BR9107061A - Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmo - Google Patents

Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmo

Info

Publication number
BR9107061A
BR9107061A BR919107061A BR9107061A BR9107061A BR 9107061 A BR9107061 A BR 9107061A BR 919107061 A BR919107061 A BR 919107061A BR 9107061 A BR9107061 A BR 9107061A BR 9107061 A BR9107061 A BR 9107061A
Authority
BR
Brazil
Prior art keywords
rays
same
particle beams
control particle
many range
Prior art date
Application number
BR919107061A
Other languages
English (en)
Inventor
Muradin A Kumakhov
Original Assignee
X Ray Optical Sys Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/678,208 external-priority patent/US5192869A/en
Application filed by X Ray Optical Sys Inc filed Critical X Ray Optical Sys Inc
Priority claimed from PCT/US1991/008167 external-priority patent/WO1992008235A1/en
Publication of BR9107061A publication Critical patent/BR9107061A/pt

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BR919107061A 1990-10-31 1991-10-31 Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmo BR9107061A (pt)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US60745690A 1990-10-31 1990-10-31
US07/678,208 US5192869A (en) 1990-10-31 1991-04-01 Device for controlling beams of particles, X-ray and gamma quanta
US07/678,603 US5175755A (en) 1990-10-31 1991-04-01 Use of a kumakhov lens for x-ray lithography
PCT/US1991/008167 WO1992008235A1 (en) 1990-10-31 1991-10-31 Device for controlling beams of particles, x-ray and gamma quanta and uses thereof

Publications (1)

Publication Number Publication Date
BR9107061A true BR9107061A (pt) 1993-09-21

Family

ID=27416975

Family Applications (1)

Application Number Title Priority Date Filing Date
BR919107061A BR9107061A (pt) 1990-10-31 1991-10-31 Dispositivo para controlar feixes de particulas,raios x e quantas gama,e usos do mesmo

Country Status (4)

Country Link
US (1) US5175755A (pt)
KR (1) KR100248283B1 (pt)
AU (1) AU9032291A (pt)
BR (1) BR9107061A (pt)

