BR0315692A - Processo e dispositivo para depositar um revestimento - Google Patents
Processo e dispositivo para depositar um revestimentoInfo
- Publication number
- BR0315692A BR0315692A BR0315692-3A BR0315692A BR0315692A BR 0315692 A BR0315692 A BR 0315692A BR 0315692 A BR0315692 A BR 0315692A BR 0315692 A BR0315692 A BR 0315692A
- Authority
- BR
- Brazil
- Prior art keywords
- cavity
- coating
- electromagnetic waves
- coupling mode
- fields
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32366—Localised processing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Plasma Technology (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
"PROCESSO E DISPOSITIVO PARA DEPOSITAR UM REVESTIMENTO". A presente invenção trata do depósito de um revestimento sobre uma face de um recipiente (3) de material termoplástico por meio de um plasma de baixa pressão por excitação de um gás precursor por ondas eletromagnéticas de UHF em uma cavidade (1) sob vácuo de forma circular que recebe o recipiente. A cavidade (1) está dimensionada em relação com a freq³ência das ondas eletromagnéticas de UHF de modo a obter um modo de acoplamento que gere vários campos eletromagnéticos no interior da cavidade. Em particular, estabelece-se um modo de acoplamento TM 120 que gera dois campos centrais (4A, 4B) no interior da cavidade, o que permite tratar simultaneamente dois recipientes (3) na referida cavidade (1).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0214961A FR2847912B1 (fr) | 2002-11-28 | 2002-11-28 | Procede et dispositif pour deposer par plasma micro-ondes un revetement sur une face d'un recipient en materiau thermoplastique |
PCT/FR2003/003485 WO2004052060A1 (fr) | 2002-11-28 | 2003-11-25 | Procede et dispositif pour deposer par plasma micro-ondes un revetement sur une face d'un recipient en materiau thermoplastique |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0315692A true BR0315692A (pt) | 2005-09-06 |
Family
ID=32309790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0315692-3A BR0315692A (pt) | 2002-11-28 | 2003-11-25 | Processo e dispositivo para depositar um revestimento |
Country Status (14)
Country | Link |
---|---|
US (2) | US7678430B2 (pt) |
EP (1) | EP1566081B1 (pt) |
JP (1) | JP2006508247A (pt) |
KR (1) | KR20050085174A (pt) |
CN (1) | CN100334924C (pt) |
AT (1) | ATE371359T1 (pt) |
AU (1) | AU2003294085A1 (pt) |
BR (1) | BR0315692A (pt) |
CA (1) | CA2507319C (pt) |
DE (1) | DE60315871T2 (pt) |
ES (1) | ES2293076T3 (pt) |
FR (1) | FR2847912B1 (pt) |
PT (1) | PT1566081E (pt) |
WO (1) | WO2004052060A1 (pt) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2871813B1 (fr) * | 2004-06-17 | 2006-09-29 | Sidel Sas | Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique |
FR2872555B1 (fr) * | 2004-06-30 | 2006-10-06 | Sidel Sas | Circuit de pompage a vide et machine de traitement de recipients equipee de ce circuit |
FR2892425B1 (fr) * | 2005-10-24 | 2008-01-04 | Sidel Sas | Appareil refroidi pour le depot par plasma d'une couche barriere sur un recipient. |
FR2902027B1 (fr) | 2006-06-08 | 2008-12-05 | Sidel Participations | Machine de traitement de recipients par plasma, comprenant un circuit de vide embarque |
FR2907036B1 (fr) | 2006-10-11 | 2008-12-26 | Sidel Participations | Installation de depot, au moyen d'un plasma micro-ondes, d'un revetement barriere interne dans des recipients thermoplastiques |
FR2908009B1 (fr) | 2006-10-25 | 2009-02-20 | Sidel Participations | Procede et dispositif de regulation d'alimentation electrique d'un magnetron, et installation de traitement de recipients thermoplastiques qui en fait application |
DE102007045141A1 (de) * | 2007-09-20 | 2009-04-02 | Krones Ag | Plasmabehandlungsanlage |
US20120128896A1 (en) * | 2010-11-19 | 2012-05-24 | Tucker Edward B | Stain-resistant container and method |
US10081864B2 (en) | 2011-03-10 | 2018-09-25 | Kaiatech, Inc | Method and apparatus for treating containers |
FR3032975B1 (fr) * | 2015-02-23 | 2017-03-10 | Sidel Participations | Procede de traitement par plasma de recipients, comprenant une phase d'imagerie thermique |
DE102019128739A1 (de) * | 2019-10-24 | 2021-04-29 | Krones Ag | Behälterbehandlungsanlage und Verfahren zum Behandeln von Behältern |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2523505A2 (fr) * | 1982-03-17 | 1983-09-23 | Medicornea Sa | Procede perfectionne pour la fabrication, par moulage, de lentilles de contact et dispositif de mise en oeuvre |
US4866346A (en) * | 1987-06-22 | 1989-09-12 | Applied Science & Technology, Inc. | Microwave plasma generator |
JP2784784B2 (ja) * | 1989-02-13 | 1998-08-06 | キヤノン株式会社 | マイクロ波プラズマcvd法による機能性堆積膜の形成方法及び形成装置 |
US5707486A (en) * | 1990-07-31 | 1998-01-13 | Applied Materials, Inc. | Plasma reactor using UHF/VHF and RF triode source, and process |
JP2550858Y2 (ja) * | 1991-10-09 | 1997-10-15 | 石川島播磨重工業株式会社 | 薄膜形成装置 |
US5311103A (en) * | 1992-06-01 | 1994-05-10 | Board Of Trustees Operating Michigan State University | Apparatus for the coating of material on a substrate using a microwave or UHF plasma |
EP0705149B1 (de) * | 1993-06-01 | 1998-06-03 | Kautex Textron GmbH & Co. KG. | Verfahren zum herstellen einer polymeren beschichtung an kunststoff-hohlkörpern |
ES2131810T5 (es) * | 1994-02-16 | 2004-02-16 | The Coca-Cola Company | Recipientes huecos con superficies interiores inertes o impermeables producidas por reaccion superficial asistida por plasma o polimerizacion sobre la superficie. |
DE19503718A1 (de) * | 1995-02-04 | 1996-08-08 | Leybold Ag | UV-Strahler |
US6131533A (en) * | 1996-08-15 | 2000-10-17 | Citizen Watch Co., Ltd. | Jig for forming hard carbon film over inner surface of guide bush using the jig |
US6152070A (en) * | 1996-11-18 | 2000-11-28 | Applied Materials, Inc. | Tandem process chamber |
US5834744A (en) * | 1997-09-08 | 1998-11-10 | The Rubbright Group | Tubular microwave applicator |
RU2199792C2 (ru) * | 1997-09-30 | 2003-02-27 | Тетра Лаваль Холдинг Энд Финанс С.А. | Способ и устройство для плазменной обработки внутренней поверхности пластиковых бутылок |
US6057645A (en) * | 1997-12-31 | 2000-05-02 | Eaton Corporation | Plasma discharge device with dynamic tuning by a movable microwave trap |
FR2776540B1 (fr) * | 1998-03-27 | 2000-06-02 | Sidel Sa | Recipient en matiere a effet barriere et procede et appareil pour sa fabrication |
WO2000004746A1 (en) * | 1998-07-16 | 2000-01-27 | The Board Of Regents, The University Of Texas System | Method and apparatus for rapid drying of coated materials with close capture of vapors |
FR2792854B1 (fr) * | 1999-04-29 | 2001-08-03 | Sidel Sa | Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique |
FR2799994B1 (fr) * | 1999-10-25 | 2002-06-07 | Sidel Sa | Dispositif pour le traitement d'un recipient a l'aide d'un plasma a basse pression comportant un circuit de vide perfectionne |
DE19963122A1 (de) * | 1999-12-24 | 2001-06-28 | Tetra Laval Holdings & Finance | Anordnung zum Einkoppeln von Mikrowellenenergie in eine Behandlungskammer |
AU2003245890A1 (en) * | 2002-05-24 | 2003-12-12 | Schott Ag | Multistation coating device and method for plasma coating |
-
2002
- 2002-11-28 FR FR0214961A patent/FR2847912B1/fr not_active Expired - Fee Related
-
2003
- 2003-11-25 JP JP2004556425A patent/JP2006508247A/ja active Pending
- 2003-11-25 AU AU2003294085A patent/AU2003294085A1/en not_active Abandoned
- 2003-11-25 EP EP03789500A patent/EP1566081B1/fr not_active Expired - Lifetime
- 2003-11-25 CA CA002507319A patent/CA2507319C/fr not_active Expired - Fee Related
- 2003-11-25 KR KR1020057009570A patent/KR20050085174A/ko not_active Application Discontinuation
- 2003-11-25 WO PCT/FR2003/003485 patent/WO2004052060A1/fr active IP Right Grant
- 2003-11-25 ES ES03789500T patent/ES2293076T3/es not_active Expired - Lifetime
- 2003-11-25 BR BR0315692-3A patent/BR0315692A/pt not_active IP Right Cessation
- 2003-11-25 CN CNB2003801044007A patent/CN100334924C/zh not_active Expired - Fee Related
- 2003-11-25 US US10/536,902 patent/US7678430B2/en not_active Expired - Fee Related
- 2003-11-25 PT PT03789500T patent/PT1566081E/pt unknown
- 2003-11-25 AT AT03789500T patent/ATE371359T1/de not_active IP Right Cessation
- 2003-11-25 DE DE60315871T patent/DE60315871T2/de not_active Expired - Lifetime
-
2009
- 2009-05-19 US US12/468,660 patent/US20090229521A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN100334924C (zh) | 2007-08-29 |
WO2004052060A1 (fr) | 2004-06-17 |
EP1566081B1 (fr) | 2007-08-22 |
US20090229521A1 (en) | 2009-09-17 |
EP1566081A1 (fr) | 2005-08-24 |
PT1566081E (pt) | 2007-11-27 |
DE60315871T2 (de) | 2008-05-15 |
CN1717961A (zh) | 2006-01-04 |
CA2507319A1 (fr) | 2004-06-17 |
FR2847912B1 (fr) | 2005-02-18 |
AU2003294085A1 (en) | 2004-06-23 |
US20060062931A1 (en) | 2006-03-23 |
CA2507319C (fr) | 2009-12-29 |
US7678430B2 (en) | 2010-03-16 |
ES2293076T3 (es) | 2008-03-16 |
DE60315871D1 (de) | 2007-10-04 |
ATE371359T1 (de) | 2007-09-15 |
KR20050085174A (ko) | 2005-08-29 |
FR2847912A1 (fr) | 2004-06-04 |
JP2006508247A (ja) | 2006-03-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08L | Patent application lapsed because of non payment of annual fee [chapter 8.12 patent gazette] |
Free format text: REFERENTE AO NAO RECOLHIMENTO DAS 9A E 10A ANUIDADES. |
|
B08I | Publication cancelled [chapter 8.9 patent gazette] |
Free format text: ANULADA A PUBLICACAO CODIGO 8.12 NA RPI NO 2257 DE 08/04/2014 POR TER SIDO INDEVIDA. |
|
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE AS 9A, 10A, 11A, 12A, 13A, 14A, 15A E 16A ANUIDADES. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2602 DE 17-11-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |