BR112014032186A2 - dispositivo de aspersão de líquido - Google Patents

dispositivo de aspersão de líquido

Info

Publication number
BR112014032186A2
BR112014032186A2 BR112014032186A BR112014032186A BR112014032186A2 BR 112014032186 A2 BR112014032186 A2 BR 112014032186A2 BR 112014032186 A BR112014032186 A BR 112014032186A BR 112014032186 A BR112014032186 A BR 112014032186A BR 112014032186 A2 BR112014032186 A2 BR 112014032186A2
Authority
BR
Brazil
Prior art keywords
discharge outlet
base
supply
spray
supply channel
Prior art date
Application number
BR112014032186A
Other languages
English (en)
Inventor
Kanno Minoru
Original Assignee
Kanno Minoru
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanno Minoru filed Critical Kanno Minoru
Publication of BR112014032186A2 publication Critical patent/BR112014032186A2/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/06—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane
    • B05B7/061—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with several liquid outlets discharging one or several liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0876—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form parallel jets constituted by a liquid or a mixture containing a liquid
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C02F2001/46185—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water only anodic or acidic water, e.g. for oxidizing or sterilizing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C02F2001/4619—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water only cathodic or alkaline water, e.g. for reducing

Abstract

resumo “dispositivo de aspersão de líquido” uma base (26) tem uma saída de descarga (30) para descarregar água ácida. a base (26) tem um primeiro canal de alimentação (28) que se comunica com a saída de descarga (30) de modo a permitir a alimentação de água ácida e um segundo canal de alimentação (29) que se comunica com uma pluralidade de orifícios de aspersão (34) de modo a permitir a alimentação de água alcalina. o segundo canal de alimentação (29) é aberto de forma que a extremidade frontal do mesmo continue inteiramente em torno da face lateral da base (26). a seção giratória (27) é fornecida de forma giratória ao longo da superfície lateral da base (26). a seção giratória (27) tem uma pluralidade de orifícios de aspersão (34) dispostos de modo a circundar a circunferência da saída de descarga (30). a seção giratória (27) tem uma pluralidade de canais de comunicação (33) que se comunicam com os orifícios de aspersão (34) e o segundo canal de alimentação (29). os orifícios de aspersão (34) aspergem água alcalina enquanto giram em torno da saída de descarga (30) de modo que uma cortina de água alcalina circunde a água ácida descarregada pela saída de descarga (30). 1/1
BR112014032186A 2012-11-14 2013-09-05 dispositivo de aspersão de líquido BR112014032186A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012249840 2012-11-14
PCT/JP2013/073896 WO2014077020A1 (ja) 2012-11-14 2013-09-05 液体噴射装置

Publications (1)

Publication Number Publication Date
BR112014032186A2 true BR112014032186A2 (pt) 2017-08-01

Family

ID=50730943

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014032186A BR112014032186A2 (pt) 2012-11-14 2013-09-05 dispositivo de aspersão de líquido

Country Status (13)

Country Link
US (1) US9694395B2 (pt)
EP (1) EP2848317A4 (pt)
JP (1) JP5717078B2 (pt)
KR (1) KR20150083972A (pt)
CN (1) CN104428068A (pt)
AU (1) AU2013346186A1 (pt)
BR (1) BR112014032186A2 (pt)
HK (1) HK1202836A1 (pt)
IN (1) IN2014MN02542A (pt)
NZ (1) NZ702868A (pt)
PH (1) PH12015500112A1 (pt)
SG (1) SG11201500699PA (pt)
WO (1) WO2014077020A1 (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105197485A (zh) * 2015-10-29 2015-12-30 李锡建 一种垃圾桶
CN110152516B (zh) * 2019-05-30 2021-11-12 河海大学 一种液-液双连续制备装置
CN111250456B (zh) * 2020-01-16 2021-07-23 秦皇岛明远瑞邦节能科技有限公司 一种应用于电解水处理机组内部的喷淋冲刷装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2378571A1 (fr) 1977-01-28 1978-08-25 Biro Fils Lance-canon pour la lutte contre l'incendie
JPH01284359A (ja) * 1988-05-10 1989-11-15 Koichi Kawamura つづみ形噴水装置
IT1264809B1 (it) * 1993-07-27 1996-10-10 Giovanni Porta Bocchettone idraulico in specie per doccia, con spruzzatore comprendente una camera di miscelazione per pastiglie di prodotti da
US6148536A (en) * 1996-06-10 2000-11-21 Nippon Telegraph And Telephone Corporation Two-fluid nozzle and device employing the same nozzle for freezing and drying liquid containing biological substances
JP4215450B2 (ja) 2002-04-26 2009-01-28 メタウォーター株式会社 オゾン水噴霧ノズル装置
JP4015922B2 (ja) * 2002-10-25 2007-11-28 本田技研工業株式会社 二液混合塗装装置
EP1657020A1 (de) * 2004-11-10 2006-05-17 Synova S.A. Verfahren und Vorrichtung zur Optimierung der Kohärenz eines Flüssigkeitsstrahls für eine Materialbearbeitung und Flüssigkeitsdüse für eine solche Vorrichtung
JP4348405B1 (ja) * 2009-03-05 2009-10-21 稔 菅野 洗浄装置および洗浄水の消臭方法
DE102010014580A1 (de) 2010-04-09 2011-10-13 Dieter Wurz Mehrstoffdüse mit Primärgaskernstrahl
JP5553261B2 (ja) * 2010-04-28 2014-07-16 株式会社大気社 塗装ガン、及び、その塗装ガンを用いた塗装方法
US8590814B2 (en) * 2010-06-28 2013-11-26 Briggs & Stratton Corporation Nozzle for a pressure washer
JP2012077918A (ja) * 2010-09-30 2012-04-19 Daikin Industries Ltd 給湯システム
JPWO2014017511A1 (ja) * 2012-07-27 2016-07-11 株式会社パウダリングジャパン 流体微粒化装置及び流体微粒化方法
US9393579B2 (en) * 2012-10-03 2016-07-19 The Boeing Company Cleaning apparatus and method of cleaning a contaminated surface

Also Published As

Publication number Publication date
IN2014MN02542A (pt) 2015-07-24
SG11201500699PA (en) 2015-03-30
PH12015500112B1 (en) 2015-03-16
US9694395B2 (en) 2017-07-04
NZ702868A (en) 2016-12-23
HK1202836A1 (en) 2015-10-09
JPWO2014077020A1 (ja) 2017-01-05
JP5717078B2 (ja) 2015-05-13
EP2848317A4 (en) 2015-11-11
EP2848317A1 (en) 2015-03-18
US20150165486A1 (en) 2015-06-18
WO2014077020A1 (ja) 2014-05-22
KR20150083972A (ko) 2015-07-21
CN104428068A (zh) 2015-03-18
PH12015500112A1 (en) 2015-03-16
AU2013346186A1 (en) 2015-01-22

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]
B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2478 DE 03-07-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.