BR9100218A - Mistura sensivel a radiacao,material de registro e processo para sua fabricacao - Google Patents

Mistura sensivel a radiacao,material de registro e processo para sua fabricacao

Info

Publication number
BR9100218A
BR9100218A BR919100218A BR9100218A BR9100218A BR 9100218 A BR9100218 A BR 9100218A BR 919100218 A BR919100218 A BR 919100218A BR 9100218 A BR9100218 A BR 9100218A BR 9100218 A BR9100218 A BR 9100218A
Authority
BR
Brazil
Prior art keywords
radiation
manufacturing
sensitive mixture
registration material
registration
Prior art date
Application number
BR919100218A
Other languages
English (en)
Inventor
Joachim Gersdorf
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9100218A publication Critical patent/BR9100218A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
BR919100218A 1990-01-19 1991-01-18 Mistura sensivel a radiacao,material de registro e processo para sua fabricacao BR9100218A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4001465A DE4001465A1 (de) 1990-01-19 1990-01-19 Strahlungsempfindliches gemisch basierend auf oligomeren malein- und fumarsaeureestern und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten

Publications (1)

Publication Number Publication Date
BR9100218A true BR9100218A (pt) 1991-10-22

Family

ID=6398379

Family Applications (1)

Application Number Title Priority Date Filing Date
BR919100218A BR9100218A (pt) 1990-01-19 1991-01-18 Mistura sensivel a radiacao,material de registro e processo para sua fabricacao

Country Status (7)

Country Link
US (1) US5212049A (pt)
EP (1) EP0443153A1 (pt)
JP (1) JPH04212158A (pt)
AU (1) AU631286B2 (pt)
BR (1) BR9100218A (pt)
CA (1) CA2034234A1 (pt)
DE (1) DE4001465A1 (pt)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4203608A1 (de) * 1992-02-07 1993-08-12 Basf Lacke & Farben Verfahren zur photochemischen oder mechanischen herstellung flexibler druckformen
US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
EP0875022A4 (en) * 1996-01-12 2000-07-12 Hanna Mining Co COMPOSITION FOR THE MANUFACTURE OF FLEXOGRAPHIC PRINTING PLATES
US5851731A (en) * 1996-09-09 1998-12-22 M. A. Hanna Company Composition for the manufacture of flexographic printing plates
US6326127B1 (en) * 1998-12-31 2001-12-04 Kraton Polymers U.S. Llc Photo-curable polymer composition and flexographic printing plates containing the same
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137320B1 (pt) * 1967-11-09 1976-10-14
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
US4423135A (en) * 1981-01-28 1983-12-27 E. I. Du Pont De Nemours & Co. Preparation of photosensitive block copolymer elements
DE3137416A1 (de) * 1981-09-19 1983-03-31 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
DE3307408A1 (de) * 1983-03-02 1984-09-06 Siemens AG, 1000 Berlin und 8000 München Verfahren zur radikalischen vernetzung organischer polymerer

Also Published As

Publication number Publication date
AU631286B2 (en) 1992-11-19
DE4001465A1 (de) 1991-07-25
AU6981591A (en) 1991-07-25
CA2034234A1 (en) 1991-07-20
JPH04212158A (ja) 1992-08-03
US5212049A (en) 1993-05-18
EP0443153A1 (de) 1991-08-28

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Legal Events

Date Code Title Description
FD3 Appl. lapsed due to non-payment of renewal fee