CA2198788A1 - Reciprocating sputtering assembly for use in lens coating apparatus - Google Patents
Reciprocating sputtering assembly for use in lens coating apparatusInfo
- Publication number
- CA2198788A1 CA2198788A1 CA 2198788 CA2198788A CA2198788A1 CA 2198788 A1 CA2198788 A1 CA 2198788A1 CA 2198788 CA2198788 CA 2198788 CA 2198788 A CA2198788 A CA 2198788A CA 2198788 A1 CA2198788 A1 CA 2198788A1
- Authority
- CA
- Canada
- Prior art keywords
- sputtering
- lens
- coating
- assembly
- drive means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention relates to an apparatus for highly uniform deposition and formation of thin film coatings for optical lenses, such as anti-reflective or anti-glare coatings, using magnetron sputtering technology. A sputter assembly is diclosed for use in a vacuum sputtering apparatus for coating an optical lens, which assembly comprises sputtering means for sputtering coating material over a surface of the lens and a drive means for effecting reciprocating movement of the sputtering means such that in operation the drive means enables the sputtering means to apply a substantially uniform coat of the material over the surface.
Description
2198'78g -Reciprocating Sputtering Assembly for Use in Lens Coating Apparatus The present invention relates to a sputtering system for the coating of optical lenses. More specifically the invention relates to an apparatus for highly uniform deposition and formation of thin film coatings for such lenses, such as anti-reflective or anti-glare coatings, using magnetron sputtering technology.
The use of magnetron sputtering technology for the deposition of optical coatings on optical lenses, such as camera or eyeglass lenses, is generally known for example, see U.S. Patent No.4,851,095 (Scobey et al.). However, this technology has produced substantially inferior results relative to known, but costly, high-vacuum vapour deposition technology. In particular, sputtering technology to date has generally produced lenses having non-uniform coatings and consequent inferior optical characteristics.
In a typical sputtering apparatus known today, a linear sputter magnetron emits coating particles from a stationary target, such as aluminium plate, which are then deposited on a nearby lens surface in a density partly affected by the curved surface of the lens. Were it not for the curved surface, the particles would likely form a relatively uniform coating on the surface. However, due to the curvature, and the resultant larger surface area to be coated per unit of radial distance near the perimeter of the lens compared to the same radial distance near the centre of the lens, ~1987~8 sputtered coating particles directed to the lens tend to coat the centre more densely than areas near the perimeter.
One attempted solution to the above problem has been to provide a relatively large magnetron target and adapt the magnetron to provide a movable magnetic and plasma field in front of the target. The latter can be achieved by moving a magnetic field source behind the target; the field in front of the target moves as the magnetic field source moves. By controlling the location of the magnetic field in front of the target, sputtered particles may be directed preferentially to the outer areas of the lens to compensate for the tendency to coat the centre more densely.
However, this requires quite a large, expensive target.
Another type of magnetron sputter device utilizes a cylindrical target having a movable magnetic field source in a central bore. Toroidal shaped magnetic and plasma fields are thereby generated adjacent a circumferential zone of the target, the location thereof being determined by the location of the magnetic field source in the bore. A problem with this type of structure is that it allows for only one type of coating material to be used at a time, which is a serious limitation for lens applications requiring multiple layers of coating materials. Such a cylindrical target is also quite wasteful of valuable optical quality coating material in that the material is sputtered indiscriminately from around the target to regions between lenses mounted in a multiple lens sputtering apparatus. Thls kind of ._ target also tends to result in rapid wear of the movable magnetic field source and requires costly and more complex structures to deal with the cooling of the target during use.
It is therefore apparent that there is a need for a sputtering system which provides for optical quality, i.e. uniform, deposition of coatings on optical lenses. This would greatly decrease the cost of obtaining such result compared to the only viable alternative, namely high-vacuum vapour deposition.
Summary of the Invention The invention therefore provides a sputter assembly for use in a vacuum sputtering apparatus for coating an optical lens, which assembly comprises sputtering means for sputtering coating material over a surface of the lens and a drive means for effecting reciprocating movement of the sputtering means such that in operation the drive means enables the sputtering means to apply a substantially uniform coat of the material over the lens surface.
