BR9107061A - Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmo - Google Patents
Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmoInfo
- Publication number
- BR9107061A BR9107061A BR919107061A BR9107061A BR9107061A BR 9107061 A BR9107061 A BR 9107061A BR 919107061 A BR919107061 A BR 919107061A BR 9107061 A BR9107061 A BR 9107061A BR 9107061 A BR9107061 A BR 9107061A
- Authority
- BR
- Brazil
- Prior art keywords
- rays
- same
- particle beams
- control particle
- many range
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Particle Accelerators (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60745690A | 1990-10-31 | 1990-10-31 | |
US07/678,208 US5192869A (en) | 1990-10-31 | 1991-04-01 | Device for controlling beams of particles, X-ray and gamma quanta |
US07/678,603 US5175755A (en) | 1990-10-31 | 1991-04-01 | Use of a kumakhov lens for x-ray lithography |
PCT/US1991/008167 WO1992008235A1 (en) | 1990-10-31 | 1991-10-31 | Device for controlling beams of particles, x-ray and gamma quanta and uses thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9107061A true BR9107061A (pt) | 1993-09-21 |
Family
ID=27416975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR919107061A BR9107061A (pt) | 1990-10-31 | 1991-10-31 | Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmo |
Country Status (4)
Country | Link |
---|---|
US (1) | US5175755A (pt) |
KR (1) | KR100248283B1 (pt) |
AU (1) | AU9032291A (pt) |
BR (1) | BR9107061A (pt) |
Families Citing this family (64)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5439781A (en) * | 1993-05-10 | 1995-08-08 | At&T Corp. | Device fabrication entailing synchrotron radiation |
DE4408057B4 (de) * | 1994-03-07 | 2008-12-24 | Ifg-Institute For Scientific Instruments Gmbh | Vorrichtung zur Röntgenfluoreszenzspektroskopie und deren Verwendung |
US5485498A (en) * | 1994-07-01 | 1996-01-16 | Motorola, Inc. | X-ray interface and condenser |
WO1996003640A1 (fr) * | 1994-07-27 | 1996-02-08 | Muradin Abubekirovich Kumakhov | Procede d'obtention d'une image d'un objet et son dispositif de mise en ×uvre |
US6271534B1 (en) | 1994-07-08 | 2001-08-07 | Muradin Abubekirovich Kumakhov | Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles |
US5604353A (en) * | 1995-06-12 | 1997-02-18 | X-Ray Optical Systems, Inc. | Multiple-channel, total-reflection optic with controllable divergence |
US5747821A (en) * | 1995-08-04 | 1998-05-05 | X-Ray Optical Systems, Inc. | Radiation focusing monocapillary with constant inner dimension region and varying inner dimension region |
CN1069136C (zh) * | 1996-02-17 | 2001-08-01 | 北京师范大学 | 整体x光透镜及其制造方法及使用整体x光透镜的设备 |
US6586757B2 (en) | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
US6566667B1 (en) | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
US5991024A (en) * | 1997-05-30 | 1999-11-23 | Bauer; Bruno S. | Capillary spectrometer |
EP1058156A3 (en) * | 1999-06-04 | 2003-06-25 | ASML Netherlands B.V. | Integrating waveguide for use in lithographic projection apparatus |
TW498184B (en) * | 1999-06-04 | 2002-08-11 | Asm Lithography Bv | Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method |
DE19962160C2 (de) * | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
RU2164361C1 (ru) | 1999-10-18 | 2001-03-20 | Кумахов Мурадин Абубекирович | Линза для управления излучением в виде потока нейтральных или заряженных частиц, способ изготовления таких линз и содержащее такие линзы аналитическое устройство, устройство для лучевой терапии и устройства для контактной и проекционной литографии |
US6700598B1 (en) * | 2000-04-25 | 2004-03-02 | Cortron Corporation | Digital imaging system employing non-coherent light source |
US7180081B2 (en) | 2000-06-09 | 2007-02-20 | Cymer, Inc. | Discharge produced plasma EUV light source |
US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
RU2206186C2 (ru) | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
UA59495C2 (uk) * | 2000-08-07 | 2003-09-15 | Мурадін Абубєкіровіч Кумахов | Рентгенівський вимірювально-випробувальний комплекс |
RU2187160C1 (ru) * | 2000-12-29 | 2002-08-10 | Кумахов Мурадин Абубекирович | Устройство для рентгеновской литографии |
US6576912B2 (en) | 2001-01-03 | 2003-06-10 | Hugo M. Visser | Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window |
US6804327B2 (en) * | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
US7465946B2 (en) | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
US7378673B2 (en) | 2005-02-25 | 2008-05-27 | Cymer, Inc. | Source material dispenser for EUV light source |
US7598509B2 (en) | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
US7405416B2 (en) * | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
CN1246858C (zh) * | 2001-06-19 | 2006-03-22 | X射线光学系统公司 | X射线荧光(xrf)光谱测定系统和方法 |
US6781060B2 (en) | 2002-07-26 | 2004-08-24 | X-Ray Optical Systems Incorporated | Electrical connector, a cable sleeve, and a method for fabricating an electrical connection |
