BRPI1008673A2 - método de fabricação de molde de estrutura de eletrodo para uso no mesmo. - Google Patents
método de fabricação de molde de estrutura de eletrodo para uso no mesmo.Info
- Publication number
- BRPI1008673A2 BRPI1008673A2 BRPI1008673A BRPI1008673A BRPI1008673A2 BR PI1008673 A2 BRPI1008673 A2 BR PI1008673A2 BR PI1008673 A BRPI1008673 A BR PI1008673A BR PI1008673 A BRPI1008673 A BR PI1008673A BR PI1008673 A2 BRPI1008673 A2 BR PI1008673A2
- Authority
- BR
- Brazil
- Prior art keywords
- electrode structure
- making method
- mold making
- structure mold
- electrode
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/12—Anodising more than once, e.g. in different baths
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2905/00—Use of metals, their alloys or their compounds, as mould material
- B29K2905/02—Aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electrodes Of Semiconductors (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroluminescent Light Sources (AREA)
- ing And Chemical Polishing (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009052502 | 2009-03-05 | ||
PCT/JP2010/001403 WO2010100894A1 (ja) | 2009-03-05 | 2010-03-02 | 型の製造方法およびそれに用いられる電極構造 |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI1008673A2 true BRPI1008673A2 (pt) | 2016-03-08 |
Family
ID=42709461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI1008673A BRPI1008673A2 (pt) | 2009-03-05 | 2010-03-02 | método de fabricação de molde de estrutura de eletrodo para uso no mesmo. |
Country Status (7)
Country | Link |
---|---|
US (1) | US8641884B2 (pt) |
EP (1) | EP2405036B1 (pt) |
JP (1) | JP4617402B2 (pt) |
CN (1) | CN102105624B (pt) |
BR (1) | BRPI1008673A2 (pt) |
RU (1) | RU2480540C1 (pt) |
WO (1) | WO2010100894A1 (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR112012010861A2 (pt) * | 2009-11-10 | 2016-04-05 | Unilever Nv | dispositivo livre de congelamento e método para produzir um dispositivo livre de congelamento |
TWI508872B (zh) * | 2010-07-26 | 2015-11-21 | Mitsubishi Rayon Co | 奈米壓印用模具的製造裝置以及奈米壓印用模具的製造方法 |
JP2012243948A (ja) * | 2011-05-19 | 2012-12-10 | Mitsubishi Rayon Co Ltd | ナノインプリント用モールドの製造方法 |
CN105451966B (zh) | 2013-08-14 | 2017-03-15 | 三菱丽阳株式会社 | 圆柱状纳米压印用模具的制造方法,和纳米压印用再生模具的制造方法 |
WO2016108077A1 (en) * | 2014-12-31 | 2016-07-07 | Essilor International (Compagnie Generale D'optique) | Method of mirror coating an optical article and article thereby obtained |
US11598902B2 (en) * | 2019-09-30 | 2023-03-07 | Canon Kabushiki Kaisha | Optical member, optical apparatus, imaging apparatus, and manufacturing method of optical member |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4002542A (en) * | 1976-02-09 | 1977-01-11 | Corning Glass Works | Thin film capacitor and method |
JP3308091B2 (ja) * | 1994-02-03 | 2002-07-29 | 東京エレクトロン株式会社 | 表面処理方法およびプラズマ処理装置 |
DE19708776C1 (de) | 1997-03-04 | 1998-06-18 | Fraunhofer Ges Forschung | Entspiegelungsschicht sowie Verfahren zur Herstellung derselben |
US7048841B2 (en) * | 1998-12-07 | 2006-05-23 | Semitool, Inc. | Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces |
DE10019720A1 (de) * | 2000-04-20 | 2001-10-31 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum elektrischen Kontaktieren von plattenförmigem Behandlungsgut bei elektrolytischen Prozessen |
DE10020877C1 (de) * | 2000-04-28 | 2001-10-25 | Alcove Surfaces Gmbh | Prägewerkzeug, Verfahren zum Herstellen desselben, Verfahren zur Strukturierung einer Oberfläche eines Werkstücks und Verwendung einer anodisch oxidierten Oberflächenschicht |
US7066234B2 (en) | 2001-04-25 | 2006-06-27 | Alcove Surfaces Gmbh | Stamping tool, casting mold and methods for structuring a surface of a work piece |
RU2186159C1 (ru) * | 2001-01-19 | 2002-07-27 | Государственное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" | Способ нанесения покрытия на деталь из алюминия и алюминиевых сплавов |
US6908540B2 (en) * | 2001-07-13 | 2005-06-21 | Applied Materials, Inc. | Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process |
US7138039B2 (en) * | 2003-01-21 | 2006-11-21 | Applied Materials, Inc. | Liquid isolation of contact rings |
US7374646B2 (en) * | 2003-01-31 | 2008-05-20 | Ebara Corporation | Electrolytic processing apparatus and substrate processing method |
US20050023149A1 (en) * | 2003-06-05 | 2005-02-03 | Tsutomu Nakada | Plating apparatus, plating method and substrate processing apparatus |
JP4406553B2 (ja) | 2003-11-21 | 2010-01-27 | 財団法人神奈川科学技術アカデミー | 反射防止膜の製造方法 |
US20070235342A1 (en) | 2004-10-01 | 2007-10-11 | Canon Kabushiki Kaisha | Method for manufacturing nanostructure |
JP4368384B2 (ja) | 2004-12-03 | 2009-11-18 | シャープ株式会社 | 反射防止材、光学素子、および表示装置ならびにスタンパの製造方法およびスタンパを用いた反射防止材の製造方法 |
JP2009034148A (ja) | 2007-07-31 | 2009-02-19 | Kyoto Platec:Kk | フィルタ及びその製造方法 |
EP2400044B1 (en) * | 2009-02-17 | 2016-09-07 | Sharp Kabushiki Kaisha | Method for producing mold |
-
2010
- 2010-03-02 RU RU2011140339/02A patent/RU2480540C1/ru active
- 2010-03-02 EP EP10748493.3A patent/EP2405036B1/en not_active Not-in-force
- 2010-03-02 WO PCT/JP2010/001403 patent/WO2010100894A1/ja active Application Filing
- 2010-03-02 JP JP2010535147A patent/JP4617402B2/ja active Active
- 2010-03-02 CN CN2010800021690A patent/CN102105624B/zh active Active
- 2010-03-02 US US13/254,556 patent/US8641884B2/en active Active
- 2010-03-02 BR BRPI1008673A patent/BRPI1008673A2/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US8641884B2 (en) | 2014-02-04 |
CN102105624B (zh) | 2012-12-26 |
EP2405036B1 (en) | 2017-11-08 |
JPWO2010100894A1 (ja) | 2012-09-06 |
EP2405036A4 (en) | 2013-01-02 |
US20110315557A1 (en) | 2011-12-29 |
JP4617402B2 (ja) | 2011-01-26 |
RU2480540C1 (ru) | 2013-04-27 |
WO2010100894A1 (ja) | 2010-09-10 |
EP2405036A1 (en) | 2012-01-11 |
CN102105624A (zh) | 2011-06-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06T | Formal requirements before examination [chapter 6.20 patent gazette] | ||
B11E | Dismissal acc. art. 34 of ipl - requirements for examination incomplete | ||
B11T | Dismissal of application maintained [chapter 11.20 patent gazette] |