The reciprocating movement results in sputtered material being directed to areas of the lens surface which are above and below the central area to a greater extent than would occur absent such reciprocating movement, thereby causing a more uniform deposition of the coating material over the entire surface of the lens. The travel distance of the sputtering means during the reciprocating movement may be adjusted depending on the size and/or degree of curvature of the lens. A larger travel distance would be selected -for larger or more curved lenses. Preferably the drive means is adjustable to select a desired travel distance. The drive means therefore preferably comprises a motor and drive linkage between the motor and a lower area of the base, the motor and drive linkage being movably mounted adjacent the base for obtaining selective control of distance to be moved by the sputtering means during the reciprocating movement.
The invention further provides a vacuum sputtering apparatus for coating an optical lens which comprises a lens mount and the above described sputtering assembly.
Brief Description of the Drawings As illustrations of preferred embodiments of the invention:
Figure 1 is a cross-sectional side view of a sputter apparatus embodying the present invention;
Figure 2 is a cross-sectional side view of the sputter apparatus of Figure 1 along a vertical axis at 90 degrees to the cross-sectional axis of the view of Figure 1.
Figure 3 is a cross-sectional side view of a reciprocatable magnetron sputtering assembly of the apparatus of Figure 1;
Figure 4 is a horizontal cross-sectional view through a top area of the sputtering assembly of Figure 3 along the plane B-B
thereof;
Figure 5 is a cross-sectional view of the assembly of Figure 3 along a vertical axis at 90 degrees to the cross-sectional axis ~13~7~8 of the view of Figure 3; and Figure 6 is an overhead view of the apparatus of Figure 1.
Description of Preferred Embodiments Figure 1 provides a good schematic cross-sectional view of a preferred embodiment of a sputtering apparatus according to the present invention. There is a chamber 1 enclosing the interior space 2, lens holders 3, and linear magnetron sputtering device 4.
The latter device is mounted on a base comprising an elongated cylindrical shaft 5 having a bore 6 for accommodating a plurality of conduits. The height of 4 and 5 together is about 50cm. The shaft 5 is slidably secured to a base of the chamber 1 at coupling 7. Coupling 7 includes two oil sealed o-rings for forming a secure seal with the outer wall of slidable shaft 5. The seal at coupling 7 must be secure in order to preserve the essential partial vacuum created in the interior space 2 during sputtering operation of the apparatus, which operation includes reciprocating motion of the shaft through the coupling. Said reciprocating motion is enabled in this embodiment by the motors 8, 9, cam 10 and arm 11. When motor 9 is operated this causes the cam 10 to operate arm 11 which, in turn, through pivot 16 forces shaft 5 to move upwards or downwards depending on the cycle of movement of the cam 10. Motor 9 is slidably mounted on overhead rail 12, and motor 8 may be selectively operated so as to move plunger 13 to cause motor 9 to slide to a desired location on rail 12. If plunger 13 is activated by motor 8 so as to cause motor 9 to be positioned closer to the shaft 5, arm 11 will simultaneously be moved relative to its slidable engagement with shaft 5 at position 14, which engagement is facilitated by slot 15. This will also result in the shaft 5 reciprocating vertically along a smaller linear distance (or "travel distance") compared to when the motor 9 is positioned farther away from the shaft 5.
Reciprocating movement of the shaft 5 will consequently cause sputtered coating particles to be directed to upper or lower areas of the lens surface in their path, depending on the position of the magnetron sputtering device in its line of reciprocating motion when a given particle is sputtered. Since the sputtering occurs continuously with the reciprocating motion of the sputtering device, a sinusoidal wave-like line of sputtered particles results, such line terminating at the lens surface in a manner which over time covers the entire surface of the lens. A beneficial result of the generation of such line of particles is a substantially more uniform deposition of particles on the lens surface. Uniformity of deposition may be assessed using conventional spectrophotometry.
Adjustments to the travel distance of the reciprocating magnetron may be made consequent to deposition assessment.
The travel distance of the magnetron sputtering device for a reciprocating stroke may be adjusted, by selective positioning of the motor 9, to accommodate different sizes of lenses for coating.
The larger the diameter of the lens, or the greater the curvature ~ 2lsa~s~
of the lens, the larger the travel distance should be. In the illustrated embodiment there is a travel distance in the range of a maximum of about 50mm to a minimum of about lOmm. However, it will be readily appreciated by those skilled in the art that such or other ranges are simply a matter of design to be selected depending on the anticipated size of lens for coating in the apparatus. The stroke frequency is preferably about 50 to 100 cycles per minute. In the illustrated embodiment the frequency is set at about 65 cycles per minute but it is conceivable that such could be made adjustable.
