CA2230275A1 - Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions - Google Patents

Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions Download PDF

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Publication number
CA2230275A1
CA2230275A1 CA 2230275 CA2230275A CA2230275A1 CA 2230275 A1 CA2230275 A1 CA 2230275A1 CA 2230275 CA2230275 CA 2230275 CA 2230275 A CA2230275 A CA 2230275A CA 2230275 A1 CA2230275 A1 CA 2230275A1
Authority
CA
Canada
Prior art keywords
acid
monosuccinic acid
monosuccinic
salt
polyamino
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA 2230275
Other languages
English (en)
Inventor
David A. Wilson
Alan D. Strickland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Chemical Co
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2230275A1 publication Critical patent/CA2230275A1/fr
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/26Organic compounds containing nitrogen
    • C11D3/33Amino carboxylic acids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/48Sulfur compounds
    • B01D53/52Hydrogen sulfide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/54Nitrogen compounds
    • B01D53/56Nitrogen oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Biomedical Technology (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Detergent Compositions (AREA)
  • Chemically Coating (AREA)

Abstract

Les acides polyamino-monosucciniques sont des chélatants efficaces utilisés dans le traitement de gaz (l'acide polyamino-monosucciniques se présentant de préférence sous la forme d'un chélate métallique, de préférence un complexe de fer). Du sulfure d'hydrogène peut être éliminé d'un fluide par la mise en contact de ce fluide avec une solution aqueuse à un pH adapté pour l'élimination de sulfure d'hydrogène, la solution contenant au moins un chélate de métal polyvalent de valence plus élevée d'au moins un acide polyamino-monosuccinique. Le NO¿x? peut être éliminé d'un fluide par la mise en contact de ce fluide avec une solution aqueuse d'au moins un chélate de métal de niveau de valence inférieur d'au moins un acide polyamino-monosuccinique. Les chélates de cuivre sont également utiles au dépôt de cuivre chimique. Concernant le dépôt de cuivre chimique, on décrit un procédé de dépôt de cuivre chimique sur une surface non métallique réceptive au cuivre déposé, consistant notamment à mettre en contact la surface non métallique avec une solution aqueuse comportant un sel de cuivre soluble, au moins un acide polyamino-monosuccinique et des bains de plaquage appropriés pour cet usage. L'invention concerne par ailleurs l'utilisation d'acides polyamino-monosucciniques dans des compositions détergentes de blanchissage contenant un tensioactif détergent et un adjuvant.
CA 2230275 1995-08-30 1996-08-29 Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions Abandoned CA2230275A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US304195P 1995-08-30 1995-08-30
US60/300,041 1995-08-30

Publications (1)

Publication Number Publication Date
CA2230275A1 true CA2230275A1 (fr) 1997-03-06

Family

ID=21703828

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 2230275 Abandoned CA2230275A1 (fr) 1995-08-30 1996-08-29 Chelatants degradables derives d'acides polyamino-monosucciniques, leurs utilisations et compositions

Country Status (4)

Country Link
EP (1) EP0871695A2 (fr)
BR (1) BR9610165A (fr)
CA (1) CA2230275A1 (fr)
WO (1) WO1997008287A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1165488B1 (fr) 1999-03-26 2003-08-13 The Dow Chemical Company Procede de preparation d'acides polyamino-monosucciniques et de leurs derives
US20060189797A1 (en) * 2003-06-27 2006-08-24 Pal Songe Magnetic polymer particles
EP2784181B1 (fr) * 2013-03-27 2015-12-09 ATOTECH Deutschland GmbH Solution de dépôt de cuivre chimique
CN116422130B (zh) * 2023-04-13 2024-01-23 西安赫立盖斯新能源科技有限公司 一种溶剂、溶剂的生产方法和生产装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB757704A (en) * 1952-04-22 1956-09-26 Dow Chemical Co Improvements in amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US2761874A (en) * 1954-09-30 1956-09-04 Dow Chemical Co Amino derivatives of n-alkyl substituted aspartic acids and their functional derivatives
US3773510A (en) * 1971-06-26 1973-11-20 Minnesota Mining & Mfg Additives to bleach/fix baths
US4704233A (en) * 1986-11-10 1987-11-03 The Procter & Gamble Company Detergent compositions containing ethylenediamine-N,N'-disuccinic acid
DE3829001A1 (de) * 1988-08-26 1990-07-05 Trigon Chemie Gmbh Asparaginsaeure-derivate und verfahren zu ihrer herstellung
JP3200465B2 (ja) * 1992-04-24 2001-08-20 富士写真フイルム株式会社 ハロゲン化銀写真感光材料用の処理組成物及びそれを用いた処理方法
GB9216409D0 (en) * 1992-08-01 1992-09-16 Procter & Gamble Detergent compositions
GB2293020B (en) * 1993-05-20 1997-08-27 Dow Chemical Co Succinic acid derivative degradable chelants, uses and compositions thereof
GB9422762D0 (en) * 1994-11-11 1995-01-04 Ass Octel Use of a compound
US5652085A (en) * 1995-08-30 1997-07-29 Eastman Kodak Company Succinic acid derivative degradable chelants, uses and composition thereof
US5585226A (en) * 1995-08-30 1996-12-17 Eastman Kodak Company Polyamino monoesuccinates for use in photographic processes

Also Published As

Publication number Publication date
EP0871695A2 (fr) 1998-10-21
WO1997008287A3 (fr) 1997-05-15
BR9610165A (pt) 1998-08-04
WO1997008287A2 (fr) 1997-03-06

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