BR9601309A - Dispositivo para a aplicação de camadas delgadas sobre um substrato - Google Patents

Dispositivo para a aplicação de camadas delgadas sobre um substrato

Info

Publication number
BR9601309A
BR9601309A BR9601309A BR9601309A BR9601309A BR 9601309 A BR9601309 A BR 9601309A BR 9601309 A BR9601309 A BR 9601309A BR 9601309 A BR9601309 A BR 9601309A BR 9601309 A BR9601309 A BR 9601309A
Authority
BR
Brazil
Prior art keywords
substrate
thin layers
applying thin
applying
layers
Prior art date
Application number
BR9601309A
Other languages
English (en)
Inventor
Manfred Schumacher
Erwin Winter
Andreas Sauer
Dietmar Marquardt
Original Assignee
Leybold Aktiegesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Aktiegesellschaft filed Critical Leybold Aktiegesellschaft
Publication of BR9601309A publication Critical patent/BR9601309A/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/18—Assembling together the component parts of electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
BR9601309A 1995-04-11 1996-04-10 Dispositivo para a aplicação de camadas delgadas sobre um substrato BR9601309A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19513691A DE19513691A1 (de) 1995-04-11 1995-04-11 Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat

Publications (1)

Publication Number Publication Date
BR9601309A true BR9601309A (pt) 1998-01-13

Family

ID=7759457

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9601309A BR9601309A (pt) 1995-04-11 1996-04-10 Dispositivo para a aplicação de camadas delgadas sobre um substrato

Country Status (9)

Country Link
US (1) US5662784A (pt)
EP (2) EP0957507A1 (pt)
JP (1) JPH08291383A (pt)
KR (1) KR100230072B1 (pt)
CN (1) CN1068639C (pt)
BR (1) BR9601309A (pt)
CA (1) CA2173891A1 (pt)
DE (2) DE19513691A1 (pt)
TW (1) TW402166U (pt)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19715245C2 (de) * 1997-04-12 1999-09-02 Leybold Systems Gmbh Vakuumbehandlungsvorrichtung zum Aufbringen dünner Schichten
DE19734079A1 (de) * 1997-08-07 1999-02-11 Leybold Systems Gmbh Kathode für eine Vorrichtung zum Zerstäuben eines Targets
DE19741708A1 (de) * 1997-09-22 1999-04-01 Leybold Systems Gmbh Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
DE29717418U1 (de) * 1997-09-26 1998-01-22 Leybold Systems GmbH, 63450 Hanau Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
DE19755837A1 (de) * 1997-12-16 1999-06-17 Leybold Ag Sputteranlage
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
US7166199B2 (en) * 2002-12-18 2007-01-23 Cardinal Cg Company Magnetron sputtering systems including anodic gas distribution systems
US8500973B2 (en) * 2004-08-20 2013-08-06 Jds Uniphase Corporation Anode for sputter coating
US7879209B2 (en) * 2004-08-20 2011-02-01 Jds Uniphase Corporation Cathode for sputter coating
US20080308417A1 (en) * 2005-03-14 2008-12-18 Toyoaki Hirata Sputtering Apparatus
KR101174146B1 (ko) * 2005-06-28 2012-08-14 엘지디스플레이 주식회사 스퍼터링 장치
US7850828B2 (en) * 2006-09-15 2010-12-14 Cardinal Cg Company Enhanced virtual anode
US8557093B2 (en) * 2007-03-22 2013-10-15 Sunpower Corporation Deposition system with electrically isolated pallet and anode assemblies
EP2096192A1 (en) * 2008-02-28 2009-09-02 Applied Materials, Inc. Backside coating prevention device.
EP2103709A1 (en) * 2008-02-28 2009-09-23 Applied Materials, Inc. Backside coating prevention device and method.
CN102002675B (zh) * 2009-08-28 2013-07-03 鸿富锦精密工业（深圳）有限公司 真空溅镀设备的进气装置
CN102623656A (zh) * 2012-04-06 2012-08-01 西北工业大学 一种用于水下航行器电池组的固定器
CN103898462B (zh) * 2012-12-29 2017-08-22 深圳富泰宏精密工业有限公司 磁控溅射镀膜装置
DE102013204132B4 (de) * 2013-03-11 2015-04-02 Von Ardenne Gmbh Vorrichtung zur Anodenhalterung beim Magnetron-Sputtern
JP6189122B2 (ja) * 2013-07-19 2017-08-30 日東電工株式会社 スパッタ装置
CN107208249B (zh) 2015-02-03 2019-08-20 卡迪奈尔镀膜玻璃公司 包括气体分配系统的喷溅装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2522227A1 (de) * 1975-05-20 1976-12-02 Telic Corp Verfahren und vorrichtung zur erzeugung einer glimmentladung
US4407708A (en) * 1981-08-06 1983-10-04 Eaton Corporation Method for operating a magnetron sputtering apparatus
US4425218A (en) * 1982-03-30 1984-01-10 Shatterproof Glass Corporation Gas distribution system for sputtering cathodes
DE3521053A1 (de) * 1985-06-12 1986-12-18 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum aufbringen duenner schichten auf ein substrat
DE3800449A1 (de) * 1988-01-09 1989-07-20 Leybold Ag Verfahren und einrichtung zur herstellung magnetooptischer, speicher- und loeschfaehiger datentraeger
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
DE4006411C2 (de) * 1990-03-01 1997-05-28 Leybold Ag Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat

Also Published As

Publication number Publication date
KR960039050A (ko) 1996-11-21
CA2173891A1 (en) 1996-10-12
DE19515088A1 (de) 1997-01-02
US5662784A (en) 1997-09-02
EP0737998A2 (de) 1996-10-16
EP0957507A1 (de) 1999-11-17
JPH08291383A (ja) 1996-11-05
EP0737998A3 (de) 1998-05-13
DE19513691A1 (de) 1996-10-17
TW402166U (en) 2000-08-11
CN1140206A (zh) 1997-01-15
KR100230072B1 (ko) 1999-11-15
CN1068639C (zh) 2001-07-18

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B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2605 DE 08-12-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.