US7217941B2 (en) | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
US7006596B1 (en) * | 2003-05-09 | 2006-02-28 | Kla-Tencor Technologies Corporation | Light element measurement |
CN101006541B (zh) * | 2003-06-02 | 2010-07-07 | 福克斯·彻斯癌症中心 | 高能多能离子选择系统、离子束治疗系统及离子束治疗中心 |
US7023955B2 (en) * | 2003-08-12 | 2006-04-04 | X-Ray Optical System, Inc. | X-ray fluorescence system with apertured mask for analyzing patterned surfaces |
US7193228B2 (en) | 2004-03-10 | 2007-03-20 | Cymer, Inc. | EUV light source optical elements |
US7087914B2 (en) * | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
US8075732B2 (en) * | 2004-11-01 | 2011-12-13 | Cymer, Inc. | EUV collector debris management |
US7196342B2 (en) | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
US7109503B1 (en) * | 2005-02-25 | 2006-09-19 | Cymer, Inc. | Systems for protecting internal components of an EUV light source from plasma-generated debris |
US7355191B2 (en) | 2004-11-01 | 2008-04-08 | Cymer, Inc. | Systems and methods for cleaning a chamber window of an EUV light source |
US7449703B2 (en) * | 2005-02-25 | 2008-11-11 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery target material handling |
US7482609B2 (en) | 2005-02-28 | 2009-01-27 | Cymer, Inc. | LPP EUV light source drive laser system |
US7141806B1 (en) | 2005-06-27 | 2006-11-28 | Cymer, Inc. | EUV light source collector erosion mitigation |
US7365349B2 (en) | 2005-06-27 | 2008-04-29 | Cymer, Inc. | EUV light source collector lifetime improvements |
US7180083B2 (en) | 2005-06-27 | 2007-02-20 | Cymer, Inc. | EUV light source collector erosion mitigation |
US7402825B2 (en) * | 2005-06-28 | 2008-07-22 | Cymer, Inc. | LPP EUV drive laser input system |
WO2007019053A1 (en) * | 2005-08-04 | 2007-02-15 | X-Ray Optical Systems, Inc. | Monochromatic x-ray micro beam for trace element mapping |
US7453077B2 (en) | 2005-11-05 | 2008-11-18 | Cymer, Inc. | EUV light source |
US7742566B2 (en) * | 2007-12-07 | 2010-06-22 | General Electric Company | Multi-energy imaging system and method using optic devices |
US8488743B2 (en) | 2008-04-11 | 2013-07-16 | Rigaku Innovative Technologies, Inc. | Nanotube based device for guiding X-ray photons and neutrons |
CA2720776C (en) * | 2008-04-11 | 2013-07-02 | Rigaku Innovative Technologies, Inc. | X-ray generator with polycapillary optic |
US8130908B2 (en) * | 2009-02-23 | 2012-03-06 | X-Ray Optical Systems, Inc. | X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic |
CN102543243B (zh) * | 2010-12-28 | 2016-07-13 | Ge医疗系统环球技术有限公司 | 集成毛细管式平行x射线聚焦透镜 |
WO2013025682A2 (en) | 2011-08-15 | 2013-02-21 | X-Ray Optical Systems, Inc. | Sample viscosity and flow control for heavy samples, and x-ray analysis applications thereof |
US9335280B2 (en) | 2011-10-06 | 2016-05-10 | X-Ray Optical Systems, Inc. | Mobile transport and shielding apparatus for removable x-ray analyzer |
US20140294157A1 (en) | 2011-10-26 | 2014-10-02 | X-Ray Optical Systems, Inc. | Support structure and highly aligned monochromating x-ray optics for x-ray analysis engines and analyzers |
EP2820666A4 (en) * | 2012-02-28 | 2016-02-17 | X Ray Optical Sys Inc | DEVICE FOR ANALYSIS BY X-RAYS WITH MULTIPLE EXTRACTION ENERGY TAPES, PRODUCED BY X-RAY TUBE ANODES MADE OF SEVERAL MATERIALS AND MONOCHROMATIC OPTICS |
US9883793B2 (en) | 2013-08-23 | 2018-02-06 | The Schepens Eye Research Institute, Inc. | Spatial modeling of visual fields |
JP6397690B2 (ja) * | 2014-08-11 | 2018-09-26 | 株式会社日立ハイテクノロジーズ | X線透過検査装置及び異物検出方法 |
KR102332578B1 (ko) * | 2020-05-08 | 2021-11-30 | 주식회사 아이에스피 | 엑스선 집속광학계를 이용한 가변형 엑스선 발생장치 |
US20220201830A1 (en) | 2020-12-23 | 2022-06-23 | X-Ray Optical Systems, Inc. | X-ray source assembly with enhanced temperature control for output stability |
US20240035990A1 (en) | 2022-07-29 | 2024-02-01 | X-Ray Optical Systems, Inc. | Polarized, energy dispersive x-ray fluorescence system and method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0322408B1 (en) * | 1986-08-15 | 1993-05-05 | Commonwealth Scientific And Industrial Research Organisation | Instrumentation for conditioning x-ray or neutron beams |
-
1991
- 1991-04-01 US US07/678,603 patent/US5175755A/en not_active Expired - Lifetime
- 1991-10-31 AU AU90322/91A patent/AU9032291A/en not_active Abandoned
- 1991-10-31 BR BR919107061A patent/BR9107061A/pt not_active IP Right Cessation
-
1993
- 1993-04-30 KR KR1019930701306A patent/KR100248283B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100248283B1 (en) | 2000-03-15 |
US5175755A (en) | 1992-12-29 |
KR930702769A (ko) | 1993-09-09 |
AU9032291A (en) | 1992-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FB19 | Grant procedure suspended (art. 19) | ||
FF | Decision: intention to grant | ||
FG | Letter patent granted | ||
B21A | Patent or certificate of addition expired [chapter 21.1 patent gazette] |
Free format text: PATENTE EXTINTA EM 31/10/2006 |