CA2081127A1 - Low-contamination impact tool for breaking silicon - Google Patents
Low-contamination impact tool for breaking siliconInfo
- Publication number
- CA2081127A1 CA2081127A1 CA002081127A CA2081127A CA2081127A1 CA 2081127 A1 CA2081127 A1 CA 2081127A1 CA 002081127 A CA002081127 A CA 002081127A CA 2081127 A CA2081127 A CA 2081127A CA 2081127 A1 CA2081127 A1 CA 2081127A1
- Authority
- CA
- Canada
- Prior art keywords
- impact tool
- core
- low
- silicon
- contamination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000011109 contamination Methods 0.000 title claims abstract description 26
- 229910052710 silicon Inorganic materials 0.000 title abstract description 26
- 239000010703 silicon Substances 0.000 title abstract description 26
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 21
- 239000000057 synthetic resin Substances 0.000 claims abstract description 21
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 14
- 239000000956 alloy Substances 0.000 claims abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 25
- 239000000463 material Substances 0.000 abstract description 11
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000011162 core material Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 10
- 239000004814 polyurethane Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000010960 cold rolled steel Substances 0.000 description 6
- 229920002635 polyurethane Polymers 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
- -1 for example Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000002231 Czochralski process Methods 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000011527 polyurethane coating Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25D—PERCUSSIVE TOOLS
- B25D1/00—Hand hammers; Hammer heads of special shape or materials
- B25D1/02—Inserts or attachments forming the striking part of hammer heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25D—PERCUSSIVE TOOLS
- B25D9/00—Portable percussive tools with fluid-pressure drive, i.e. driven directly by fluids, e.g. having several percussive tool bits operated simultaneously
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25D—PERCUSSIVE TOOLS
- B25D2222/00—Materials of the tool or the workpiece
- B25D2222/21—Metals
- B25D2222/51—Hard metals, e.g. tungsten carbide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25D—PERCUSSIVE TOOLS
- B25D2222/00—Materials of the tool or the workpiece
- B25D2222/54—Plastics
- B25D2222/69—Foamed polymers, e.g. polyurethane foam
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Percussive Tools And Related Accessories (AREA)
- Silicon Compounds (AREA)
Abstract
LOW-CONTAMINATION IMPACT TOOL FOR BREAKING SILICON
ABSTRACT
The present invention is a low-contamination impact tool especially useful for the breaking of semiconductor-grade silicon into pieces. The low-contamination impact tool comprises a core forming a handle portion and a head portion, the head portion contacting a tungsten carbide alloy striking element. The core is encapsulated in a synthetic resin material. The preferred synthetic resin is urethane.
ABSTRACT
The present invention is a low-contamination impact tool especially useful for the breaking of semiconductor-grade silicon into pieces. The low-contamination impact tool comprises a core forming a handle portion and a head portion, the head portion contacting a tungsten carbide alloy striking element. The core is encapsulated in a synthetic resin material. The preferred synthetic resin is urethane.
Description
2 ~3 ~ 2 l LOW-CONTAMINATION IMPACT TOOL FOR BREAKING SILICON
The present invention is a low-contamination impact tool especially useful for the breaking of semiconductor-grade silicon into pieces. The low-contamination impact tool comprises a core forming a handle portion and a head portion, the head portion contacting a tungsten carbide alloy striking element. The core is encapsulated in a synthetic resin.
High density, integrated, electronic circuits require wafers of monocrystalline silicon of high puri~y. Of particular problem is transistional metal impurities including amon~ others copper, gold, iron, cobalt, nickel, chromium, tantalum, zinc and tungsten and impurities such as carbon, boron, phosphorous, aluminum and arsenic. These impurities, even in small ~uantities, introduce defect sites in semiconductor grade silicon which can ultimately result in degraded device performance and limit circuit density.
Typically, a polycrystaltine silicon of high purity is formed by chemical vapor deposition of a high purity chlorosilane gas onto a heated silicon substrate. The resulting product is rods of polycrystalline silicon. The polycrystalline silicon rods must be further processed to produce a monocrystalline silicon from which silicon wafers can be cut.
