CA1325912C - Appareil et methode de production de modeles de faible et de forte epaisseur - Google Patents
Appareil et methode de production de modeles de faible et de forte epaisseurInfo
- Publication number
- CA1325912C CA1325912C CA 589615 CA589615A CA1325912C CA 1325912 C CA1325912 C CA 1325912C CA 589615 CA589615 CA 589615 CA 589615 A CA589615 A CA 589615A CA 1325912 C CA1325912 C CA 1325912C
- Authority
- CA
- Canada
- Prior art keywords
- media
- pattern
- image generator
- linear image
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title abstract description 28
- 238000006073 displacement reaction Methods 0.000 claims description 44
- 210000004027 cell Anatomy 0.000 claims description 37
- 150000001875 compounds Chemical class 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 36
- 210000002858 crystal cell Anatomy 0.000 claims description 33
- 239000004973 liquid crystal related substance Substances 0.000 claims description 31
- 238000003491 array Methods 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 19
- 238000002360 preparation method Methods 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 7
- 238000000059 patterning Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 5
- 239000007790 solid phase Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000007791 liquid phase Substances 0.000 claims description 3
- 238000012544 monitoring process Methods 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- 230000003213 activating effect Effects 0.000 claims description 2
- 238000009826 distribution Methods 0.000 claims description 2
- 230000000977 initiatory effect Effects 0.000 claims description 2
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- 238000012546 transfer Methods 0.000 abstract description 16
- 230000008569 process Effects 0.000 abstract description 11
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 31
- 239000012530 fluid Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000003086 colorant Substances 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000012552 review Methods 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- 230000001747 exhibiting effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000004913 activation Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000009969 flowable effect Effects 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000088 plastic resin Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- -1 ~ -1~2S912 resist Substances 0.000 description 2
- 241000226585 Antennaria plantaginifolia Species 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 241001296096 Probles Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
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- 238000001816 cooling Methods 0.000 description 1
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- 239000000843 powder Substances 0.000 description 1
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- 239000007921 spray Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/44—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA 589615 CA1325912C (fr) | 1989-01-31 | 1989-01-31 | Appareil et methode de production de modeles de faible et de forte epaisseur |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA 589615 CA1325912C (fr) | 1989-01-31 | 1989-01-31 | Appareil et methode de production de modeles de faible et de forte epaisseur |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1325912C true CA1325912C (fr) | 1994-01-11 |
Family
ID=4139542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 589615 Expired - Fee Related CA1325912C (fr) | 1989-01-31 | 1989-01-31 | Appareil et methode de production de modeles de faible et de forte epaisseur |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1325912C (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111791609A (zh) * | 2019-04-08 | 2020-10-20 | 中船重工物资贸易集团有限公司 | 一种基于LabVIEW开发的三轴数控钢板自动喷码装置 |
-
1989
- 1989-01-31 CA CA 589615 patent/CA1325912C/fr not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111791609A (zh) * | 2019-04-08 | 2020-10-20 | 中船重工物资贸易集团有限公司 | 一种基于LabVIEW开发的三轴数控钢板自动喷码装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |