CA1053131A - Method of and apparatus for etching - Google Patents
Method of and apparatus for etchingInfo
- Publication number
- CA1053131A CA1053131A CA231,372A CA231372A CA1053131A CA 1053131 A CA1053131 A CA 1053131A CA 231372 A CA231372 A CA 231372A CA 1053131 A CA1053131 A CA 1053131A
- Authority
- CA
- Canada
- Prior art keywords
- rinse
- sump
- liquid
- path
- rinser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Abstract
ABSTRACT OF THE DISCLOSURE
A workpiece is passed through an etching tank, and then through at least an upstream rinsing tank and a downstream rinsi rinsing tank. In each of the tanks a respective liquid is pumped up from a sump at the bottom and sprayed over the workpiece as it passes through. Liquid is drawn out of the upstream rinse tank and mixed with regenerator chemicals to replenish liquid lost by the etcher and maintain the liquid in the etcher at full strength. Liquid lost from the upstream rinser in this manner is replenished by introduction into the downstream rinser of fresh water and passage of liquid from the downstream rinser to the upstream rinser through an overflow that maintains a higher liquid level in the downstream rinser than in the upstream rinser.
A workpiece is passed through an etching tank, and then through at least an upstream rinsing tank and a downstream rinsi rinsing tank. In each of the tanks a respective liquid is pumped up from a sump at the bottom and sprayed over the workpiece as it passes through. Liquid is drawn out of the upstream rinse tank and mixed with regenerator chemicals to replenish liquid lost by the etcher and maintain the liquid in the etcher at full strength. Liquid lost from the upstream rinser in this manner is replenished by introduction into the downstream rinser of fresh water and passage of liquid from the downstream rinser to the upstream rinser through an overflow that maintains a higher liquid level in the downstream rinser than in the upstream rinser.
Description
~)5~ 3~
_ECIPICATIO~
.
Field of the Invention The present invention relates to a method of and an apparatus for etching a workpiece. More particularly, this in-vention concerns the operation of a machine for etching a ; metallic woxkpiece.
`. ' ' Background of the Invention .
It is known to etch metallic, e~g. copper, workpieces with a liquid~ e.gO an ammonium solution, by passing the work~
piece through a treatment tank in which the etchant liquid is sprayed over the workpiece~ The liquid draining off the work~
piece falls into a sump at the bottom of the etching tank and is recirculated by a pump. Thereafter the workpiece passes in-to a rinsing tank where it is rinsed with a liquid such as fresh water which is sprayed and recirculated like the etchant liquid.
The principal disadvantage of such systems is that the ~
etchant liquid is continuously weakened, while at the same time '~`
the rinse liquid ~ecomes increasingly contaminated. For this reason it is necessary to periodically drain off part of the etchant liquid and replace i~ with full-strength ethant in order to maintain proper strength. In the same manner part of the rinse liquid is replaced with fresh water, with a filter normal-; ly being interposed in the circulation system for the rinse liq-uid. Thus it is necessary to dispose of~the drawn-off portions of etchant liquid and rinse liquid. Since both of these liquids are contaminated with metal particles and acids it is necessary to neutralize and purify them before disposal, a costly opera~
tion that greatly increases the overall expense of etching.
~ - _ : : , -. - ,- . , , :
It is there~ore an object of the presen~ inven~ion to provide an improved me thod o:E and apparatus for etchlng a metal .
