CA1252228A - Lithographie en creux aux ultraviolets - Google Patents
Lithographie en creux aux ultravioletsInfo
- Publication number
- CA1252228A CA1252228A CA000553493A CA553493A CA1252228A CA 1252228 A CA1252228 A CA 1252228A CA 000553493 A CA000553493 A CA 000553493A CA 553493 A CA553493 A CA 553493A CA 1252228 A CA1252228 A CA 1252228A
- Authority
- CA
- Canada
- Prior art keywords
- equipment
- laser
- source
- workpiece
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA000553493A CA1252228A (fr) | 1984-06-21 | 1987-12-03 | Lithographie en creux aux ultraviolets |
CA000579702A CA1269765A (fr) | 1984-06-21 | 1988-10-07 | Lithographie penetrante aux ultraviolets |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62324784A | 1984-06-21 | 1984-06-21 | |
US623,247 | 1984-06-21 | ||
CA000484658A CA1232373A (fr) | 1984-06-21 | 1985-06-20 | Lithographie aux ultraviolets a forte penetration |
CA000553493A CA1252228A (fr) | 1984-06-21 | 1987-12-03 | Lithographie en creux aux ultraviolets |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000484658A Division CA1232373A (fr) | 1984-06-21 | 1985-06-20 | Lithographie aux ultraviolets a forte penetration |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000579702A Division CA1269765A (fr) | 1984-06-21 | 1988-10-07 | Lithographie penetrante aux ultraviolets |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1252228A true CA1252228A (fr) | 1989-04-04 |
Family
ID=25670721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000553493A Expired CA1252228A (fr) | 1984-06-21 | 1987-12-03 | Lithographie en creux aux ultraviolets |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA1252228A (fr) |
-
1987
- 1987-12-03 CA CA000553493A patent/CA1252228A/fr not_active Expired
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0183827B1 (fr) | Lithographie a rayons ultraviolets profonds | |
US4883352A (en) | Deep-uv lithography | |
US4773750A (en) | Deep-UV lithography | |
US4785192A (en) | Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment | |
US4901109A (en) | Alignment and exposure apparatus | |
US6727976B2 (en) | Exposure apparatus with a pulsed laser | |
KR20040029982A (ko) | 장치 제조용 리소그래피 시스템 및 제조 방법 | |
EP0834772B1 (fr) | Appareil d'exposition | |
US6322220B1 (en) | Exposure apparatus and device manufacturing method using the same | |
US5010230A (en) | Laser processor | |
EP0293823B1 (fr) | Lithographie à rayons ultraviolets profonds | |
US5978072A (en) | Exposure apparatus | |
US5095190A (en) | Exposure apparatus | |
CA1252228A (fr) | Lithographie en creux aux ultraviolets | |
JPH0745496A (ja) | 走査型露光装置 | |
CA1269765A (fr) | Lithographie penetrante aux ultraviolets | |
US6172739B1 (en) | Exposure apparatus and method | |
US5878068A (en) | Energy quantity control method | |
JPH07226367A (ja) | 露光装置及び該露光装置を用いてデバイスを製造する方法 | |
JPH0510813B2 (fr) | ||
JP2890413B2 (ja) | 露光装置及び露光方法 | |
JP2676387B2 (ja) | 狭帯域発振エキシマレーザ装置における光軸安定化方法 | |
JPH07226368A (ja) | 露光装置及び該露光装置を用いてデバイスを製造する方法 | |
JPH0519692B2 (fr) | ||
Hafner | Optical Pattern Generator Using Excimer Laser |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |