CA1000870A - Pattern delineation method and product so produced - Google Patents
Pattern delineation method and product so producedInfo
- Publication number
- CA1000870A CA1000870A CA195,833A CA195833A CA1000870A CA 1000870 A CA1000870 A CA 1000870A CA 195833 A CA195833 A CA 195833A CA 1000870 A CA1000870 A CA 1000870A
- Authority
- CA
- Canada
- Prior art keywords
- produced
- product
- delineation method
- pattern delineation
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Metallurgy (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laser Beam Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Electron Beam Exposure (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US358730A US3924093A (en) | 1973-05-09 | 1973-05-09 | Pattern delineation method and product so produced |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1000870A true CA1000870A (en) | 1976-11-30 |
Family
ID=23410798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA195,833A Expired CA1000870A (en) | 1973-05-09 | 1974-03-25 | Pattern delineation method and product so produced |
Country Status (8)
Country | Link |
---|---|
US (1) | US3924093A (xx) |
JP (1) | JPS5017578A (xx) |
CA (1) | CA1000870A (xx) |
DE (1) | DE2421833A1 (xx) |
FR (1) | FR2229084B1 (xx) |
GB (1) | GB1465109A (xx) |
IT (1) | IT1014143B (xx) |
NL (1) | NL7406177A (xx) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2214934B1 (xx) * | 1973-01-18 | 1978-03-24 | Thomson Csf | |
DE2521543A1 (de) * | 1974-05-16 | 1975-11-27 | Crosfield Electronics Ltd | Verfahren und vorrichtung zur wiedergabe von bildern |
US4190759A (en) * | 1975-08-27 | 1980-02-26 | Hitachi, Ltd. | Processing of photomask |
US4259433A (en) * | 1976-10-22 | 1981-03-31 | Fuji Photo Film Co., Ltd. | Method for producing disk-recording plates |
US4918281A (en) * | 1980-07-02 | 1990-04-17 | Rohr Industries, Inc. | Method of manufacturing lightweight thermo-barrier material |
DE3245272A1 (de) * | 1982-12-07 | 1984-06-07 | Ernst Roederstein Spezialfabrik für Kondensatoren GmbH, 8300 Landshut | Verfahren zur herstellung miniaturisierter dick- und duennschichtschaltungen |
US4794680A (en) * | 1985-12-20 | 1989-01-03 | Union Carbide Corporation | Novel wear-resistant laser-engraved ceramic or metallic carbide surfaces for friction rolls for working elongate members, method for producing same and method for working elongate members using the novel friction roll |
US5104481A (en) * | 1988-09-28 | 1992-04-14 | Lasa Industries, Inc. | Method for fabricating laser generated I.C. masks |
WO1993017452A1 (en) * | 1992-02-28 | 1993-09-02 | Lasa Industries, Inc. | Laser generated i.c. mask |
DE69601432T2 (de) * | 1995-03-16 | 1999-10-07 | Minnesota Mining & Mfg | Schwarz-Metall wärmebildbare Transparenz-Elemente |
TR199800580T1 (xx) * | 1995-09-29 | 1998-06-22 | Sage Technology Incorporated | Optik dijital medya kay�t ve kopyalama sistemi. |
US5958630A (en) * | 1997-12-30 | 1999-09-28 | Kabushiki Kaisha Toshiba | Phase shifting mask and method of manufacturing the same |
US6180318B1 (en) | 1999-05-19 | 2001-01-30 | 3M Innovative Properties Company | Method of imaging an article |
US6814332B2 (en) * | 2003-01-15 | 2004-11-09 | Ultimate Support Systems, Inc. | Microphone support boom movement control apparatus and method with differential motion isolation capability |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1047390A (xx) * | 1963-05-20 | 1900-01-01 | ||
US3668028A (en) * | 1970-06-10 | 1972-06-06 | Du Pont | Method of making printing masks with high energy beams |
US3695908A (en) * | 1970-06-29 | 1972-10-03 | Raymond E Szupillo | Thin films of alpha fe2o3 and method of forming |
-
1973
- 1973-05-09 US US358730A patent/US3924093A/en not_active Expired - Lifetime
-
1974
- 1974-03-25 CA CA195,833A patent/CA1000870A/en not_active Expired
- 1974-03-29 FR FR7411453A patent/FR2229084B1/fr not_active Expired
- 1974-05-06 DE DE2421833A patent/DE2421833A1/de not_active Withdrawn
- 1974-05-08 NL NL7406177A patent/NL7406177A/xx not_active Application Discontinuation
- 1974-05-08 IT IT68451/74A patent/IT1014143B/it active
- 1974-05-09 GB GB2047274A patent/GB1465109A/en not_active Expired
- 1974-05-09 JP JP5079174A patent/JPS5017578A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS5017578A (xx) | 1975-02-24 |
US3924093A (en) | 1975-12-02 |
FR2229084B1 (xx) | 1980-04-04 |
FR2229084A1 (xx) | 1974-12-06 |
NL7406177A (xx) | 1974-11-12 |
GB1465109A (en) | 1977-02-23 |
IT1014143B (it) | 1977-04-20 |
DE2421833A1 (de) | 1974-12-05 |
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