CA1279155C - Couches de resine photosensible stabilisees thermiquement - Google Patents

Couches de resine photosensible stabilisees thermiquement

Info

Publication number
CA1279155C
CA1279155C CA000523167A CA523167A CA1279155C CA 1279155 C CA1279155 C CA 1279155C CA 000523167 A CA000523167 A CA 000523167A CA 523167 A CA523167 A CA 523167A CA 1279155 C CA1279155 C CA 1279155C
Authority
CA
Canada
Prior art keywords
process according
photoresist
image
image layer
thermally stabilizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA000523167A
Other languages
English (en)
Inventor
John J. Grunwald
Allen C. Spencer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Morton International LLC
Original Assignee
MacDermid Inc
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/802,514 external-priority patent/US4701390A/en
Priority claimed from US06/879,385 external-priority patent/US4762768A/en
Application filed by MacDermid Inc, Morton International LLC filed Critical MacDermid Inc
Application granted granted Critical
Publication of CA1279155C publication Critical patent/CA1279155C/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Materials For Photolithography (AREA)
CA000523167A 1985-11-27 1986-11-17 Couches de resine photosensible stabilisees thermiquement Expired - Lifetime CA1279155C (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US06/802,514 US4701390A (en) 1985-11-27 1985-11-27 Thermally stabilized photoresist images
US802,514 1985-11-27
US82394286A 1986-01-29 1986-01-29
US823,942 1986-01-29
US06/879,385 US4762768A (en) 1986-01-29 1986-06-27 Thermally stabilized photoresist images
US879,385 1986-06-27

Publications (1)

Publication Number Publication Date
CA1279155C true CA1279155C (fr) 1991-01-22

Family

ID=27419987

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000523167A Expired - Lifetime CA1279155C (fr) 1985-11-27 1986-11-17 Couches de resine photosensible stabilisees thermiquement

Country Status (4)

Country Link
EP (1) EP0247153A4 (fr)
AU (1) AU6629286A (fr)
CA (1) CA1279155C (fr)
WO (1) WO1987003387A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3087726B2 (ja) 1998-05-25 2000-09-11 日本電気株式会社 半導体装置の製造プロセスにおけるパターニング方法
US7521405B2 (en) 2002-08-12 2009-04-21 Air Products And Chemicals, Inc. Process solutions containing surfactants
US7129199B2 (en) 2002-08-12 2006-10-31 Air Products And Chemicals, Inc. Process solutions containing surfactants
US7348300B2 (en) 1999-05-04 2008-03-25 Air Products And Chemicals, Inc. Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture
DE10101734C2 (de) * 2001-01-16 2003-04-24 Osram Opto Semiconductors Gmbh Verfahren zum Ausbilden einer Ätzmaske auf einem Substrat
JP3476082B2 (ja) 2001-11-05 2003-12-10 東京応化工業株式会社 パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3244569A (en) * 1961-12-29 1966-04-05 Harris Intertype Corp Etched letterpress plate and process of preparing same
GB1225754A (fr) * 1967-06-09 1971-03-24
JPS5011286B1 (fr) * 1971-07-15 1975-04-30
JPS5218021B2 (fr) * 1972-05-31 1977-05-19
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
GB1575200A (en) * 1977-02-21 1980-09-17 Vickers Ltd Printing plates
US4125650A (en) * 1977-08-08 1978-11-14 International Business Machines Corporation Resist image hardening process
US4187331A (en) * 1978-08-24 1980-02-05 International Business Machines Corp. Fluorine plasma resist image hardening
US4259369A (en) * 1979-12-13 1981-03-31 International Business Machines Corporation Image hardening process
GB2099371B (en) * 1981-06-01 1984-12-19 Polychrome Corp Finisher for lithographic printing plates
GB2121197A (en) * 1982-05-26 1983-12-14 Philips Electronic Associated Plasma-etch resistant mask formation
DE3231144A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von tiefdruckformen mit kunststoff-druckschichten
GB8314918D0 (en) * 1983-05-31 1983-07-06 Vickers Plc Radiation sensitive compositions
DE3410522A1 (de) * 1984-03-22 1985-10-03 Hoechst Ag, 6230 Frankfurt Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform

Also Published As

Publication number Publication date
EP0247153A4 (fr) 1988-05-19
AU6629286A (en) 1987-07-01
EP0247153A1 (fr) 1987-12-02
WO1987003387A1 (fr) 1987-06-04

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