BRPI0913023A2 - fabricação de ferramentas de microescala - Google Patents

fabricação de ferramentas de microescala

Info

Publication number
BRPI0913023A2
BRPI0913023A2 BRPI0913023A BRPI0913023A BRPI0913023A2 BR PI0913023 A2 BRPI0913023 A2 BR PI0913023A2 BR PI0913023 A BRPI0913023 A BR PI0913023A BR PI0913023 A BRPI0913023 A BR PI0913023A BR PI0913023 A2 BRPI0913023 A2 BR PI0913023A2
Authority
BR
Brazil
Prior art keywords
microscale
tool manufacturing
tool
manufacturing
microscale tool
Prior art date
Application number
BRPI0913023A
Other languages
English (en)
Inventor
Levent Biyikli
Robert W Wilson
Yi Lu
Original Assignee
3M Innovate Properties Company
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovate Properties Company filed Critical 3M Innovate Properties Company
Publication of BRPI0913023A2 publication Critical patent/BRPI0913023A2/pt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0065—Manufacturing aspects; Material aspects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0033—Means for improving the coupling-out of light from the light guide
    • G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Micromachines (AREA)
BRPI0913023A 2008-05-23 2009-05-07 fabricação de ferramentas de microescala BRPI0913023A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5561508P 2008-05-23 2008-05-23
PCT/US2009/043124 WO2009151836A2 (en) 2008-05-23 2009-05-07 Fabrication of microscale tooling

Publications (1)

Publication Number Publication Date
BRPI0913023A2 true BRPI0913023A2 (pt) 2015-10-13

Family

ID=41417334

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0913023A BRPI0913023A2 (pt) 2008-05-23 2009-05-07 fabricação de ferramentas de microescala

Country Status (8)

Country Link
US (1) US20110068494A1 (pt)
EP (1) EP2291323A4 (pt)
JP (1) JP2011523597A (pt)
KR (1) KR20110020839A (pt)
CN (1) CN102036908A (pt)
BR (1) BRPI0913023A2 (pt)
MX (1) MX2010012582A (pt)
WO (1) WO2009151836A2 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9976039B1 (en) * 2013-10-04 2018-05-22 Hrl Laboratories, Llc Surface-structured coatings
WO2017065882A1 (en) * 2015-08-28 2017-04-20 Cree, Inc. Optical element and method of forming an optical element
CN106569360A (zh) * 2015-10-10 2017-04-19 博昱科技（丹阳）有限公司 导光片、背光源装置及液晶显示装置
CN112848282B (zh) * 2021-01-07 2021-11-26 芯体素(杭州)科技发展有限公司 一种基于嵌入式3d打印的有机光波导制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6251550B1 (en) * 1998-07-10 2001-06-26 Ball Semiconductor, Inc. Maskless photolithography system that digitally shifts mask data responsive to alignment data
WO2004001508A2 (en) * 2002-06-25 2003-12-31 University Of South Florida Method and apparatus for maskless photolithography
JP2005201933A (ja) * 2004-01-13 2005-07-28 Hitachi Maxell Ltd マイクロレンズアレイ、スタンパ及び液晶表示装置の製造方法

Also Published As

Publication number Publication date
EP2291323A4 (en) 2012-05-09
EP2291323A2 (en) 2011-03-09
JP2011523597A (ja) 2011-08-18
WO2009151836A2 (en) 2009-12-17
WO2009151836A3 (en) 2010-03-11
KR20110020839A (ko) 2011-03-03
CN102036908A (zh) 2011-04-27
MX2010012582A (es) 2010-12-20
US20110068494A1 (en) 2011-03-24

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE AS 4A, 5A E 6A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2344 DE 08-12-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.