CA1010286A - Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material - Google Patents

Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material

Info

Publication number
CA1010286A
CA1010286A CA188,941A CA188941A CA1010286A CA 1010286 A CA1010286 A CA 1010286A CA 188941 A CA188941 A CA 188941A CA 1010286 A CA1010286 A CA 1010286A
Authority
CA
Canada
Prior art keywords
transferring
pattern
relieved
thermoplastic resin
resin material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA188,941A
Other languages
English (en)
Inventor
Tadanori Inoue
Takezo Sano
Yukikazu Uemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP139473A external-priority patent/JPS4989752A/ja
Priority claimed from JP139373A external-priority patent/JPS525243B2/ja
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of CA1010286A publication Critical patent/CA1010286A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C3/00—Reproduction or duplicating of printing formes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Printing Methods (AREA)
CA188,941A 1972-12-28 1973-12-27 Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material Expired CA1010286A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP139473A JPS4989752A (enExample) 1972-12-28 1972-12-28
JP139373A JPS525243B2 (enExample) 1972-12-28 1972-12-28

Publications (1)

Publication Number Publication Date
CA1010286A true CA1010286A (en) 1977-05-17

Family

ID=26334603

Family Applications (1)

Application Number Title Priority Date Filing Date
CA188,941A Expired CA1010286A (en) 1972-12-28 1973-12-27 Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material

Country Status (7)

Country Link
US (1) US4156389A (enExample)
CA (1) CA1010286A (enExample)
DE (1) DE2364183A1 (enExample)
FR (1) FR2212789A5 (enExample)
GB (1) GB1454420A (enExample)
IT (1) IT1000402B (enExample)
NL (1) NL7317805A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5368941A (en) * 1992-08-31 1994-11-29 Dow Corning Corporation Deformable, abrasion-resistant silicone coating and method of producing the same
EP0678785B1 (en) * 1993-10-26 2000-05-10 Toray Industries, Inc. Dry lithographic plate
US5866294A (en) * 1993-10-26 1999-02-02 Toray Industries, Inc. Water-less quinonediazide lithographic raw plate
EP1166988B1 (en) * 2000-06-21 2003-10-29 Orac NV Method and installation for applying a relief decoration to elongate members
US20070218255A1 (en) * 2006-03-20 2007-09-20 Gray Lorin S Iii Films for decorating glass and methods of their production

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (enExample) * 1956-07-09
NL239402A (enExample) * 1958-05-21
US3252800A (en) * 1963-03-21 1966-05-24 Du Pont Process for preparation of improved photopolymerizable layers
SE310693B (enExample) * 1963-12-16 1969-05-12 Grace W R & Co
NL129237C (enExample) * 1965-03-11
US3575109A (en) * 1968-05-29 1971-04-13 Nat Electrotype Co Inc Synthetic resin printing plate and method of making same
US3698904A (en) * 1969-07-23 1972-10-17 Asahi Chemical Ind Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer
US3858510A (en) * 1971-03-11 1975-01-07 Asahi Chemical Ind Relief structures prepared from photosensitive compositions
US3764324A (en) * 1972-04-13 1973-10-09 Mc Call Corp Photographic polymer composition and process for crosslinking

Also Published As

Publication number Publication date
US4156389A (en) 1979-05-29
DE2364183A1 (de) 1974-07-25
FR2212789A5 (enExample) 1974-07-26
IT1000402B (it) 1976-03-30
GB1454420A (en) 1976-11-03
NL7317805A (enExample) 1974-07-02

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