Another object is the pro~rision of such an app~ratus wherein the abo~e-described pollutîon problem is largely avoided, ~ ' ~hlE!s2 objects are ob~ained ~n accordanse with ~he present inven~i~n in the system where~n etchan~ liquid lost from the etcher is replaced by regener~ox chemicals and rinse liquid drawn ~u~ of ~he rinserO me rinse liqu~d lost ~Erom the rinser is replaced by fresh water. Thus ~ accord- :
ance with the present invention ~here is virtually no waste liquid to dispose of, most o:E the liquid lost :rom ~he sys~em being s~tribu~able to evaporation According to ye~ ano~her feature of this i~vention :~
several such recirculatlng xinsers are pr~vided downstream ~; :~om ~he e tching t~nk ~ nse liqu~ d i~ drawn out of ~he : ~
furthes~ upstream r~nser and is used to dilute ~he re~enera- :
tor chemicals ~hat are added to ~h~ etchant liquid, and fresh water is added to the ~xtrerne downstream rinser tankO ~ver-flows are pravided betw~en the r~nse ~anks 50 tha~ ln e:Eec~, the fresh water and rinse liquid flows countercurrent to th2 workpiece~ ~hat ~s resh wa~er is introduced into furthast do~ raam rins~r and t~ slightly contam~ai:ed rinse liquid rom this rinser i~ used ~o replellish the rinse ~ :
liqu~d ln th~ Ilext upstream rinser and ~o on. With this arrangemerlt i~ is po~sslble almost completely to el~mina~e ~:-30 the above~descr~bed pollu~ion problem" A~ the same ~lrae ~: very good results are obtained as th~ etchant is m~in~ained .
.
very strong arld the rlnsin~ is complete, as the fur~hest downstrearn r:lnser uses v~r~ually pure ~resh waterb Wlth the system according ~o the presen1: imren~ion the amount o:~ etchant ~n~ res~ wat~r used is direc~ly dependent on ~he numl~er of workpieceæ being processed and their sizeO
This is due to the :fact that the only noticeable e~cl~ant loss is due to e~chant liquid being carr~ed aw~y by workpieces~ so th~t if no workpieces are ~eing trea~ed t~ only losses are due to evapora~iorl frc)m th~ trea~nell~ ta~, a nominal amourltO
10 Furthermore the use o th~ water frorr the furthest upstream rinse t~nk in ~h~ regenerator makes regerlera~ton o:E the e~chant rela~ively easy as this rlnse liquid is highly con-taminated and therefore already ac~.dicO
In accordance with the presen~ in~ention the rinse tanks are all in a row :Ln the transport direction and each is con nected ~o ~he upstream tank ~Tia an overflow. ~he overflows are so arranged that the liquid level in ~ach tank is lower than ~at of the downstream tank, if any, and hig~r than that of ~he upe~ream tank, if any. This ensux~s ~hat ~here will be 20 co~n~ercurr2~t flow o rins~ liquid rom th~ le~s contaminated sumps ~o ~ more con~aminated sumps"
Accord~ng ~o a further fea~ure of ~his lnv~n~ion the ~pparatus iq pro~rided wl~h a controller connected to a valve in the fresh-water :eeed line connected to t~ furl:hest down-s~ream rinser and to anot~r val~e connected between th~
circula~ing p~np O:e ~he furthest upstream rillser and ~he reg~n2rator~, According to yet ano~her ~eature oE this inven~ion means ls provided between ~he etcher and ~he furthest upstream rinser 30 and downstream of each rinser ~or strlpping liquid ~rom the workplece. In ~is manner minimum liquid exchange from -- 3 ~
tank to tank is possibleO
, Brief Description of the Drawinq ~ :
The above and other o~jects~ features and advant~ges will become more readily apparent from the following descriptio~ ~;
reference being made to the accompanying drawing whose sole FIG~
URE is a side diagrammatic representation of the system accord-ing to the present invention.
Specific Description The arrangement according to the present invention has 10 an etcher 1 followed by an upstream rinser 2, an intermediate . :
rinser 3, and a downstream rinser 4. Immediately downstream of -;
the etcher 1 is a liquid-stripping arrangement 5. Similar such arrangements 6, 7 and 8 all having squeezing rollers 9 are pro~
vided at the respective rinser 2, 3 and 4.
A workpiece 11 i5 passed in a transport direction 10 ;~
through the etcher 1 and rinsers 2, 3 and 4 on rollers 43. The .
etcher 1 and rinsers 2~ 3 and 4 are provided with respective sumps 12~ 13, 14 and 15, ;~
In the etcher 1 a pair of pumps 16 located in the 20 sump 12 serve to take in liquid 17 in this sump 12, and pump it ;
up through condui~s 18 to upper and lower arrays 19 of sprayers that serve to saturate the workpiece 11 as it passes through the etcher 1 on the rollers 43~ Similar pumps 20 are provided . in each of the rinsers 2, 3 and 4 to pump the respective liquids :, 21, 22 and 23 up through conduits 24 to corresponding upper and : lower spraying arrangements 25. . -~
. m e liquid 21 in the upstream rinser 2 has a level . :
_ and i5 introduced into this sump 13 through a conduit 26 having an inlet end 28 a~ the upper part of the sump 14. The :~
`: :
liquid 22 in the su~p 14 is mai~tained at a l.iquid level h~
slightly higher than the level h due to the position of the or- :
ifice 28. A similar conduit 27 connects the su~ps 14 and 15 together and has an inlet hole 28~ which serves to mai.ntain a level h" slightly higher than the level h' in the sump 15.
~ Fresh water is fed into the downstream rinser 4 from :~
;~ a conduit 30 having an outlet end 31 and provided wi-th an el-ectromagnetic valve 29.
; A regenerator 32 has a sump 33 connected via a pair :;
.: 10 of circulating lines 34 and 35 to the sump 12 of the etcher 1.
. .
` A pump 41 in the line .35 operates continuously to circulate . :
the etchant liquid 17 between the sumps 12 and 33. Three sup-plies 36, 27 and 38 of the regenerator chemicals are provided :, ,.
in the tank 32 and are operated by means known per se to main-tain the liquid in the sump 33 at a predetermined strength. An .. electromagnetic valve 39 is provided in a line A0 extending be-. `J
.~ tween the pressure line 24 from the pump 20 of the rinser 2 to .. ..
the chemical supplies 36, 37 and 38. ~.
.. ` A controller 42 is connected to three level sensors 20 44, 45 and 46, respectively, in the sumps 12, 13 and 33. In addition this con;troller 42 is connected to the valves 29 and 39 and to the pump 41. As the system operates the controller 42 ~;
i serves to maintain the level in the sump 33 even by adjusting ~
: . :
the rate of operation of the pump 41~ In addition whenever the level in the sump 17 drops below a predetermined level it opens the valve 39 so as to conduct the fluid 21 from ~.his sump 13 into the sump 33 and cause the pump 41 to operate more rapidly S3 as indirectly to raise the level in the sump 12, In addition, whenever the level in -the sump 13 falls below a , .
:: ?
3~
pre~etexmined level, ei-th~-~ d-le to depletlon t.hrough the c~nduit 40 or carrying of the l:iguid 21 b~ the workpieces 11, the controller 42 opens the va~ve 29 50 as to admit fresh water into the downstream sump 15 wh:lch will then flow through the overflow conduit 27 to the sump 14 and then through the over~low conduit 26 into the sump 13 to replen~h same.
... .
:, .
6 ~
.;
.. . . . . . . .
_ECIPICATIO~
.
Field of the Invention The present invention relates to a method of and an apparatus for etching a workpiece. More particularly, this in-vention concerns the operation of a machine for etching a ; metallic woxkpiece.
`. ' ' Background of the Invention .
It is known to etch metallic, e~g. copper, workpieces with a liquid~ e.gO an ammonium solution, by passing the work~
piece through a treatment tank in which the etchant liquid is sprayed over the workpiece~ The liquid draining off the work~
piece falls into a sump at the bottom of the etching tank and is recirculated by a pump. Thereafter the workpiece passes in-to a rinsing tank where it is rinsed with a liquid such as fresh water which is sprayed and recirculated like the etchant liquid.
The principal disadvantage of such systems is that the ~
etchant liquid is continuously weakened, while at the same time '~`
the rinse liquid ~ecomes increasingly contaminated. For this reason it is necessary to periodically drain off part of the etchant liquid and replace i~ with full-strength ethant in order to maintain proper strength. In the same manner part of the rinse liquid is replaced with fresh water, with a filter normal-; ly being interposed in the circulation system for the rinse liq-uid. Thus it is necessary to dispose of~the drawn-off portions of etchant liquid and rinse liquid. Since both of these liquids are contaminated with metal particles and acids it is necessary to neutralize and purify them before disposal, a costly opera~
tion that greatly increases the overall expense of etching.
~ - _ : : , -. - ,- . , , :
It is there~ore an object of the presen~ inven~ion to provide an improved me thod o:E and apparatus for etchlng a metal .
Another object is the pro~rision of such an app~ratus wherein the abo~e-described pollutîon problem is largely avoided, ~ ' ~hlE!s2 objects are ob~ained ~n accordanse with ~he present inven~i~n in the system where~n etchan~ liquid lost from the etcher is replaced by regener~ox chemicals and rinse liquid drawn ~u~ of ~he rinserO me rinse liqu~d lost ~Erom the rinser is replaced by fresh water. Thus ~ accord- :
ance with the present invention ~here is virtually no waste liquid to dispose of, most o:E the liquid lost :rom ~he sys~em being s~tribu~able to evaporation According to ye~ ano~her feature of this i~vention :~
several such recirculatlng xinsers are pr~vided downstream ~; :~om ~he e tching t~nk ~ nse liqu~ d i~ drawn out of ~he : ~
furthes~ upstream r~nser and is used to dilute ~he re~enera- :
tor chemicals ~hat are added to ~h~ etchant liquid, and fresh water is added to the ~xtrerne downstream rinser tankO ~ver-flows are pravided betw~en the r~nse ~anks 50 tha~ ln e:Eec~, the fresh water and rinse liquid flows countercurrent to th2 workpiece~ ~hat ~s resh wa~er is introduced into furthast do~ raam rins~r and t~ slightly contam~ai:ed rinse liquid rom this rinser i~ used ~o replellish the rinse ~ :
liqu~d ln th~ Ilext upstream rinser and ~o on. With this arrangemerlt i~ is po~sslble almost completely to el~mina~e ~:-30 the above~descr~bed pollu~ion problem" A~ the same ~lrae ~: very good results are obtained as th~ etchant is m~in~ained .
.
very strong arld the rlnsin~ is complete, as the fur~hest downstrearn r:lnser uses v~r~ually pure ~resh waterb Wlth the system according ~o the presen1: imren~ion the amount o:~ etchant ~n~ res~ wat~r used is direc~ly dependent on ~he numl~er of workpieceæ being processed and their sizeO
This is due to the :fact that the only noticeable e~cl~ant loss is due to e~chant liquid being carr~ed aw~y by workpieces~ so th~t if no workpieces are ~eing trea~ed t~ only losses are due to evapora~iorl frc)m th~ trea~nell~ ta~, a nominal amourltO
10 Furthermore the use o th~ water frorr the furthest upstream rinse t~nk in ~h~ regenerator makes regerlera~ton o:E the e~chant rela~ively easy as this rlnse liquid is highly con-taminated and therefore already ac~.dicO
In accordance with the presen~ in~ention the rinse tanks are all in a row :Ln the transport direction and each is con nected ~o ~he upstream tank ~Tia an overflow. ~he overflows are so arranged that the liquid level in ~ach tank is lower than ~at of the downstream tank, if any, and hig~r than that of ~he upe~ream tank, if any. This ensux~s ~hat ~here will be 20 co~n~ercurr2~t flow o rins~ liquid rom th~ le~s contaminated sumps ~o ~ more con~aminated sumps"
Accord~ng ~o a further fea~ure of ~his lnv~n~ion the ~pparatus iq pro~rided wl~h a controller connected to a valve in the fresh-water :eeed line connected to t~ furl:hest down-s~ream rinser and to anot~r val~e connected between th~
circula~ing p~np O:e ~he furthest upstream rillser and ~he reg~n2rator~, According to yet ano~her ~eature oE this inven~ion means ls provided between ~he etcher and ~he furthest upstream rinser 30 and downstream of each rinser ~or strlpping liquid ~rom the workplece. In ~is manner minimum liquid exchange from -- 3 ~
tank to tank is possibleO
, Brief Description of the Drawinq ~ :
The above and other o~jects~ features and advant~ges will become more readily apparent from the following descriptio~ ~;
reference being made to the accompanying drawing whose sole FIG~
URE is a side diagrammatic representation of the system accord-ing to the present invention.
Specific Description The arrangement according to the present invention has 10 an etcher 1 followed by an upstream rinser 2, an intermediate . :
rinser 3, and a downstream rinser 4. Immediately downstream of -;
the etcher 1 is a liquid-stripping arrangement 5. Similar such arrangements 6, 7 and 8 all having squeezing rollers 9 are pro~
vided at the respective rinser 2, 3 and 4.
A workpiece 11 i5 passed in a transport direction 10 ;~
through the etcher 1 and rinsers 2, 3 and 4 on rollers 43. The .
etcher 1 and rinsers 2~ 3 and 4 are provided with respective sumps 12~ 13, 14 and 15, ;~
In the etcher 1 a pair of pumps 16 located in the 20 sump 12 serve to take in liquid 17 in this sump 12, and pump it ;
up through condui~s 18 to upper and lower arrays 19 of sprayers that serve to saturate the workpiece 11 as it passes through the etcher 1 on the rollers 43~ Similar pumps 20 are provided . in each of the rinsers 2, 3 and 4 to pump the respective liquids :, 21, 22 and 23 up through conduits 24 to corresponding upper and : lower spraying arrangements 25. . -~
. m e liquid 21 in the upstream rinser 2 has a level . :
_ and i5 introduced into this sump 13 through a conduit 26 having an inlet end 28 a~ the upper part of the sump 14. The :~
`: :
liquid 22 in the su~p 14 is mai~tained at a l.iquid level h~
slightly higher than the level h due to the position of the or- :
ifice 28. A similar conduit 27 connects the su~ps 14 and 15 together and has an inlet hole 28~ which serves to mai.ntain a level h" slightly higher than the level h' in the sump 15.
~ Fresh water is fed into the downstream rinser 4 from :~
;~ a conduit 30 having an outlet end 31 and provided wi-th an el-ectromagnetic valve 29.
; A regenerator 32 has a sump 33 connected via a pair :;
.: 10 of circulating lines 34 and 35 to the sump 12 of the etcher 1.
. .
` A pump 41 in the line .35 operates continuously to circulate . :
the etchant liquid 17 between the sumps 12 and 33. Three sup-plies 36, 27 and 38 of the regenerator chemicals are provided :, ,.
in the tank 32 and are operated by means known per se to main-tain the liquid in the sump 33 at a predetermined strength. An .. electromagnetic valve 39 is provided in a line A0 extending be-. `J
.~ tween the pressure line 24 from the pump 20 of the rinser 2 to .. ..
the chemical supplies 36, 37 and 38. ~.
.. ` A controller 42 is connected to three level sensors 20 44, 45 and 46, respectively, in the sumps 12, 13 and 33. In addition this con;troller 42 is connected to the valves 29 and 39 and to the pump 41. As the system operates the controller 42 ~;
i serves to maintain the level in the sump 33 even by adjusting ~
: . :
the rate of operation of the pump 41~ In addition whenever the level in the sump 17 drops below a predetermined level it opens the valve 39 so as to conduct the fluid 21 from ~.his sump 13 into the sump 33 and cause the pump 41 to operate more rapidly S3 as indirectly to raise the level in the sump 12, In addition, whenever the level in -the sump 13 falls below a , .
:: ?
3~
pre~etexmined level, ei-th~-~ d-le to depletlon t.hrough the c~nduit 40 or carrying of the l:iguid 21 b~ the workpieces 11, the controller 42 opens the va~ve 29 50 as to admit fresh water into the downstream sump 15 wh:lch will then flow through the overflow conduit 27 to the sump 14 and then through the over~low conduit 26 into the sump 13 to replen~h same.
... .
:, .
6 ~
.;
.. . . . . . . .
Claims (8)
1. A method of etching a workpiece comprising the steps of:
circulating an etchant liquid in a closed etchant path over said workpiece and through an etchant sump;
thereafter circulating a rinse liquid in a closed rinse path over said workpiece and through a rinse sump;
withdrawing from said rinse sump a portion of said rinse liquid and introducing said portion into said etchant path along with regenerator chemicals to replace lost etchant liquid and restore the strength thereof;
introducing into said rinse path a quantity of fresh water of volume substantially equal to that of said portion of rinse water withdrawn, said rinse water being circulated through a pair of such rinse paths each having a respective sump and spaced apart in a transport direction, said fresh water being added to the downstream rinse path and said portion being with-drawn from the upstream rinse path;
successively passing said workpiece in said direction through said etchant path, then through said upstream rinse path, and then through said downstream rinse path; and automatically withdrawing from the downstream sump and introducing into the upstream sump a quantity of rinse liq-uid of volume substantially equal to that of said portion on withdrawal thereof from said upstream sump.
circulating an etchant liquid in a closed etchant path over said workpiece and through an etchant sump;
thereafter circulating a rinse liquid in a closed rinse path over said workpiece and through a rinse sump;
withdrawing from said rinse sump a portion of said rinse liquid and introducing said portion into said etchant path along with regenerator chemicals to replace lost etchant liquid and restore the strength thereof;
introducing into said rinse path a quantity of fresh water of volume substantially equal to that of said portion of rinse water withdrawn, said rinse water being circulated through a pair of such rinse paths each having a respective sump and spaced apart in a transport direction, said fresh water being added to the downstream rinse path and said portion being with-drawn from the upstream rinse path;
successively passing said workpiece in said direction through said etchant path, then through said upstream rinse path, and then through said downstream rinse path; and automatically withdrawing from the downstream sump and introducing into the upstream sump a quantity of rinse liq-uid of volume substantially equal to that of said portion on withdrawal thereof from said upstream sump.
2. The method defined in claim 1, further comprising the steps of substantially stripping said liquids from said workpiece between said paths, returning said liquids to their respective sumps.
3. The method defined in claim 1 or claim 2 wherein rinse liquid is withdrawn from said downstream rinse path and introduced into said upstream rinse path by overflowing from the downstream rinse sump into the upstream rinse path.
4. An apparatus for etching a workpiece, said appa-ratus comprising:
an etcher having an etchant sump containing an etch-ant liquid and means for circulating said etchant liquid in a closed etchant path in said etcher;
a rinse adjacent said etcher and having a rinse sump containing a rinse liquid and means for circulating said rinse liquid in a closed rinse path in said rinser;
means for passing said workpiece first through said etchant path and then through said rinse path;
regenerator means connected to said etcher and to said rinser for withdrawing a portion of rinse liquid from said rinser and introducing said portion and regnerator chemicals into said etchant path for replacing lost etchant liquid and restoring the strength thereof;
means for replacing in said rinser the rinse water withdrawn as said portion with a substantially equivalent vol-ume of fresh water;
another rinser spaced downstream from the first men-tioned rinser in a transport direction and having a downstream rinse sump containing said rinse liquid and means for circulat-ing same in a downstream rinse path in the downstream rinser, said means for replacing being connected to said downstream rinser and said regenerator means being connected to the up-stream rinse; and means for withdrawing rinse liquid from said down-stream rinser and introducing same into said upstream rinser on withdrawal therefrom of said portion.
an etcher having an etchant sump containing an etch-ant liquid and means for circulating said etchant liquid in a closed etchant path in said etcher;
a rinse adjacent said etcher and having a rinse sump containing a rinse liquid and means for circulating said rinse liquid in a closed rinse path in said rinser;
means for passing said workpiece first through said etchant path and then through said rinse path;
regenerator means connected to said etcher and to said rinser for withdrawing a portion of rinse liquid from said rinser and introducing said portion and regnerator chemicals into said etchant path for replacing lost etchant liquid and restoring the strength thereof;
means for replacing in said rinser the rinse water withdrawn as said portion with a substantially equivalent vol-ume of fresh water;
another rinser spaced downstream from the first men-tioned rinser in a transport direction and having a downstream rinse sump containing said rinse liquid and means for circulat-ing same in a downstream rinse path in the downstream rinser, said means for replacing being connected to said downstream rinser and said regenerator means being connected to the up-stream rinse; and means for withdrawing rinse liquid from said down-stream rinser and introducing same into said upstream rinser on withdrawal therefrom of said portion.
