-01-29 | ||
US31819710P | 2010-03-26 | 2010-03-26 | |
US61/318,197 | 2010-03-26 | ||
US33362510P | 2010-05-11 | 2010-05-11 | |
US61/333,625 | 2010-05-11 | ||
EP10162757.8 | 2010-05-12 | ||
EP10162756.0A EP2251452B1 (fr) | 2009-05-13 | 2010-05-12 | Dispositif pecvd pour le revêtement de récipients |
EP10162755.2 | 2010-05-12 | ||
EP10162760.2A EP2251454B1 (fr) | 2009-05-13 | 2010-05-12 | Procédé de dégazage pour inspecter une surface revêtue |
EP10162758.6A EP2251671B1 (fr) | 2009-05-13 | 2010-05-12 | Procédé de dégazage pour inspecter une surface revêtue |
EP10162755.2A EP2253735B1 (fr) | 2009-05-13 | 2010-05-12 | Traitement de récipient |
PCT/US2010/034586 WO2010132591A2 (fr) | 2009-05-13 | 2010-05-12 | Revêtement de pecvd à l'aide d'un précurseur d'organosilicium |
EP10162756.0 | 2010-05-12 | ||
EP10162758.6 | 2010-05-12 | ||
EP10162761.0A EP2251455B1 (fr) | 2009-05-13 | 2010-05-12 | Revêtement PECVD utilisant un précurseur organosilicié |
EP10162757.8A EP2251453B1 (fr) | 2009-05-13 | 2010-05-12 | Support de récipient |
EP10162761.0 | 2010-05-12 | ||
EP10162760.2 | 2010-05-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2761872A1 CA2761872A1 (fr) | 2010-11-18 |
CA2761872C true CA2761872C (fr) | 2021-10-26 |
Family
ID=45470135
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA2761905A Active CA2761905C (fr) | 2009-05-13 | 2010-05-12 | Procede de degazage pour inspecter une surface revetue |
CA2761872A Active CA2761872C (fr) | 2009-05-13 | 2010-05-12 | Revetement de pecvd a l'aide d'un precurseur d'organosilicium |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA2761905A Active CA2761905C (fr) | 2009-05-13 | 2010-05-12 | Procede de degazage pour inspecter une surface revetue |
Country Status (1)
Country | Link |
---|---|
CA (2) | CA2761905C (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111270209B (zh) * | 2018-12-05 | 2023-12-12 | 东君新能源有限公司 | 一种蒸汽溅射装置及控制系统、控制方法 |
CN111239147B (zh) * | 2020-01-19 | 2023-04-14 | 山东电力工业锅炉压力容器检验中心有限公司 | 一种电站锅炉高温受热面管排夹持块无暗室荧光渗透检测方法 |
CN113894696B (zh) * | 2021-10-29 | 2023-01-24 | 北京烁科精微电子装备有限公司 | 一种抛光监测装置和抛光监测方法 |
-
2010
- 2010-05-12 CA CA2761905A patent/CA2761905C/fr active Active
- 2010-05-12 CA CA2761872A patent/CA2761872C/fr active Active
Also Published As
Publication number | Publication date |
---|---|
CA2761905A1 (fr) | 2010-11-18 |
CA2761905C (fr) | 2017-11-28 |
CA2761872A1 (fr) | 2010-11-18 |
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Date | Code | Title | Description |
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EEER | Examination request |
Effective date: 20150507 |