A significant portion of the monocrystalline silicon required by the semiconductor industry is produced by the well known Czochralski process. In a typical Czochralski type process, silicon pieces are melted in an appropriate vessel and a monocrystalline silicon seed crystal is used to draw a monocrystalline rod of semiconductor-grade silicon from the melt. Control of this crystal growth process 2 ~ 2 7 requires that the silicon pieces added to the melt containing vessel be within a defined size range. Therefore, it is necessary that the polycrystalline silicon rods ormed during the chemical vaporization deposition process be broken into pieces of suitable size.
The low-contamination impact tool described as the present iltvention is especially useful ior breaking silicon into pieces. The inventors have discovered that during the breaking process, the silicon can be significantly contaminated by contact with the surfaces of the breaking instrument, including the handle and striking surfaces. The present invention reduces ~he contamination associated with the breaking instrument by covering all surfaces, but the striking surface, with a low-contamination synthetic resin.
The exposed striking surface is formed of a tungsten carbide alloy, which is also of a low-contamination nature.
Maeda, U.S. Patent No. 4,697,481, issued October 6, 1987, describes a hammer including a head core and a handle core, where the head core and handle core are imbedded in a resin, with the exception of one end of the head core which serves as a striking surface. Maeda describes the striking surface as being made of a ferrous metal.
Porter, U.S. Patent No. 3,640,324, issued February 8, 1972, describes a forged steel hammer head having a striking face provided with a layer of electrodeposited tungsten carbide. The tungsten carbide layer is reported to provide an antislip and wear-resistant surface on the striking face.
The present invention is a low-contamination impact tool especially useful for the breaking of semiconductor-grade silicon into pieces. The low-contamination impact tool comprises a core formin~ a handle portion and a head portion, the head portion contacting a tungsten carbide alloy striking 2~8~27 element. The core is encapsulated in a synthetic resin material. The preferred synthetic resin is urethane.
Figure 1 illustrates a cross-sectional view of an embodiment of the present in~ention.
The present invention is a low- contamination impact tool. The tool is designed especially to break semiconductor grade silicon into pieces without imparting signi.ficant contamination to the pieces. The low-contamination impact tool comprises: (A) a core forming a handle portion and a head portion, (B) a tungsten carbide alloy striking element having an end contacted with the head portion of the core and (C) a shell of synthetic resin encapsulating the core.
In order to further clarify the concept of the present invention, one exemplary embodiment of the invention will be specifically described referring to the drawing provided as Figure 1.
The low-contamination impact tool comprises a core consisting of handle portion 1 and head portion 2. The core can be formed from any metal, metal alloy, plastic or composite of sufficient rigidity and strength to deliver an impact to a surface. Preferred is when the core is fonned from a metal or metal alloy, for example, carbon steel, stainless steel, inconel, monel or hasteloy. More preferred is when the core is formed from AISI 1018 cold rolled steel.
The size of the core is not critical to the present invention. Those skilled in the art will recognize that the core must have sufficient cross-sectional area to prevent bending and breaking of the core during use of the low-contamination impact tool as a breaking instrument. The required cross-sectional area will depend upon the material from which the core is constructed as well as the length of handle portion 1. When AISI 1018 cold rolled steel is used as the material of construction of the core material, and the 2~8~ ~ 2 ~
low-comtamination impact tool is to be used for the breaking of silicon, a length of about 8 inches to 12 inches for handle portion 1 and a cross-sectional cliameter of about 0.4 to 0.5 inches for handle portion 1 is suitable.
Head portion 2 can be constructed of the same or different material tharl handle portion ]L. Preferred is when head portion 2 is formed from the same material as handle portion 1.
Head portion 2 and handle portion 1 are connected.
The connection can be achieved by forming the core as a single element by, for example, molding, casting, stamping, cutting or machining, depending upon the particular material of fabrication. Alternatively, head portion 2 and handle portion 1 can be formed separately and connected by, for example, wedging, welding, brazing, fusing, threading or other standard ~eans for connecting two solid objects. When the core is formed from AISI 1018 cold rolled steel, it is preferred that head portion 2 and handle portion 1 be iormed separately and connected by welding.
The size of head portion 2 is determined by the material of fabrication, the size of handle portion 1, the method of securing striking element 4 and the size of striking element 4. Generally, when handle portion 1 and head portion 2 are formed from AISI 1018 cold rolled steel, it is preferred that head portion 2 have a length of about one inch to two inches and a diameter of about 0.5 to one inch.
Head portion 2 is secured in contact with striking element 4. The method of securing contact of head portion 2 with striking element 4 is not critical to the present invention. However, in a preferred embodiment of the present invention striking element 4 is secured in contact with head portion 2 during the process of encapsulating the core with a ~:a8~r~
synthetic resin. The synthetic resin maintains the position of striking element 4, as illustrated in Figure 1. The advantage of this method of securing striking element 4 is that the striking element can be easily recovered and reused if the remainder of the low-contamination impact tool is damaged. Alternatively, striking element 4 can be directly secured to head portion 2 by standard means, as described above, for attaching two solid objects.
Striking element 4 is formed from a tungsten carbide alloy, where cobalt is the alloying metal. It is preferred that the tungsten carbide alloy contain about 8 to 15 weight percent cobalt. More preferred is when the tungsten carbide alloy contains about 10 to 13 weight percent cobalt. In general, the shape of striking element 4 is not critical to the present invention. However, in a preferred embodiment of the present invention striking element 4 is formed in a generally cylindrical shape with a constricted central portion. The constricted central portion helps secure striking element 4 in contact with head portion 2, when a synthetic resin is used as the securing means. The constriction can be about one to 30 percent of the diameter of striking element 4. Preferred is when the constriction is about five to 20 percent of the diameter of striking element 4.
In a preferred embodiment of the present invention, the diameter of striking element 4 is within a range of about 0.5 to one inch.
Striking element 4 has striking face 5. The radius of curvature of the edge of striking face 5 is important to minimize breaking of particles rom striking element 4 during use. A radius of about 0.03 to 0.25 inch is considered useful. Preferred is a radius of about 0.07 to 0.12 inch.
2~ ~ 127 : -6-The core is encapsulated in a synthetic resin to form cover 3. The purpose of encapsulating the core in the synthetic resin is to prevent the core from contacting the material to be brol~en with the low-contamination impact tool.
The synthetic resin is selected so as to impart minimal undesirable contamination to the material to be broken. By "synthetic resin" is meant highly cross-linked polymeric materials that are not naturally occurring. The synthetic resin can be for e~ample, polyurethane, polypropylene, polyethylene or polycarbonate. Preferred is when the synthetic resin is polyurethane. Even more preerred is when the synthetic resin is a polyurethane having a Shore Hardness of about 90 to 97.
Cover 3 can be formed around the core and striking element 4 by injecting or casting the synthetic resin into a cavity of a mold which has the same shape as the external shape of cover 3. In the preferred embodiment, the core is placed in the mold, striking element 4 positioned as illustrated in Figure 1 and the synthetic resin injected and cured, securing striking element 4 in contact with head portion 2.
Example 1 (Not within the scope of the present invention~
Silicon samples were prepared by breaking a rod of polycrystalline silicon with an impact tool having a non-encapsulated handle and head formed from AISI 1018 cold rolled steel. A tungsten carbide alloy striking element was attached to the head of the impact tool. The tungsten carbide alloy contained about 12 weight percent cobalt.
During the breaking process, care was taken to contact each piece of silicon with the handle of the impact tool. Samples of silicon pieces were analyzed for iron and phosphorus surface contamination by graphite furnace atomic absorption and photoluminesience techniques, respectively. The results are presented in Table 1.
Table 1 Contamination of Silicon Pieces by Contact With Impact Tool Uncoated Handle Sample No. Fe ppb P ppb 1 0.9~ 0.27 2 0.74 0.29 - 3 0.79 0.43 4 O.B0 0-37 0.63 0.07 6 0.67 0.20 Mean0.76 0.27 Example 2 Silicon samples were prepared by breaking a rod of polycrystalline silicon with an impact tool ha~ing a poly-urethane encapsulated handle and head. The handle and head were formed from AISI 1018 cold rolled steel. The poly-urethane coating was formed from a polyether based liquid, isocyanate-terminated prepolymer using ~4,4'-methylene-bis(orthochloroaniline)~ as catalyst to effect cure. The cured polyurethane had a Shore A durometer of about 95.
A tungsten carbide alloy striking element was attached to the head of the impact tool by molding into the polyurethane. The tungsten carbide alloy was as described for Example 1. During the breaking process, care was taken to contact each sample of silicon with the urethane coated handle of the impact tool. The silicon samples were analyzed as described in Example 1 and the results are presented in Table 2.