In view of the stroke frequency and unavoidable friction at the secure coupling 7, heat build-up on the shaft 5 occurs during operation. Preferably, the shaft 5 is made or coated with high heat tolerant material accordingly.
In Figure 3 the magnetron sputtering device 4 is more clearly shown. Stainless steel mounting and power supply plates 20, 21 secure copper target holders 23, 24 for targets 25, 26 respectively. Said targets may be plates of aluminium, zirconium, titanium, tantalum, or silicon, for example. Power supply cables (not shown) for carrying about 5Kw to the power supply plates 20, 21 run through the bore 6 of shaft 5. Pressurized cooling water inlet and outlet lines also run through the bore 6 for providing cooling water to the magnetron 4. Gas supply lines may also be accommodated through the bore 6 for supplying a plasma forming system on the fronts of the targets.
Figure 4 is a top view of the magnetron 4 showing the aforementioned magnetron features. Upper parts of gas conduits 27 are also shown.
Figure 6 is a top view of the sputtering apparatus including the vertically reciprocating magnetron 4. Lenses to be coated in the apparatus are secured at about the same height at a plurality of peripheral locations 30 such that a main surface of each lens is facing towards the centre where the sputtering magnetron 4 is located. When operated, the lenses are in unison moved around the central magnetron. Each lens is thereby moved laterally in an arc across the front of each target in turn, thereby being exposed to sputtered coating material which coats the facing surface. The apparatus optionally includes in each lens mount a mechanical means for selectively turning each lens 180 degrees so as to result in each opposite main surface of the lens facing towards the magnetron for coating purposes.
The invention has been described above by reference to preferred embodiments, but it will be understood to persons skilled in the art that such embodiments admit of variations not specifically described herein but which are within the spirit and scope of the invention as claimed hereinafter.
The use of magnetron sputtering technology for the deposition of optical coatings on optical lenses, such as camera or eyeglass lenses, is generally known for example, see U.S. Patent No.4,851,095 (Scobey et al.). However, this technology has produced substantially inferior results relative to known, but costly, high-vacuum vapour deposition technology. In particular, sputtering technology to date has generally produced lenses having non-uniform coatings and consequent inferior optical characteristics.
In a typical sputtering apparatus known today, a linear sputter magnetron emits coating particles from a stationary target, such as aluminium plate, which are then deposited on a nearby lens surface in a density partly affected by the curved surface of the lens. Were it not for the curved surface, the particles would likely form a relatively uniform coating on the surface. However, due to the curvature, and the resultant larger surface area to be coated per unit of radial distance near the perimeter of the lens compared to the same radial distance near the centre of the lens, ~1987~8 sputtered coating particles directed to the lens tend to coat the centre more densely than areas near the perimeter.
One attempted solution to the above problem has been to provide a relatively large magnetron target and adapt the magnetron to provide a movable magnetic and plasma field in front of the target. The latter can be achieved by moving a magnetic field source behind the target; the field in front of the target moves as the magnetic field source moves. By controlling the location of the magnetic field in front of the target, sputtered particles may be directed preferentially to the outer areas of the lens to compensate for the tendency to coat the centre more densely.
However, this requires quite a large, expensive target.
Another type of magnetron sputter device utilizes a cylindrical target having a movable magnetic field source in a central bore. Toroidal shaped magnetic and plasma fields are thereby generated adjacent a circumferential zone of the target, the location thereof being determined by the location of the magnetic field source in the bore. A problem with this type of structure is that it allows for only one type of coating material to be used at a time, which is a serious limitation for lens applications requiring multiple layers of coating materials. Such a cylindrical target is also quite wasteful of valuable optical quality coating material in that the material is sputtered indiscriminately from around the target to regions between lenses mounted in a multiple lens sputtering apparatus. Thls kind of ._ target also tends to result in rapid wear of the movable magnetic field source and requires costly and more complex structures to deal with the cooling of the target during use.
It is therefore apparent that there is a need for a sputtering system which provides for optical quality, i.e. uniform, deposition of coatings on optical lenses. This would greatly decrease the cost of obtaining such result compared to the only viable alternative, namely high-vacuum vapour deposition.
Summary of the Invention The invention therefore provides a sputter assembly for use in a vacuum sputtering apparatus for coating an optical lens, which assembly comprises sputtering means for sputtering coating material over a surface of the lens and a drive means for effecting reciprocating movement of the sputtering means such that in operation the drive means enables the sputtering means to apply a substantially uniform coat of the material over the lens surface.
