BR9100218A - Mistura sensivel a radiacao,material de registro e processo para sua fabricacao - Google Patents
Mistura sensivel a radiacao,material de registro e processo para sua fabricacaoInfo
- Publication number
- BR9100218A BR9100218A BR919100218A BR9100218A BR9100218A BR 9100218 A BR9100218 A BR 9100218A BR 919100218 A BR919100218 A BR 919100218A BR 9100218 A BR9100218 A BR 9100218A BR 9100218 A BR9100218 A BR 9100218A
- Authority
- BR
- Brazil
- Prior art keywords
- radiation
- manufacturing
- sensitive mixture
- registration material
- registration
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4001465A DE4001465A1 (de) | 1990-01-19 | 1990-01-19 | Strahlungsempfindliches gemisch basierend auf oligomeren malein- und fumarsaeureestern und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9100218A true BR9100218A (pt) | 1991-10-22 |
Family
ID=6398379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR919100218A BR9100218A (pt) | 1990-01-19 | 1991-01-18 | Mistura sensivel a radiacao,material de registro e processo para sua fabricacao |
Country Status (7)
Country | Link |
---|---|
US (1) | US5212049A (pt) |
EP (1) | EP0443153A1 (pt) |
JP (1) | JPH04212158A (pt) |
AU (1) | AU631286B2 (pt) |
BR (1) | BR9100218A (pt) |
CA (1) | CA2034234A1 (pt) |
DE (1) | DE4001465A1 (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4203608A1 (de) * | 1992-02-07 | 1993-08-12 | Basf Lacke & Farben | Verfahren zur photochemischen oder mechanischen herstellung flexibler druckformen |
US5496685A (en) * | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
EP0875022A4 (en) * | 1996-01-12 | 2000-07-12 | Hanna Mining Co | COMPOSITION FOR THE MANUFACTURE OF FLEXOGRAPHIC PRINTING PLATES |
US5851731A (en) * | 1996-09-09 | 1998-12-22 | M. A. Hanna Company | Composition for the manufacture of flexographic printing plates |
US6326127B1 (en) * | 1998-12-31 | 2001-12-04 | Kraton Polymers U.S. Llc | Photo-curable polymer composition and flexographic printing plates containing the same |
ATE445861T1 (de) | 2005-08-26 | 2009-10-15 | Agfa Graphics Nv | Photopolymer druckplattenvorläufer |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5137320B1 (pt) * | 1967-11-09 | 1976-10-14 | ||
JPS53127004A (en) * | 1977-04-11 | 1978-11-06 | Asahi Chemical Ind | Photosensitive elastomer composition |
US4423135A (en) * | 1981-01-28 | 1983-12-27 | E. I. Du Pont De Nemours & Co. | Preparation of photosensitive block copolymer elements |
DE3137416A1 (de) * | 1981-09-19 | 1983-03-31 | Basf Ag, 6700 Ludwigshafen | Fotopolymerisierbare gemische und elemente daraus |
DE3307408A1 (de) * | 1983-03-02 | 1984-09-06 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur radikalischen vernetzung organischer polymerer |
-
1990
- 1990-01-19 DE DE4001465A patent/DE4001465A1/de not_active Withdrawn
- 1990-12-17 EP EP90124404A patent/EP0443153A1/de not_active Withdrawn
-
1991
- 1991-01-15 CA CA002034234A patent/CA2034234A1/en not_active Abandoned
- 1991-01-15 US US07/641,514 patent/US5212049A/en not_active Expired - Fee Related
- 1991-01-18 BR BR919100218A patent/BR9100218A/pt not_active Application Discontinuation
- 1991-01-18 JP JP3018479A patent/JPH04212158A/ja active Pending
- 1991-01-18 AU AU69815/91A patent/AU631286B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
AU631286B2 (en) | 1992-11-19 |
DE4001465A1 (de) | 1991-07-25 |
AU6981591A (en) | 1991-07-25 |
CA2034234A1 (en) | 1991-07-20 |
JPH04212158A (ja) | 1992-08-03 |
US5212049A (en) | 1993-05-18 |
EP0443153A1 (de) | 1991-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD3 | Appl. lapsed due to non-payment of renewal fee |