2 ~ 7 Table 2 Csntamination of Silicon Pieces by Contact With Impact Tool Polyurethane Coated Handle Sample No. Fe ppb P ppb 1 0.35 0.~9 2 ~.~6 0.13 3 0.3~ 0.1~
0.~0 0.02 : 5 0.45 O.Ql 6 0.~0 0.06 Mean 0.42 0.08 ~ The data presented in Table 2, when contrasted with :~ the data of Table 1, demonstrate the contamination that can occur to silicon pieces when they are contacted with the : unencapsulated handle of the impact tool.
~, ;
The present invention is a low-contamination impact tool especially useful for the breaking of semiconductor-grade silicon into pieces. The low-contamination impact tool comprises a core forming a handle portion and a head portion, the head portion contacting a tungsten carbide alloy striking element. The core is encapsulated in a synthetic resin.
High density, integrated, electronic circuits require wafers of monocrystalline silicon of high puri~y. Of particular problem is transistional metal impurities including amon~ others copper, gold, iron, cobalt, nickel, chromium, tantalum, zinc and tungsten and impurities such as carbon, boron, phosphorous, aluminum and arsenic. These impurities, even in small ~uantities, introduce defect sites in semiconductor grade silicon which can ultimately result in degraded device performance and limit circuit density.
Typically, a polycrystaltine silicon of high purity is formed by chemical vapor deposition of a high purity chlorosilane gas onto a heated silicon substrate. The resulting product is rods of polycrystalline silicon. The polycrystalline silicon rods must be further processed to produce a monocrystalline silicon from which silicon wafers can be cut.
A significant portion of the monocrystalline silicon required by the semiconductor industry is produced by the well known Czochralski process. In a typical Czochralski type process, silicon pieces are melted in an appropriate vessel and a monocrystalline silicon seed crystal is used to draw a monocrystalline rod of semiconductor-grade silicon from the melt. Control of this crystal growth process 2 ~ 2 7 requires that the silicon pieces added to the melt containing vessel be within a defined size range. Therefore, it is necessary that the polycrystalline silicon rods ormed during the chemical vaporization deposition process be broken into pieces of suitable size.
The low-contamination impact tool described as the present iltvention is especially useful ior breaking silicon into pieces. The inventors have discovered that during the breaking process, the silicon can be significantly contaminated by contact with the surfaces of the breaking instrument, including the handle and striking surfaces. The present invention reduces ~he contamination associated with the breaking instrument by covering all surfaces, but the striking surface, with a low-contamination synthetic resin.
The exposed striking surface is formed of a tungsten carbide alloy, which is also of a low-contamination nature.
Maeda, U.S. Patent No. 4,697,481, issued October 6, 1987, describes a hammer including a head core and a handle core, where the head core and handle core are imbedded in a resin, with the exception of one end of the head core which serves as a striking surface. Maeda describes the striking surface as being made of a ferrous metal.
Porter, U.S. Patent No. 3,640,324, issued February 8, 1972, describes a forged steel hammer head having a striking face provided with a layer of electrodeposited tungsten carbide. The tungsten carbide layer is reported to provide an antislip and wear-resistant surface on the striking face.
The present invention is a low-contamination impact tool especially useful for the breaking of semiconductor-grade silicon into pieces. The low-contamination impact tool comprises a core formin~ a handle portion and a head portion, the head portion contacting a tungsten carbide alloy striking 2~8~27 element. The core is encapsulated in a synthetic resin material. The preferred synthetic resin is urethane.
Figure 1 illustrates a cross-sectional view of an embodiment of the present in~ention.
The present invention is a low- contamination impact tool. The tool is designed especially to break semiconductor grade silicon into pieces without imparting signi.ficant contamination to the pieces. The low-contamination impact tool comprises: (A) a core forming a handle portion and a head portion, (B) a tungsten carbide alloy striking element having an end contacted with the head portion of the core and (C) a shell of synthetic resin encapsulating the core.
In order to further clarify the concept of the present invention, one exemplary embodiment of the invention will be specifically described referring to the drawing provided as Figure 1.
The low-contamination impact tool comprises a core consisting of handle portion 1 and head portion 2. The core can be formed from any metal, metal alloy, plastic or composite of sufficient rigidity and strength to deliver an impact to a surface. Preferred is when the core is fonned from a metal or metal alloy, for example, carbon steel, stainless steel, inconel, monel or hasteloy. More preferred is when the core is formed from AISI 1018 cold rolled steel.
The size of the core is not critical to the present invention. Those skilled in the art will recognize that the core must have sufficient cross-sectional area to prevent bending and breaking of the core during use of the low-contamination impact tool as a breaking instrument. The required cross-sectional area will depend upon the material from which the core is constructed as well as the length of handle portion 1. When AISI 1018 cold rolled steel is used as the material of construction of the core material, and the 2~8~ ~ 2 ~
low-comtamination impact tool is to be used for the breaking of silicon, a length of about 8 inches to 12 inches for handle portion 1 and a cross-sectional cliameter of about 0.4 to 0.5 inches for handle portion 1 is suitable.
Head portion 2 can be constructed of the same or different material tharl handle portion ]L. Preferred is when head portion 2 is formed from the same material as handle portion 1.
Head portion 2 and handle portion 1 are connected.
The connection can be achieved by forming the core as a single element by, for example, molding, casting, stamping, cutting or machining, depending upon the particular material of fabrication. Alternatively, head portion 2 and handle portion 1 can be formed separately and connected by, for example, wedging, welding, brazing, fusing, threading or other standard ~eans for connecting two solid objects. When the core is formed from AISI 1018 cold rolled steel, it is preferred that head portion 2 and handle portion 1 be iormed separately and connected by welding.
The size of head portion 2 is determined by the material of fabrication, the size of handle portion 1, the method of securing striking element 4 and the size of striking element 4. Generally, when handle portion 1 and head portion 2 are formed from AISI 1018 cold rolled steel, it is preferred that head portion 2 have a length of about one inch to two inches and a diameter of about 0.5 to one inch.
Head portion 2 is secured in contact with striking element 4. The method of securing contact of head portion 2 with striking element 4 is not critical to the present invention. However, in a preferred embodiment of the present invention striking element 4 is secured in contact with head portion 2 during the process of encapsulating the core with a ~:a8~r~
synthetic resin. The synthetic resin maintains the position of striking element 4, as illustrated in Figure 1. The advantage of this method of securing striking element 4 is that the striking element can be easily recovered and reused if the remainder of the low-contamination impact tool is damaged. Alternatively, striking element 4 can be directly secured to head portion 2 by standard means, as described above, for attaching two solid objects.
Striking element 4 is formed from a tungsten carbide alloy, where cobalt is the alloying metal. It is preferred that the tungsten carbide alloy contain about 8 to 15 weight percent cobalt. More preferred is when the tungsten carbide alloy contains about 10 to 13 weight percent cobalt. In general, the shape of striking element 4 is not critical to the present invention. However, in a preferred embodiment of the present invention striking element 4 is formed in a generally cylindrical shape with a constricted central portion. The constricted central portion helps secure striking element 4 in contact with head portion 2, when a synthetic resin is used as the securing means. The constriction can be about one to 30 percent of the diameter of striking element 4. Preferred is when the constriction is about five to 20 percent of the diameter of striking element 4.
In a preferred embodiment of the present invention, the diameter of striking element 4 is within a range of about 0.5 to one inch.
Striking element 4 has striking face 5. The radius of curvature of the edge of striking face 5 is important to minimize breaking of particles rom striking element 4 during use. A radius of about 0.03 to 0.25 inch is considered useful. Preferred is a radius of about 0.07 to 0.12 inch.
2~ ~ 127 : -6-The core is encapsulated in a synthetic resin to form cover 3. The purpose of encapsulating the core in the synthetic resin is to prevent the core from contacting the material to be brol~en with the low-contamination impact tool.
The synthetic resin is selected so as to impart minimal undesirable contamination to the material to be broken. By "synthetic resin" is meant highly cross-linked polymeric materials that are not naturally occurring. The synthetic resin can be for e~ample, polyurethane, polypropylene, polyethylene or polycarbonate. Preferred is when the synthetic resin is polyurethane. Even more preerred is when the synthetic resin is a polyurethane having a Shore Hardness of about 90 to 97.
Cover 3 can be formed around the core and striking element 4 by injecting or casting the synthetic resin into a cavity of a mold which has the same shape as the external shape of cover 3. In the preferred embodiment, the core is placed in the mold, striking element 4 positioned as illustrated in Figure 1 and the synthetic resin injected and cured, securing striking element 4 in contact with head portion 2.