The reciprocating movement results in sputtered material being directed to areas of the lens surface which are above and below the central area to a greater extent than would occur absent such reciprocating movement, thereby causing a more uniform deposition of the coating material over the entire surface of the lens. The travel distance of the sputtering means during the reciprocating movement may be adjusted depending on the size and/or degree of curvature of the lens. A larger travel distance would be selected -for larger or more curved lenses. Preferably the drive means is adjustable to select a desired travel distance. The drive means therefore preferably comprises a motor and drive linkage between the motor and a lower area of the base, the motor and drive linkage being movably mounted adjacent the base for obtaining selective control of distance to be moved by the sputtering means during the reciprocating movement.
The invention further provides a vacuum sputtering apparatus for coating an optical lens which comprises a lens mount and the above described sputtering assembly.
Brief Description of the Drawings As illustrations of preferred embodiments of the invention:
Figure 1 is a cross-sectional side view of a sputter apparatus embodying the present invention;
Figure 2 is a cross-sectional side view of the sputter apparatus of Figure 1 along a vertical axis at 90 degrees to the cross-sectional axis of the view of Figure 1.
Figure 3 is a cross-sectional side view of a reciprocatable magnetron sputtering assembly of the apparatus of Figure 1;
Figure 4 is a horizontal cross-sectional view through a top area of the sputtering assembly of Figure 3 along the plane B-B
thereof;
Figure 5 is a cross-sectional view of the assembly of Figure 3 along a vertical axis at 90 degrees to the cross-sectional axis ~13~7~8 of the view of Figure 3; and Figure 6 is an overhead view of the apparatus of Figure 1.
Description of Preferred Embodiments Figure 1 provides a good schematic cross-sectional view of a preferred embodiment of a sputtering apparatus according to the present invention. There is a chamber 1 enclosing the interior space 2, lens holders 3, and linear magnetron sputtering device 4.
The latter device is mounted on a base comprising an elongated cylindrical shaft 5 having a bore 6 for accommodating a plurality of conduits. The height of 4 and 5 together is about 50cm. The shaft 5 is slidably secured to a base of the chamber 1 at coupling 7. Coupling 7 includes two oil sealed o-rings for forming a secure seal with the outer wall of slidable shaft 5. The seal at coupling 7 must be secure in order to preserve the essential partial vacuum created in the interior space 2 during sputtering operation of the apparatus, which operation includes reciprocating motion of the shaft through the coupling. Said reciprocating motion is enabled in this embodiment by the motors 8, 9, cam 10 and arm 11. When motor 9 is operated this causes the cam 10 to operate arm 11 which, in turn, through pivot 16 forces shaft 5 to move upwards or downwards depending on the cycle of movement of the cam 10. Motor 9 is slidably mounted on overhead rail 12, and motor 8 may be selectively operated so as to move plunger 13 to cause motor 9 to slide to a desired location on rail 12. If plunger 13 is activated by motor 8 so as to cause motor 9 to be positioned closer to the shaft 5, arm 11 will simultaneously be moved relative to its slidable engagement with shaft 5 at position 14, which engagement is facilitated by slot 15. This will also result in the shaft 5 reciprocating vertically along a smaller linear distance (or "travel distance") compared to when the motor 9 is positioned farther away from the shaft 5.
Reciprocating movement of the shaft 5 will consequently cause sputtered coating particles to be directed to upper or lower areas of the lens surface in their path, depending on the position of the magnetron sputtering device in its line of reciprocating motion when a given particle is sputtered. Since the sputtering occurs continuously with the reciprocating motion of the sputtering device, a sinusoidal wave-like line of sputtered particles results, such line terminating at the lens surface in a manner which over time covers the entire surface of the lens. A beneficial result of the generation of such line of particles is a substantially more uniform deposition of particles on the lens surface. Uniformity of deposition may be assessed using conventional spectrophotometry.
Adjustments to the travel distance of the reciprocating magnetron may be made consequent to deposition assessment.
The travel distance of the magnetron sputtering device for a reciprocating stroke may be adjusted, by selective positioning of the motor 9, to accommodate different sizes of lenses for coating.
The larger the diameter of the lens, or the greater the curvature ~ 2lsa~s~
of the lens, the larger the travel distance should be. In the illustrated embodiment there is a travel distance in the range of a maximum of about 50mm to a minimum of about lOmm. However, it will be readily appreciated by those skilled in the art that such or other ranges are simply a matter of design to be selected depending on the anticipated size of lens for coating in the apparatus. The stroke frequency is preferably about 50 to 100 cycles per minute. In the illustrated embodiment the frequency is set at about 65 cycles per minute but it is conceivable that such could be made adjustable.
In view of the stroke frequency and unavoidable friction at the secure coupling 7, heat build-up on the shaft 5 occurs during operation. Preferably, the shaft 5 is made or coated with high heat tolerant material accordingly.
In Figure 3 the magnetron sputtering device 4 is more clearly shown. Stainless steel mounting and power supply plates 20, 21 secure copper target holders 23, 24 for targets 25, 26 respectively. Said targets may be plates of aluminium, zirconium, titanium, tantalum, or silicon, for example. Power supply cables (not shown) for carrying about 5Kw to the power supply plates 20, 21 run through the bore 6 of shaft 5. Pressurized cooling water inlet and outlet lines also run through the bore 6 for providing cooling water to the magnetron 4. Gas supply lines may also be accommodated through the bore 6 for supplying a plasma forming system on the fronts of the targets.
Figure 4 is a top view of the magnetron 4 showing the aforementioned magnetron features. Upper parts of gas conduits 27 are also shown.
Figure 6 is a top view of the sputtering apparatus including the vertically reciprocating magnetron 4. Lenses to be coated in the apparatus are secured at about the same height at a plurality of peripheral locations 30 such that a main surface of each lens is facing towards the centre where the sputtering magnetron 4 is located. When operated, the lenses are in unison moved around the central magnetron. Each lens is thereby moved laterally in an arc across the front of each target in turn, thereby being exposed to sputtered coating material which coats the facing surface. The apparatus optionally includes in each lens mount a mechanical means for selectively turning each lens 180 degrees so as to result in each opposite main surface of the lens facing towards the magnetron for coating purposes.
The invention has been described above by reference to preferred embodiments, but it will be understood to persons skilled in the art that such embodiments admit of variations not specifically described herein but which are within the spirit and scope of the invention as claimed hereinafter.
Claims (5)
1. A sputter assembly for use in a vacuum sputtering apparatus for coating an optical lens, which assembly comprises sputtering means for sputtering coating material over a surface of the lens and a drive means for effecting reciprocating movement of the sputtering means such that in operation said drive means enables said sputtering means to apply a substantially uniform coat of said material over said surface.
2. The sputter assembly of claim 1 wherein said drive means is drivably connected to a base of said sputtering means, said base accommodating power and fluid conduits.
3. The sputter assembly of claim 2 wherein said drive means is configured for effecting said reciprocating movement in a substantially vertical alignment in said sputtering apparatus.
4. The sputter assembly of claim 2 wherein said drive means comprises a motor and drive linkage between said motor and a lower area of said base, said motor and drive linkage being movably mounted adjacent the base for obtaining selective control of distance to be moved by said sputtering means during said reciprocating movement.
5. A vacuum sputtering apparatus for applying an optical coating to an optical lens, which apparatus comprises a lens mount and the sputter assembly of claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA 2198788 CA2198788A1 (en) | 1997-02-28 | 1997-02-28 | Reciprocating sputtering assembly for use in lens coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA 2198788 CA2198788A1 (en) | 1997-02-28 | 1997-02-28 | Reciprocating sputtering assembly for use in lens coating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2198788A1 true CA2198788A1 (en) | 1998-08-28 |
Family
ID=4160068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 2198788 Abandoned CA2198788A1 (en) | 1997-02-28 | 1997-02-28 | Reciprocating sputtering assembly for use in lens coating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA2198788A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108780742A (en) * | 2016-03-05 | 2018-11-09 | 应用材料公司 | Method and apparatus for controlling ionic fraction in physical gas-phase deposition |
-
1997
- 1997-02-28 CA CA 2198788 patent/CA2198788A1/en not_active Abandoned
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108780742A (en) * | 2016-03-05 | 2018-11-09 | 应用材料公司 | Method and apparatus for controlling ionic fraction in physical gas-phase deposition |
| CN108780742B (en) * | 2016-03-05 | 2023-07-18 | 应用材料公司 | Method and apparatus for controlling ion fraction in a physical vapor deposition process |
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| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Dead |