CA1153236A - Plaques d'impression a longue duree developpables a l'eau et composes connexes - Google Patents
Plaques d'impression a longue duree developpables a l'eau et composes connexesInfo
- Publication number
- CA1153236A CA1153236A CA000367628A CA367628A CA1153236A CA 1153236 A CA1153236 A CA 1153236A CA 000367628 A CA000367628 A CA 000367628A CA 367628 A CA367628 A CA 367628A CA 1153236 A CA1153236 A CA 1153236A
- Authority
- CA
- Canada
- Prior art keywords
- weight
- water
- printing plate
- less
- softenable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12498480A | 1980-02-27 | 1980-02-27 | |
US124,984 | 1980-02-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1153236A true CA1153236A (fr) | 1983-09-06 |
Family
ID=22417712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000367628A Expired CA1153236A (fr) | 1980-02-27 | 1980-12-29 | Plaques d'impression a longue duree developpables a l'eau et composes connexes |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA1153236A (fr) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4659645A (en) * | 1984-07-10 | 1987-04-21 | Hoechst Aktiengesellschaft | Photosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable composition |
US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
US4946373A (en) * | 1985-02-28 | 1990-08-07 | Hoechst Celanese Corporation | Radiation-polymerizable composition |
US4956261A (en) * | 1986-12-23 | 1990-09-11 | Hoechst Aktiengesellschaft | Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer |
US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
-
1980
- 1980-12-29 CA CA000367628A patent/CA1153236A/fr not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4659645A (en) * | 1984-07-10 | 1987-04-21 | Hoechst Aktiengesellschaft | Photosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable composition |
US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
US4946373A (en) * | 1985-02-28 | 1990-08-07 | Hoechst Celanese Corporation | Radiation-polymerizable composition |
US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
US4956261A (en) * | 1986-12-23 | 1990-09-11 | Hoechst Aktiengesellschaft | Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer |
US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |