BR8008428A - Processo de impressao em relevo a partir de liquido e impressao em relevo - Google Patents
Processo de impressao em relevo a partir de liquido e impressao em relevoInfo
- Publication number
- BR8008428A BR8008428A BR8008428A BR8008428A BR8008428A BR 8008428 A BR8008428 A BR 8008428A BR 8008428 A BR8008428 A BR 8008428A BR 8008428 A BR8008428 A BR 8008428A BR 8008428 A BR8008428 A BR 8008428A
- Authority
- BR
- Brazil
- Prior art keywords
- relief printing
- liquid
- printing process
- relief
- printing
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0505—Double exposure of the same photosensitive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/106,816 US4291118A (en) | 1979-12-26 | 1979-12-26 | Relief imaging liquids |
Publications (1)
Publication Number | Publication Date |
---|---|
BR8008428A true BR8008428A (pt) | 1981-07-14 |
Family
ID=22313427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR8008428A BR8008428A (pt) | 1979-12-26 | 1980-12-22 | Processo de impressao em relevo a partir de liquido e impressao em relevo |
Country Status (4)
Country | Link |
---|---|
US (1) | US4291118A (pt) |
JP (1) | JPS5699339A (pt) |
AU (1) | AU536605B2 (pt) |
BR (1) | BR8008428A (pt) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4560639A (en) * | 1980-05-08 | 1985-12-24 | Sullivan Donald F | Reusable phototransparency image forming tools for direct contact printing |
US4413052A (en) * | 1981-02-04 | 1983-11-01 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl group and anthryl group |
US4416975A (en) * | 1981-02-04 | 1983-11-22 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl groups and maleimide groups |
US4440850A (en) * | 1981-07-23 | 1984-04-03 | Ciba-Geigy Corporation | Photopolymerisation process with two exposures of a single layer |
US4971895A (en) * | 1981-10-20 | 1990-11-20 | Sullivan Donald F | Double exposure method of photoprinting with liquid photopolymers |
US4657839A (en) * | 1981-10-21 | 1987-04-14 | Sullivan Donald F | Photoprinting process and apparatus for exposing paste-consistency photopolymers |
US4752553A (en) * | 1982-04-01 | 1988-06-21 | M&T Chemicals Inc. | High resolution solder mask photopolymers for screen coating over circuit traces |
US4500629A (en) * | 1982-04-08 | 1985-02-19 | Ciba-Geigy Corporation | Method of forming images from liquid masses |
US4546067A (en) * | 1983-01-26 | 1985-10-08 | Ciba Geigy Corporation | Image production utilizing multifunctional light sensitive compounds |
GB8307220D0 (en) * | 1983-03-16 | 1983-04-20 | Ciba Geigy Ag | Production of images |
US4528261A (en) * | 1983-03-28 | 1985-07-09 | E. I. Du Pont De Nemours And Company | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards |
US4572890A (en) * | 1983-05-11 | 1986-02-25 | Ciba-Geigy Corporation | Process for the production of images |
GB8333853D0 (en) * | 1983-12-20 | 1984-02-01 | Ciba Geigy Ag | Production of images |
GB8402937D0 (en) * | 1984-02-03 | 1984-03-07 | Ciba Geigy Ag | Production of images |
EP0168636A3 (en) * | 1984-06-18 | 1988-01-13 | Fuji Photo Film Co., Ltd. | Method for making multilayer coating |
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
US5194365A (en) * | 1985-06-19 | 1993-03-16 | Ciba-Geigy Corporation | Method for forming images |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
US4931380A (en) * | 1985-07-18 | 1990-06-05 | Microsi, Inc. | Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist |
JPS63500837A (ja) * | 1985-08-08 | 1988-03-24 | マツクダ−ミツド インコ−ポレ−テツド | プリント回路基板の製造方法 |
US4804615A (en) * | 1985-08-08 | 1989-02-14 | Macdermid, Incorporated | Method for manufacture of printed circuit boards |
CH678897A5 (pt) * | 1986-05-10 | 1991-11-15 | Ciba Geigy Ag | |
US4857437A (en) * | 1986-12-17 | 1989-08-15 | Ciba-Geigy Corporation | Process for the formation of an image |
GB8715435D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Forming images |
JPH01236207A (ja) * | 1987-07-24 | 1989-09-21 | Nippon Steel Corp | ポリジアセチレン薄膜の製造法 |
DE3734767A1 (de) * | 1987-10-14 | 1989-04-27 | Du Pont Deutschland | Verfahren zum betrieb eines belichtungsgeraets und belichtungsgeraet zur durchfuehrung dieses verfahrens |
US5278027A (en) * | 1989-03-08 | 1994-01-11 | R. R. Donnelley | Method and apparatus for making print imaging media |
US7754404B2 (en) * | 2005-12-27 | 2010-07-13 | Xerox Corporation | Imaging member |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE611541A (pt) * | 1961-01-13 | |||
US3661744A (en) * | 1966-07-26 | 1972-05-09 | Grace W R & Co | Photocurable liquid polyene-polythiol polymer compositions |
US3600243A (en) * | 1966-11-09 | 1971-08-17 | Us Army | Method of making chromium mask for photoresist application |
US3520606A (en) * | 1967-10-12 | 1970-07-14 | Grace W R & Co | Apparatus for preparing a printing plate from a photosensitive composition |
US3661660A (en) * | 1968-02-21 | 1972-05-09 | Grace W R & Co | Method for ultrasonic etching of polymeric printing plates |
US3859091A (en) * | 1971-09-08 | 1975-01-07 | Grace W R & Co | Preparation of printing or pattern plates |
JPS5039126A (pt) * | 1973-08-10 | 1975-04-11 | ||
US3936301A (en) * | 1974-04-01 | 1976-02-03 | Bell Telephone Laboratories, Incorporated | Process for contact photolithography utilizing a photomask having indented channels |
US4145790A (en) * | 1975-06-25 | 1979-03-27 | W. R. Grace & Co. | Air etching of polymeric printing plates |
JPS5211028A (en) * | 1975-07-16 | 1977-01-27 | Fuji Toryo Kogyosho:Kk | Method for forming stereographic image with photopoly-merizable resin |
-
1979
- 1979-12-26 US US06/106,816 patent/US4291118A/en not_active Expired - Lifetime
-
1980
- 1980-11-11 AU AU64280/80A patent/AU536605B2/en not_active Ceased
- 1980-12-22 BR BR8008428A patent/BR8008428A/pt unknown
- 1980-12-23 JP JP18142980A patent/JPS5699339A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
AU6428080A (en) | 1981-07-02 |
JPS5699339A (en) | 1981-08-10 |
AU536605B2 (en) | 1984-05-17 |
US4291118A (en) | 1981-09-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B15K | Others concerning applications: alteration of classification |
Ipc: H05K 3/00 (2006.01), G03F 7/20 (2006.0 |