BR112022014518A2 - Partículas absorventes de onda eletromagnética, líquido de dispersão de partícula absorvente de onda eletromagnética e método para fabricação de partículas absorventes de onda eletromagnética - Google Patents

Partículas absorventes de onda eletromagnética, líquido de dispersão de partícula absorvente de onda eletromagnética e método para fabricação de partículas absorventes de onda eletromagnética

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Publication number
BR112022014518A2
BR112022014518A2 BR112022014518A BR112022014518A BR112022014518A2 BR 112022014518 A2 BR112022014518 A2 BR 112022014518A2 BR 112022014518 A BR112022014518 A BR 112022014518A BR 112022014518 A BR112022014518 A BR 112022014518A BR 112022014518 A2 BR112022014518 A2 BR 112022014518A2
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BR
Brazil
Prior art keywords
electromagnetic wave
wave absorbing
absorbing particles
dispersion liquid
particle dispersion
Prior art date
Application number
BR112022014518A
Other languages
English (en)
Inventor
Adachi Kenji
Yoshio Satoshi
Wakabayashi Masao
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Sumitomo Metal Mining Co
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Publication date
Application filed by Sumitomo Metal Mining Co filed Critical Sumitomo Metal Mining Co
Publication of BR112022014518A2 publication Critical patent/BR112022014518A2/pt

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
    • C09D17/007—Metal oxide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00—Compounds of tungsten
    • C01G41/006—Compounds containing, besides tungsten, two or more other elements, with the exception of oxygen or hydrogen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00—Compounds of tungsten
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/06—Treatment with inorganic compounds
    • C09C3/063—Coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00—Pigment pastes, e.g. for mixing in paints
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/206—Filters comprising particles embedded in a solid matrix
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/50—Solid solutions
    • C01P2002/52—Solid solutions containing elements as dopants
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/76—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by a space-group or by other symmetry indications
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    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/77—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by unit-cell parameters, atom positions or structure diagrams
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
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    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/38—Particle morphology extending in three dimensions cube-like
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    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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    • C01P2004/40—Particle morphology extending in three dimensions prism-like
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    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/62—L* (lightness axis)
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/63—Optical properties, e.g. expressed in CIELAB-values a* (red-green axis)
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C01P2006/64—Optical properties, e.g. expressed in CIELAB-values b* (yellow-blue axis)

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Compounds Of Iron (AREA)

Abstract

PARTÍCULAS ABSORVENTES DE ONDA ELETROMAGNÉTICA, LÍQUIDO DE DISPERSÃO DE PARTÍCULA ABSORVENTE DE ONDA ELETROMAGNÉTICA E MÉTODO PARA FABRICAÇÃO DE PARTÍCULAS ABSORVENTES DE ONDA ELETROMAGNÉTICA. Partículas absorventes de ondas eletromagnéticas, incluindo óxido de césio e tungstênio representado por uma fórmula geral CsxW1-yO3-z (0,2 = x = 0,4, 0 < y = 0,4 e 0 < z = 0,46) e tendo uma estrutura de cristal ortorrômbico ou uma estrutura de cristal hexagonal são fornecidos.
BR112022014518A 2020-01-31 2021-01-28 Partículas absorventes de onda eletromagnética, líquido de dispersão de partícula absorvente de onda eletromagnética e método para fabricação de partículas absorventes de onda eletromagnética BR112022014518A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020015756 2020-01-31
PCT/JP2021/003098 WO2021153692A1 (ja) 2020-01-31 2021-01-28 電磁波吸収粒子、電磁波吸収粒子分散液、電磁波吸収粒子の製造方法

Publications (1)

Publication Number Publication Date
BR112022014518A2 true BR112022014518A2 (pt) 2022-09-20

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BR112022014518A BR112022014518A2 (pt) 2020-01-31 2021-01-28 Partículas absorventes de onda eletromagnética, líquido de dispersão de partícula absorvente de onda eletromagnética e método para fabricação de partículas absorventes de onda eletromagnética

Country Status (7)

Country Link
US (1) US20230052771A1 (pt)
EP (1) EP4098619A4 (pt)
JP (1) JPWO2021153692A1 (pt)
KR (1) KR20220134518A (pt)
CN (1) CN115003631B (pt)
BR (1) BR112022014518A2 (pt)
WO (1) WO2021153692A1 (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4098620B1 (en) * 2020-01-31 2024-08-07 Sumitomo Metal Mining Co., Ltd. Electromagnetic wave absorbing particle dispersion, electromagnetic wave absorbing laminate, and electromagnetic wave absorbing transparent substrate
JPWO2022080420A1 (pt) * 2020-10-14 2022-04-21
EP4289789A1 (en) * 2021-02-02 2023-12-13 Sumitomo Metal Mining Co., Ltd. Electromagnetic wave absorbing particles, electromagnetic wave absorbing particle disperse solution, electromagnetic wave absorbing particle dispersion, and electromagnetic wave absorbing laminate

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6184537A (ja) * 1984-10-02 1986-04-30 Yokogawa Hokushin Electric Corp 容量式センサの製造方法
JPH09107815A (ja) 1995-10-16 1997-04-28 Kanebo Ltd 保温用シート
JP5220973B2 (ja) 2001-07-17 2013-06-26 ソマール株式会社 遮光フィルム
BRPI0407265B1 (pt) 2003-10-20 2018-01-09 Sumitomo Metal Mining Co., Ltd. Dispersão de partículas finas de material de proteção contra infravermelho
KR20110136274A (ko) * 2010-06-14 2011-12-21 (주) 씨에프씨테라메이트 광변색 특성과 근적외선 흡수특성을 동시에 가지는 무기화합물 및 그 제조방법
US9434652B2 (en) * 2013-07-23 2016-09-06 Industrial Technology Research Institute Infrared absorption material, method for fabricating the same, and thermal isolation structure employing the same
TWI607971B (zh) * 2014-10-14 2017-12-11 台虹科技股份有限公司 紅外線吸收粉末的製作方法
JPWO2016075960A1 (ja) 2014-11-12 2017-08-17 株式会社 沖縄リサーチセンター 排尿障害を予防又は改善させる医薬組成物、排尿障害関連受容体に関する拮抗剤又はその医薬組成物又は拮抗剤を用いた排尿障害を予防又は改善させる方法
AU2017232748B2 (en) * 2016-03-16 2021-08-19 Sumitomo Metal Mining Co., Ltd. Near-infrared shielding material fine particle dispersion body, near-infrared shielding body and near-infrared shielding laminated structure, and method for producing the same
BR112018068660B1 (pt) * 2016-03-16 2023-02-23 Sumitomo Metal Mining Co., Ltd Partículas finas de material de proteção próxima do infravermelho, líquido de dispersão de partícula fina de material de proteção próxima do infravermelho, e, métodos para produzir partículas finas de material de proteção próxima do infravermelho e líquido de dispersão de partícula fina de material de proteção próxima do infravermelho
CN106978005A (zh) * 2017-03-03 2017-07-25 厦门纳诺泰克科技有限公司 一种含钨金属氧化物纳米颗粒及其制备方法
US11369048B2 (en) * 2017-08-09 2022-06-21 Sumitomo Metal Mining Co., Ltd. Electromagnetic-wave-absorbing particles, electromagnetic-wave-absorbing particle dispersion liquids, and manufacturing methods of electromagnetic-wave-absorbing particles

Also Published As

Publication number Publication date
EP4098619A1 (en) 2022-12-07
WO2021153692A1 (ja) 2021-08-05
US20230052771A1 (en) 2023-02-16
JPWO2021153692A1 (pt) 2021-08-05
EP4098619A4 (en) 2023-08-09
CN115003631A (zh) 2022-09-02
CN115003631B (zh) 2024-06-14
KR20220134518A (ko) 2022-10-05

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