5. The apparatus defined in claim 4 wherein said means for withdrawing is an overflow conduit connected be-tween said downstream rinse sump and the upstream rinse sump.
6. The apparatus defined in claim 5 wherein said rinse sumps are horizontally in line and said overflow con-duit opens in said downstream rinse sump at a higher location than in said upstream rinse sump.
7. The apparatus defined in claim 4 wherein said re-generator means includes a regenerator tank having a regener-ator sump and conduit means for circulating etchant liquid be-tween said etchant sump and said regenerator sump.
8. The apparatus defined in claim 7 wherein said re-generator means includes means for adding regenerator chemicals to said regenerator sump.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA231,372A CA1053131A (en) | 1975-07-14 | 1975-07-14 | Method of and apparatus for etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA231,372A CA1053131A (en) | 1975-07-14 | 1975-07-14 | Method of and apparatus for etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1053131A true CA1053131A (en) | 1979-04-24 |
Family
ID=4103596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA231,372A Expired CA1053131A (en) | 1975-07-14 | 1975-07-14 | Method of and apparatus for etching |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1053131A (en) |
-
1975
- 1975-07-14 CA CA231,372A patent/CA1053131A/en not_active Expired
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4017343A (en) | Method of and apparatus for etching | |
| US6391206B2 (en) | Method for recovery of aqueous wash in phosphate chemical conversion and apparatus for metal surface treatment | |
| US4576677A (en) | Method and apparatus for regenerating an ammoniacal etching solution | |
| SG54150A1 (en) | Apparatus for maintaining a stable bath for an autodeposition composition by periodically separating particular metal ions from the composition | |
| US4772365A (en) | Method for etching materials | |
| CA1053131A (en) | Method of and apparatus for etching | |
| DE4013068A1 (en) | DETOXIFICATION OF CONSUMED PHOTOGRAPHIC PROCESSORS AND WASHMAKERS BY ANODIC OXIDATION | |
| US4781806A (en) | Electroplating system | |
| US4719128A (en) | Method of and apparatus for bailout elimination and for enhancing plating bath stability in electrosynthesis/electrodialysis electroless copper purification process | |
| US4863612A (en) | Apparatus and method for recovering materials from process baths | |
| DE2612510C3 (en) | Arrangement for wastewater treatment | |
| US5076885A (en) | Process for etching workpieces | |
| DE4200849C2 (en) | Method and device for treating the rinsing water resulting from the chemical and / or electrolytic surface treatment of metals | |
| US4805553A (en) | Apparatus for bailout elimination and for enhancing plating bath stability in electrosynthesis/electrodialysis electroless copper purification process | |
| US5904157A (en) | Copper surface pickling system | |
| DE3039303C2 (en) | Device for the continuous pickling of a steel strip by acid attack | |
| US4783249A (en) | Electroplating apparatus with self-contained rinse water treatment | |
| US5932109A (en) | Plating rinse water treatment | |
| JPH0429745B2 (en) | ||
| US6488039B1 (en) | State of the art constant flow device | |
| EP0956140B1 (en) | Process and device for removing h2s from an h2s-containing gas | |
| CN218797711U (en) | Fluid infusion cleaning device and cleaning equipment | |
| Ciancia | Pollution abatement in the metal finishing industry | |
| DE1093160B (en) | Method and device for electrolytic treatment, in particular for electroplating metal objects | |
| JPH09267080A (en) | Work washing method and washing device |