CA2069813A1 - Optical processing apparatus - Google Patents

Optical processing apparatus

Info

Publication number
CA2069813A1
CA2069813A1 CA2069813A CA2069813A CA2069813A1 CA 2069813 A1 CA2069813 A1 CA 2069813A1 CA 2069813 A CA2069813 A CA 2069813A CA 2069813 A CA2069813 A CA 2069813A CA 2069813 A1 CA2069813 A1 CA 2069813A1
Authority
CA
Canada
Prior art keywords
light beam
mask
reflector
angle
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2069813A
Other languages
French (fr)
Other versions
CA2069813C (en
Inventor
Nobuyuki Zumoto
Toshinori Yagi
Yasuhito Myoi
Teruo Miyamoto
Masaaki Tanaka
Masao Izumo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27298963&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CA2069813(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of CA2069813A1 publication Critical patent/CA2069813A1/en
Application granted granted Critical
Publication of CA2069813C publication Critical patent/CA2069813C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.
CA002069813A 1991-05-30 1992-05-28 Optical processing apparatus Expired - Fee Related CA2069813C (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP12743391 1991-05-30
JP30175291 1991-11-18
JP3-127433 1991-11-18
JP3-301752 1991-11-18
JP6588692A JP2953179B2 (en) 1991-05-30 1992-03-24 Light processing equipment
JP4-065886 1992-03-24

Publications (2)

Publication Number Publication Date
CA2069813A1 true CA2069813A1 (en) 1992-12-01
CA2069813C CA2069813C (en) 1996-06-18

Family

ID=27298963

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002069813A Expired - Fee Related CA2069813C (en) 1991-05-30 1992-05-28 Optical processing apparatus

Country Status (4)

Country Link
US (1) US5355194A (en)
JP (1) JP2953179B2 (en)
CA (1) CA2069813C (en)
DE (1) DE4217811C2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5310986A (en) * 1992-04-28 1994-05-10 Mitsubishi Denki Kabushiki Kaisha Laser machining apparatus
JP3553116B2 (en) * 1994-02-25 2004-08-11 三菱電機株式会社 Light processing equipment
US5715040A (en) * 1995-10-12 1998-02-03 Kabushiki Kaisha Toshiba Illumination aperture of low intensity loss
DE19724061C2 (en) * 1997-06-07 2001-11-22 Univ Stuttgart Strahlwerkzeuge Device for laser machining a workpiece
JP4522882B2 (en) * 2005-02-15 2010-08-11 浜松ホトニクス株式会社 Absorption measuring device
US20070000887A1 (en) * 2005-06-29 2007-01-04 Scott Caldwell Method for scan welding or marking through a waveguide and waveguide therefor
CN104816060A (en) * 2015-04-04 2015-08-05 华中科技大学 Laser welding equipment based on gradient energy band splicing
EP4137255A1 (en) * 2015-10-30 2023-02-22 Seurat Technologies, Inc. Part manipulation using printed manipulation points
CN107442934A (en) * 2017-07-14 2017-12-08 华中科技大学 A kind of laser welding apparatus based on energy band splicing
CN114888458B (en) * 2021-08-17 2023-12-15 武汉华工激光工程有限责任公司 Parallel rotary cutting machining device and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63220991A (en) * 1987-03-06 1988-09-14 Semiconductor Energy Lab Co Ltd Laser beam machining method
US5040882A (en) * 1988-11-07 1991-08-20 General Signal Corporation Unit magnification optical system with improved reflective reticle
US5223693A (en) * 1990-04-28 1993-06-29 Mitsubishi Denki Kabushiki Kaisha Optical machining apparatus

Also Published As

Publication number Publication date
DE4217811A1 (en) 1992-12-24
CA2069813C (en) 1996-06-18
US5355194A (en) 1994-10-11
JP2953179B2 (en) 1999-09-27
DE4217811C2 (en) 1996-01-25
JPH05197157A (en) 1993-08-06

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Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed