BR9002921A - Mistura sensivel a luz e material de registro obtido da mesma - Google Patents
Mistura sensivel a luz e material de registro obtido da mesmaInfo
- Publication number
- BR9002921A BR9002921A BR909002921A BR9002921A BR9002921A BR 9002921 A BR9002921 A BR 9002921A BR 909002921 A BR909002921 A BR 909002921A BR 9002921 A BR9002921 A BR 9002921A BR 9002921 A BR9002921 A BR 9002921A
- Authority
- BR
- Brazil
- Prior art keywords
- light
- same
- recording material
- material obtained
- sensitive mixture
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Graft Or Block Polymers (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3920228A DE3920228A1 (de) | 1989-06-21 | 1989-06-21 | Lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9002921A true BR9002921A (pt) | 1991-08-20 |
Family
ID=6383190
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR909002921A BR9002921A (pt) | 1989-06-21 | 1990-06-21 | Mistura sensivel a luz e material de registro obtido da mesma |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0405246B1 (pt) |
| JP (1) | JPH03135565A (pt) |
| KR (1) | KR910001466A (pt) |
| AU (1) | AU5772790A (pt) |
| BR (1) | BR9002921A (pt) |
| CA (1) | CA2019365A1 (pt) |
| DE (2) | DE3920228A1 (pt) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2673621B2 (ja) * | 1991-11-19 | 1997-11-05 | 富士写真フイルム株式会社 | 感光性組成物 |
| US5641594A (en) * | 1993-12-27 | 1997-06-24 | Hoechst Japan Limited | Colored, photosensitive resin composition |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3660097A (en) * | 1969-11-28 | 1972-05-02 | Polychrome Corp | Diazo-polyurethane light-sensitive compositions |
| CA1308595C (en) * | 1985-11-22 | 1992-10-13 | Toshiaki Aoai | Photosensitive composition |
| DE3644162A1 (de) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3824146A1 (de) * | 1988-07-16 | 1990-02-22 | Hoechst Ag | Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten |
-
1989
- 1989-06-21 DE DE3920228A patent/DE3920228A1/de not_active Withdrawn
-
1990
- 1990-06-15 EP EP90111290A patent/EP0405246B1/de not_active Expired - Lifetime
- 1990-06-15 DE DE59006482T patent/DE59006482D1/de not_active Expired - Fee Related
- 1990-06-20 CA CA002019365A patent/CA2019365A1/en not_active Abandoned
- 1990-06-21 BR BR909002921A patent/BR9002921A/pt unknown
- 1990-06-21 JP JP2163948A patent/JPH03135565A/ja active Pending
- 1990-06-21 KR KR1019900009122A patent/KR910001466A/ko not_active Application Discontinuation
- 1990-06-21 AU AU57727/90A patent/AU5772790A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP0405246B1 (de) | 1994-07-20 |
| DE59006482D1 (de) | 1994-08-25 |
| JPH03135565A (ja) | 1991-06-10 |
| CA2019365A1 (en) | 1990-12-21 |
| KR910001466A (ko) | 1991-01-30 |
| AU5772790A (en) | 1991-01-03 |
| DE3920228A1 (de) | 1991-01-10 |
| EP0405246A1 (de) | 1991-01-02 |
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