BRPI0510823A - method for depositing a metal oxide coating and article - Google Patents

method for depositing a metal oxide coating and article

Info

Publication number
BRPI0510823A
BRPI0510823A BRPI0510823-3A BRPI0510823A BRPI0510823A BR PI0510823 A BRPI0510823 A BR PI0510823A BR PI0510823 A BRPI0510823 A BR PI0510823A BR PI0510823 A BRPI0510823 A BR PI0510823A
Authority
BR
Brazil
Prior art keywords
metal oxide
oxide coating
depositing
article
substrate
Prior art date
Application number
BRPI0510823-3A
Other languages
Portuguese (pt)
Inventor
Dmitry P Dinega
Christopher M Weikart
Original Assignee
Dow Global Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Global Technologies filed Critical Dow Global Technologies
Publication of BRPI0510823A publication Critical patent/BRPI0510823A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Laminated Bodies (AREA)

Abstract

MéTODO PARA DEPOSITAR UM REVESTIMENTO DE óXIDO METáLICO E ARTIGO. Um revestimento de óxido metálico pode ser aplicado a um substrato (60) a uma temperatura relativamente baixa e a uma pressão próxima da atmosférica carregando um precursor de óxido metálico (10) e um agente oxidante através de uma descarga carona (40) ou uma descarga por barreira dielétrica para formar o óxido metálico e depositá-lo sobre o substrato.METHOD FOR DEPOSITING A METAL OXIDE COATING AND ARTICLE. A metal oxide coating may be applied to a substrate (60) at a relatively low temperature and near atmospheric pressure by carrying a metal oxide precursor (10) and an oxidizing agent through a hitchhike (40) or a hump. dielectric barrier to form the metal oxide and deposit it on the substrate.

BRPI0510823-3A 2004-05-20 2005-05-20 method for depositing a metal oxide coating and article BRPI0510823A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57281304P 2004-05-20 2004-05-20
PCT/US2005/017747 WO2005113856A1 (en) 2004-05-20 2005-05-20 Plasma enhanced chemical vapor deposition of metal oxide

Publications (1)

Publication Number Publication Date
BRPI0510823A true BRPI0510823A (en) 2007-12-26

Family

ID=34970263

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0510823-3A BRPI0510823A (en) 2004-05-20 2005-05-20 method for depositing a metal oxide coating and article

Country Status (10)

Country Link
EP (1) EP1756329A1 (en)
JP (1) JP2007538159A (en)
KR (1) KR20070012718A (en)
CN (1) CN1957109A (en)
BR (1) BRPI0510823A (en)
CA (1) CA2562914A1 (en)
MX (1) MXPA06013380A (en)
RU (1) RU2006145309A (en)
SG (1) SG151324A1 (en)
WO (1) WO2005113856A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007130448A2 (en) * 2006-05-05 2007-11-15 Pilkington Group Limited Method of depositing zinc oxide coatings on a substrate
KR101498748B1 (en) * 2007-05-01 2015-03-09 엑사테크 엘.엘.씨. Edge healing and field repair of plasma coating
DE102007025151A1 (en) * 2007-05-29 2008-09-04 Innovent E.V. Coating method comprises producing plasma jet from process gas and introducing precursor material into it, coating being deposited from jet on to substrate or existing coating on it and substrate being heated
EP2145979A1 (en) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Method and installation for depositing layers on both sides of a substrate simultaneously
EP2145978A1 (en) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Method and installation for depositing layers on a substrate
ES2335638B1 (en) * 2008-08-01 2011-02-09 Cosentino, S.A. ARTICLE IN THE FORM OF A TABLE OR Slab MANUFACTURED OF PETREO AGLOMERATE COATED WITH TRANSPARENT THIN SHEETS OF TIO2 OR ZNO THROUGH DRY DEPOSITION TECHNIQUES WITH HIGH RESISTANCE AGAINST SOLAR DEGRADATION.
JP2010250088A (en) * 2009-04-16 2010-11-04 Konica Minolta Business Technologies Inc Intermediate transfer member, method for manufacturing intermediate transfer member, and image forming apparatus
KR101133250B1 (en) * 2009-09-29 2012-04-05 부산대학교 산학협력단 manufacturing mathod of transparency electrode using polymer substrate atmosphere plasma treated
DE102012003943B4 (en) * 2012-02-24 2017-09-14 Innovent E.V. Technologieentwicklung Process for the preparation of antibacterial nanosheets on threads or textile materials in the form of woven, knitted or nonwoven fabric, product produced by this process and its use
DE102014118487A1 (en) * 2014-12-12 2016-06-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for depositing a transparent multi-layer system with scratch-resistant properties
WO2024126566A1 (en) 2022-12-14 2024-06-20 Basf Coatings Gmbh Multilayer barrier film coated polymeric substrate, its manufacture and use in electronic devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6457767A (en) * 1987-08-28 1989-03-06 Seiko Epson Corp Josephson effect element
EP0618942A4 (en) * 1991-12-23 1994-11-17 Akzo Nobel Nv Blend of polyethylene terephthalate matrix and thermotropic liquid crystal block copolymer.
JP4024546B2 (en) * 2002-01-25 2007-12-19 住友ベークライト株式会社 Method for producing film with inorganic thin film
GB0217553D0 (en) * 2002-07-30 2002-09-11 Sheel David W Titania coatings by CVD at atmospheric pressure

Also Published As

Publication number Publication date
RU2006145309A (en) 2008-06-27
EP1756329A1 (en) 2007-02-28
KR20070012718A (en) 2007-01-26
CA2562914A1 (en) 2005-12-01
WO2005113856A1 (en) 2005-12-01
MXPA06013380A (en) 2007-01-23
CN1957109A (en) 2007-05-02
JP2007538159A (en) 2007-12-27
SG151324A1 (en) 2009-04-30

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]