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US5439781A (en) * 1993-05-10 1995-08-08 At&T Corp. Device fabrication entailing synchrotron radiation
DE4408057B4 (de) * 1994-03-07 2008-12-24 Ifg-Institute For Scientific Instruments Gmbh Vorrichtung zur Röntgenfluoreszenzspektroskopie und deren Verwendung
US5485498A (en) * 1994-07-01 1996-01-16 Motorola, Inc. X-ray interface and condenser
WO1996003640A1 (fr) * 1994-07-27 1996-02-08 Muradin Abubekirovich Kumakhov Procede d'obtention d'une image d'un objet et son dispositif de mise en ×uvre
US6271534B1 (en) 1994-07-08 2001-08-07 Muradin Abubekirovich Kumakhov Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles
US5604353A (en) * 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5747821A (en) * 1995-08-04 1998-05-05 X-Ray Optical Systems, Inc. Radiation focusing monocapillary with constant inner dimension region and varying inner dimension region
CN1069136C (zh) * 1996-02-17 2001-08-01 北京师范大学 整体x光透镜及其制造方法及使用整体x光透镜的设备
US6586757B2 (en) 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6566667B1 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5991024A (en) * 1997-05-30 1999-11-23 Bauer; Bruno S. Capillary spectrometer
EP1058156A3 (en) * 1999-06-04 2003-06-25 ASML Netherlands B.V. Integrating waveguide for use in lithographic projection apparatus
TW498184B (en) * 1999-06-04 2002-08-11 Asm Lithography Bv Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
RU2164361C1 (ru) 1999-10-18 2001-03-20 Кумахов Мурадин Абубекирович Линза для управления излучением в виде потока нейтральных или заряженных частиц, способ изготовления таких линз и содержащее такие линзы аналитическое устройство, устройство для лучевой терапии и устройства для контактной и проекционной литографии
US6700598B1 (en) * 2000-04-25 2004-03-02 Cortron Corporation Digital imaging system employing non-coherent light source
US7180081B2 (en) 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
RU2206186C2 (ru) 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации
UA59495C2 (uk) * 2000-08-07 2003-09-15 Мурадін Абубєкіровіч Кумахов Рентгенівський вимірювально-випробувальний комплекс
RU2187160C1 (ru) * 2000-12-29 2002-08-10 Кумахов Мурадин Абубекирович Устройство для рентгеновской литографии
US6576912B2 (en) 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
CN1246858C (zh) * 2001-06-19 2006-03-22 X射线光学系统公司 X射线荧光(xrf)光谱测定系统和方法
US6781060B2 (en) 2002-07-26 2004-08-24 X-Ray Optical Systems Incorporated Electrical connector, a cable sleeve, and a method for fabricating an electrical connection
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7006596B1 (en) * 2003-05-09 2006-02-28 Kla-Tencor Technologies Corporation Light element measurement
CN101006541B (zh) * 2003-06-02 2010-07-07 福克斯·彻斯癌症中心 高能多能离子选择系统、离子束治疗系统及离子束治疗中心
US7023955B2 (en) * 2003-08-12 2006-04-04 X-Ray Optical System, Inc. X-ray fluorescence system with apertured mask for analyzing patterned surfaces
US7193228B2 (en) 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US8075732B2 (en) * 2004-11-01 2011-12-13 Cymer, Inc. EUV collector debris management
US7196342B2 (en) 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
WO2007019053A1 (en) * 2005-08-04 2007-02-15 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7742566B2 (en) * 2007-12-07 2010-06-22 General Electric Company Multi-energy imaging system and method using optic devices
US8488743B2 (en) 2008-04-11 2013-07-16 Rigaku Innovative Technologies, Inc. Nanotube based device for guiding X-ray photons and neutrons
CA2720776C (en) * 2008-04-11 2013-07-02 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
US8130908B2 (en) * 2009-02-23 2012-03-06 X-Ray Optical Systems, Inc. X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic
CN102543243B (zh) * 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
WO2013025682A2 (en) 2011-08-15 2013-02-21 X-Ray Optical Systems, Inc. Sample viscosity and flow control for heavy samples, and x-ray analysis applications thereof
US9335280B2 (en) 2011-10-06 2016-05-10 X-Ray Optical Systems, Inc. Mobile transport and shielding apparatus for removable x-ray analyzer
US20140294157A1 (en) 2011-10-26 2014-10-02 X-Ray Optical Systems, Inc. Support structure and highly aligned monochromating x-ray optics for x-ray analysis engines and analyzers
EP2820666A4 (en) * 2012-02-28 2016-02-17 X Ray Optical Sys Inc DEVICE FOR ANALYSIS BY X-RAYS WITH MULTIPLE EXTRACTION ENERGY TAPES, PRODUCED BY X-RAY TUBE ANODES MADE OF SEVERAL MATERIALS AND MONOCHROMATIC OPTICS
US9883793B2 (en) 2013-08-23 2018-02-06 The Schepens Eye Research Institute, Inc. Spatial modeling of visual fields
JP6397690B2 (ja) * 2014-08-11 2018-09-26 株式会社日立ハイテクノロジーズ Ｘ線透過検査装置及び異物検出方法
KR102332578B1 (ko) * 2020-05-08 2021-11-30 주식회사 아이에스피 엑스선 집속광학계를 이용한 가변형 엑스선 발생장치
US20220201830A1 (en) 2020-12-23 2022-06-23 X-Ray Optical Systems, Inc. X-ray source assembly with enhanced temperature control for output stability
US20240035990A1 (en) 2022-07-29 2024-02-01 X-Ray Optical Systems, Inc. Polarized, energy dispersive x-ray fluorescence system and method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0322408B1 (en) * 1986-08-15 1993-05-05 Commonwealth Scientific And Industrial Research Organisation Instrumentation for conditioning x-ray or neutron beams

Also Published As

Publication number Publication date
KR100248283B1 (en) 2000-03-15
US5175755A (en) 1992-12-29
KR930702769A (ko) 1993-09-09
AU9032291A (en) 1992-05-26

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Legal Events

Date Code Title Description
FB19 Grant procedure suspended (art. 19)
FF Decision: intention to grant
FG Letter patent granted
B21A Patent or certificate of addition expired [chapter 21.1 patent gazette]

Free format text: PATENTE EXTINTA EM 31/10/2006