Example 1 (Not within the scope of the present invention~
Silicon samples were prepared by breaking a rod of polycrystalline silicon with an impact tool having a non-encapsulated handle and head formed from AISI 1018 cold rolled steel. A tungsten carbide alloy striking element was attached to the head of the impact tool. The tungsten carbide alloy contained about 12 weight percent cobalt.
During the breaking process, care was taken to contact each piece of silicon with the handle of the impact tool. Samples of silicon pieces were analyzed for iron and phosphorus surface contamination by graphite furnace atomic absorption and photoluminesience techniques, respectively. The results are presented in Table 1.
Table 1 Contamination of Silicon Pieces by Contact With Impact Tool Uncoated Handle Sample No. Fe ppb P ppb 1 0.9~ 0.27 2 0.74 0.29 - 3 0.79 0.43 4 O.B0 0-37 0.63 0.07 6 0.67 0.20 Mean0.76 0.27 Example 2 Silicon samples were prepared by breaking a rod of polycrystalline silicon with an impact tool ha~ing a poly-urethane encapsulated handle and head. The handle and head were formed from AISI 1018 cold rolled steel. The poly-urethane coating was formed from a polyether based liquid, isocyanate-terminated prepolymer using ~4,4'-methylene-bis(orthochloroaniline)~ as catalyst to effect cure. The cured polyurethane had a Shore A durometer of about 95.
A tungsten carbide alloy striking element was attached to the head of the impact tool by molding into the polyurethane. The tungsten carbide alloy was as described for Example 1. During the breaking process, care was taken to contact each sample of silicon with the urethane coated handle of the impact tool. The silicon samples were analyzed as described in Example 1 and the results are presented in Table 2.
2 ~ 7 Table 2 Csntamination of Silicon Pieces by Contact With Impact Tool Polyurethane Coated Handle Sample No. Fe ppb P ppb 1 0.35 0.~9 2 ~.~6 0.13 3 0.3~ 0.1~
0.~0 0.02 : 5 0.45 O.Ql 6 0.~0 0.06 Mean 0.42 0.08 ~ The data presented in Table 2, when contrasted with :~ the data of Table 1, demonstrate the contamination that can occur to silicon pieces when they are contacted with the : unencapsulated handle of the impact tool.
~, ;
Claims (2)
1. A low-contamination impact tool comprising:
(A) a core forming a handle portion and a head portion, (B) a tungsten carbide alloy striking element having an end in contact with the head portion of the core and (C) a shell of synthetic resin encapsulating the core.
(A) a core forming a handle portion and a head portion, (B) a tungsten carbide alloy striking element having an end in contact with the head portion of the core and (C) a shell of synthetic resin encapsulating the core.
2. The low-contamination impact tool of Claim 1, where the head portion is secured in contact with the tungsten carbide alloy striking element by the synthetic resin.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78147691A | 1991-10-23 | 1991-10-23 | |
US781,476 | 1991-10-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2081127A1 true CA2081127A1 (en) | 1993-04-24 |
Family
ID=25122876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002081127A Abandoned CA2081127A1 (en) | 1991-10-23 | 1992-10-22 | Low-contamination impact tool for breaking silicon |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0539097B1 (en) |
JP (1) | JPH06218677A (en) |
KR (1) | KR100207163B1 (en) |
CA (1) | CA2081127A1 (en) |
DE (1) | DE69200756T2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2384741A (en) * | 2002-02-02 | 2003-08-06 | Keith England | Hammers and the like |
US8021483B2 (en) | 2002-02-20 | 2011-09-20 | Hemlock Semiconductor Corporation | Flowable chips and methods for the preparation and use of same, and apparatus for use in the methods |
EP1553214B1 (en) * | 2002-02-20 | 2011-11-23 | Hemlock Semiconductor Corporation | Flowable chips and methods for using them |
US6874713B2 (en) | 2002-08-22 | 2005-04-05 | Dow Corning Corporation | Method and apparatus for improving silicon processing efficiency |
US7270706B2 (en) | 2004-10-04 | 2007-09-18 | Dow Corning Corporation | Roll crusher to produce high purity polycrystalline silicon chips |
