BR9204961A - Polimeros,composicoes sensiveis a radiacao,processo para a preparacao de imagens positivas,emprego e formas de impressao - Google Patents

Polimeros,composicoes sensiveis a radiacao,processo para a preparacao de imagens positivas,emprego e formas de impressao

Info

Publication number
BR9204961A
BR9204961A BR9204961A BR9204961A BR9204961A BR 9204961 A BR9204961 A BR 9204961A BR 9204961 A BR9204961 A BR 9204961A BR 9204961 A BR9204961 A BR 9204961A BR 9204961 A BR9204961 A BR 9204961A
Authority
BR
Brazil
Prior art keywords
alkyl
halogen
unsubstituted
substituted
nitro groups
Prior art date
Application number
BR9204961A
Other languages
English (en)
Inventor
Alfred Dr Steinmann
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of BR9204961A publication Critical patent/BR9204961A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/22—Oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Emergency Medicine (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Structure Of Printed Boards (AREA)
  • Polymerisation Methods In General (AREA)
BR9204961A 1991-12-10 1992-12-09 Polimeros,composicoes sensiveis a radiacao,processo para a preparacao de imagens positivas,emprego e formas de impressao BR9204961A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH362691 1991-12-10

Publications (1)

Publication Number Publication Date
BR9204961A true BR9204961A (pt) 1993-06-15

Family

ID=4260026

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9204961A BR9204961A (pt) 1991-12-10 1992-12-09 Polimeros,composicoes sensiveis a radiacao,processo para a preparacao de imagens positivas,emprego e formas de impressao

Country Status (7)

Country Link
EP (1) EP0546997B1 (pt)
JP (1) JPH05279425A (pt)
AT (1) ATE189533T1 (pt)
BR (1) BR9204961A (pt)
CA (1) CA2084856A1 (pt)
DE (1) DE59209808D1 (pt)
TW (1) TW224165B (pt)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1231205A4 (en) * 1999-11-15 2004-05-26 Jsr Corp VINYLPHENYL PROPIONIC ACID DERIVATIVES, METHOD FOR THE PRODUCTION THEREOF, POLYMERS MADE THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION
JP4905786B2 (ja) * 2007-02-14 2012-03-28 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58203433A (ja) * 1982-05-21 1983-11-26 Fuji Photo Film Co Ltd 感光性組成物
EP0440374B1 (en) * 1990-01-30 1997-04-16 Wako Pure Chemical Industries Ltd Chemical amplified resist material
EP0467841A3 (en) * 1990-07-18 1992-10-28 Ciba-Geigy Ag Benzoic acid ester comprising an olefinically unsaturated substituant

Also Published As

Publication number Publication date
DE59209808D1 (de) 2000-03-09
EP0546997A1 (de) 1993-06-16
ATE189533T1 (de) 2000-02-15
EP0546997B1 (de) 2000-02-02
JPH05279425A (ja) 1993-10-26
TW224165B (pt) 1994-05-21
CA2084856A1 (en) 1993-06-11

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Legal Events

Date Code Title Description
EE Request for examination
FB36 Technical and formal requirements: requirement - article 36 of industrial property law
FA8 Dismissal: dismissal - article 36, par. 1 of industrial property law