BRPI0503945A - métodos para fabricação de moduladores interferométricos por remoção seletiva de um material - Google Patents

métodos para fabricação de moduladores interferométricos por remoção seletiva de um material

Info

Publication number
BRPI0503945A
BRPI0503945A BRPI0503945-2A BRPI0503945A BRPI0503945A BR PI0503945 A BRPI0503945 A BR PI0503945A BR PI0503945 A BRPI0503945 A BR PI0503945A BR PI0503945 A BRPI0503945 A BR PI0503945A
Authority
BR
Brazil
Prior art keywords
methods
interferometric modulators
selectively removing
selectively
manufacturing
Prior art date
Application number
BRPI0503945-2A
Other languages
English (en)
Inventor
Ming-Hau Tung
Philip D Floyd
Brian W Arbuckle
Original Assignee
Idc Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/090,778 external-priority patent/US7429334B2/en
Application filed by Idc Llc filed Critical Idc Llc
Publication of BRPI0503945A publication Critical patent/BRPI0503945A/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00595—Control etch selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045

Abstract

"MéTODOS PARA FABRICAçãO DE MODULADORES INTERFEROMéTRICOS POR REMOçãO SELETIVA DE UM MATERIAL". Métodos para produção de dispositivos MEMS, tais como moduladores interferométricos, envolvem a remoção seletiva de uma porção de sacrifício de um material, para formar uma cavidade interna, deixando ficar uma porção remanescente do material, para formar uma estrutura de haste. O material pode ser depositado como cobertura e alterado seletivamente, para definir as porções de sacrifício, que são removíveis seletivamente relativas às porções remanescentes. Alternativamente, uma camada de material pode ser removida lateralmente das aberturas em uma camada de cobertura. Esses métodos podem ser usados para produzir moduladores interferométricos não liberados e liberados.
BRPI0503945-2A 2004-09-27 2005-09-27 métodos para fabricação de moduladores interferométricos por remoção seletiva de um material BRPI0503945A (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US61340104P 2004-09-27 2004-09-27
US11/090,778 US7429334B2 (en) 2004-09-27 2005-03-25 Methods of fabricating interferometric modulators by selectively removing a material
US11/090,552 US7420728B2 (en) 2004-09-27 2005-03-25 Methods of fabricating interferometric modulators by selectively removing a material

Publications (1)

Publication Number Publication Date
BRPI0503945A true BRPI0503945A (pt) 2006-05-09

Family

ID=35197990

Family Applications (2)

Application Number Title Priority Date Filing Date
BRPI0503945-2A BRPI0503945A (pt) 2004-09-27 2005-09-27 métodos para fabricação de moduladores interferométricos por remoção seletiva de um material
BRPI0503888-0A BRPI0503888A (pt) 2004-09-27 2005-09-27 processos de fabricação de moduladores interferométricos por remoção seletiva de um material

Family Applications After (1)

Application Number Title Priority Date Filing Date
BRPI0503888-0A BRPI0503888A (pt) 2004-09-27 2005-09-27 processos de fabricação de moduladores interferométricos por remoção seletiva de um material

Country Status (7)

Country Link
EP (2) EP1640318A2 (pt)
JP (2) JP4422665B2 (pt)
KR (2) KR20060092912A (pt)
AU (2) AU2005211603A1 (pt)
BR (2) BRPI0503945A (pt)
CA (2) CA2520623A1 (pt)
SG (2) SG121160A1 (pt)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7385744B2 (en) * 2006-06-28 2008-06-10 Qualcomm Mems Technologies, Inc. Support structure for free-standing MEMS device and methods for forming the same
US7835061B2 (en) 2006-06-28 2010-11-16 Qualcomm Mems Technologies, Inc. Support structures for free-standing electromechanical devices
US7566664B2 (en) * 2006-08-02 2009-07-28 Qualcomm Mems Technologies, Inc. Selective etching of MEMS using gaseous halides and reactive co-etchants
EP2129619A2 (en) 2007-04-04 2009-12-09 Qualcomm Mems Technologies, Inc. Eliminate release etch attack by interface modification in sacrificial layers
US7719752B2 (en) 2007-05-11 2010-05-18 Qualcomm Mems Technologies, Inc. MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same
US7773286B2 (en) * 2007-09-14 2010-08-10 Qualcomm Mems Technologies, Inc. Periodic dimple array
US7848003B2 (en) 2007-09-17 2010-12-07 Qualcomm Mems Technologies, Inc. Semi-transparent/transflective lighted interferometric devices
WO2009052326A2 (en) 2007-10-19 2009-04-23 Qualcomm Mems Technologies, Inc. Display with integrated photovoltaics
US8058549B2 (en) 2007-10-19 2011-11-15 Qualcomm Mems Technologies, Inc. Photovoltaic devices with integrated color interferometric film stacks
JP5513813B2 (ja) * 2009-08-31 2014-06-04 新日本無線株式会社 Ｍｅｍｓマイクロフォンおよびその製造方法
EP2327659B1 (en) * 2009-11-30 2018-07-11 IMEC vzw Method of manufacturing a semiconductor device and semiconductor devices resulting therefrom

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7460291B2 (en) 1994-05-05 2008-12-02 Idc, Llc Separable modulator

Also Published As

Publication number Publication date
CA2520623A1 (en) 2006-03-27
AU2005211604A1 (en) 2006-04-13
SG121161A1 (en) 2006-04-26
EP1640317A2 (en) 2006-03-29
KR20060092912A (ko) 2006-08-23
KR20060092913A (ko) 2006-08-23
BRPI0503888A (pt) 2006-05-09
EP1640318A2 (en) 2006-03-29
CA2520374A1 (en) 2006-03-27
AU2005211603A1 (en) 2006-04-13
SG121160A1 (en) 2006-04-26
JP2006099112A (ja) 2006-04-13
JP2006106733A (ja) 2006-04-20
JP4394626B2 (ja) 2010-01-06
JP4422665B2 (ja) 2010-02-24

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal acc. article 33 of ipl - extension of time limit for request of examination expired