DE102006011040A1 (en) * | 2006-03-08 | 2007-09-13 | Schott Solar Gmbh | Process for the further processing and / or recycling of material |
JP5359115B2 (en) * | 2007-08-27 | 2013-12-04 | 三菱マテリアル株式会社 | Hammer for crushing polycrystalline silicon |
DE102012204050B4 (en) * | 2012-03-15 | 2017-03-23 | Solarworld Industries Sachsen Gmbh | Apparatus and method for processing silicon pieces |
DE102012213869A1 (en) * | 2012-08-06 | 2014-02-06 | Wacker Chemie Ag | Polycrystalline silicon fragments and process for their preparation |
KR20200105957A (en) | 2018-02-27 | 2020-09-09 | 가부시끼가이샤 도꾸야마 | hammer |
WO2021037366A1 (en) | 2019-08-29 | 2021-03-04 | Wacker Chemie Ag | Method for producing silicon fragments |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3148716A (en) * | 1962-04-02 | 1964-09-15 | Vanghan & Bushnell Mfg Co | Impact tool with chip-resistant striking face |
US3640324A (en) * | 1969-11-13 | 1972-02-08 | Vaughan & Bushnell Mfg Co | Hammer head having an antislip and wear-resistant striking face surface |
US4039012A (en) * | 1976-01-12 | 1977-08-02 | C. E. S., Inc. | Non-rebound hammer |
DE3204848A1 (en) * | 1982-02-11 | 1983-08-18 | Lothar Laflör GmbH & Co, 5620 Velbert | Emergency hammer |
US4697481A (en) * | 1985-02-21 | 1987-10-06 | Maeda Shell Service Co., Ltd. | Integrally molded hammer with separated head and handle cores |
-
1992
- 1992-10-15 DE DE69200756T patent/DE69200756T2/en not_active Expired - Fee Related
- 1992-10-15 EP EP92309423A patent/EP0539097B1/en not_active Expired - Lifetime
- 1992-10-22 CA CA002081127A patent/CA2081127A1/en not_active Abandoned
- 1992-10-23 JP JP4285935A patent/JPH06218677A/en active Pending
- 1992-10-23 KR KR1019920019583A patent/KR100207163B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69200756D1 (en) | 1995-01-12 |
DE69200756T2 (en) | 1995-04-06 |
JPH06218677A (en) | 1994-08-09 |
EP0539097B1 (en) | 1994-11-30 |
KR100207163B1 (en) | 1999-07-15 |
EP0539097A1 (en) | 1993-04-28 |
KR930007591A (en) | 1993-05-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0539097B1 (en) | Low-contamination impact tool for breaking silicon | |
CA2002385C (en) | Multiple metal coated superabrasive grit and methods for their manufacture | |
US3757878A (en) | Drill bits and method of producing drill bits | |
US3841852A (en) | Abraders, abrasive particles and methods for producing same | |
EP0029187B1 (en) | Improved method of making diamond compacts for rock drilling | |
EP1347852B1 (en) | Method of forming nano-crystalline structures | |
Herzer | Magnetic field induced anisotropy in nanocrystalline Fe Cu Nb Si B alloys | |
US5389118A (en) | Abrasive tool having film-covered CBN grits bonded by brazing to a substrate | |
EP0364458B1 (en) | A method for producing a drill | |
US5327454A (en) | Bridge for connecting cores in a manufacturing equipment of polycrystal silicon | |
Taylor et al. | Anomalous slip in high-purity vanadium crystals | |
EP0133191A3 (en) | Method for alloying substances and apparatus for practising the method | |
CA2059113A1 (en) | Wire drawing dies | |
US4772339A (en) | Method of treating cemented carbide bodies regarding their compositions and structures | |
Garcia Escorial et al. | Surface crystallization of melt-spun Pd 40 Ni 40 P 20 glass | |
CA2070328A1 (en) | Composite diamond abrasive compact | |
EP0014589B1 (en) | A method of making diamond particles and metal bond abrasive body produced therewith | |
Katuya et al. | Production of Ni-Si-B amorphous alloy wires by melt extraction and their thermal and mechanical properties | |
US5494760A (en) | Object with an at least partly amorphous glass-metal film | |
EP0211571B1 (en) | Fine amorphous metallic wires | |
Lu et al. | A micromechanism for crystallization of amorphous alloys II. Bulk crystallization process | |
JP2669308B2 (en) | Amorphous coating and method for forming the same | |
Herold et al. | The amorphous to crystalline transition in Fe-B metallic glasses and vapor-deposited thin films | |
WO1992000939A3 (en) | Reduced metal content ceramic composite bodies | |
EP0095831A3 (en) | Amorphous metals and articles made thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FZDE | Dead |