BE879052A - Energie-overdrachtsnetwerk - Google Patents
Energie-overdrachtsnetwerkInfo
- Publication number
- BE879052A BE879052A BE2/58102A BE2058102A BE879052A BE 879052 A BE879052 A BE 879052A BE 2/58102 A BE2/58102 A BE 2/58102A BE 2058102 A BE2058102 A BE 2058102A BE 879052 A BE879052 A BE 879052A
- Authority
- BE
- Belgium
- Prior art keywords
- energy transfer
- transfer network
- network
- energy
- transfer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3444—Associated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P5/00—Coupling devices of the waveguide type
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/945,805 US4284489A (en) | 1978-09-28 | 1978-09-28 | Power transfer network |
Publications (1)
Publication Number | Publication Date |
---|---|
BE879052A true BE879052A (nl) | 1980-03-28 |
Family
ID=25483576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE2/58102A BE879052A (nl) | 1978-09-28 | 1979-09-28 | Energie-overdrachtsnetwerk |
Country Status (2)
Country | Link |
---|---|
US (1) | US4284489A (nl) |
BE (1) | BE879052A (nl) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4368092A (en) * | 1981-04-02 | 1983-01-11 | The Perkin-Elmer Corporation | Apparatus for the etching for semiconductor devices |
US4494043A (en) * | 1981-07-02 | 1985-01-15 | Physics International Company | Imploding plasma device |
US4584079A (en) * | 1983-10-11 | 1986-04-22 | Honeywell Inc. | Step shape tailoring by phase angle variation RF bias sputtering |
US4557819A (en) * | 1984-07-20 | 1985-12-10 | Varian Associates, Inc. | System for igniting and controlling a wafer processing plasma |
US4610775A (en) * | 1985-07-26 | 1986-09-09 | Westinghouse Electric Corp. | Method and apparatus for clearing short-circuited, high-voltage cathodes in a sputtering chamber |
US4802080A (en) * | 1988-03-18 | 1989-01-31 | American Telephone And Telegraph Company, At&T Information Systems | Power transfer circuit including a sympathetic resonator |
US5141651A (en) * | 1989-06-12 | 1992-08-25 | University Of Utah | Pinched channel inlet system for reduced relaxation effects and stopless flow injection in field-flow fractionation |
US6098568A (en) * | 1997-12-01 | 2000-08-08 | Applied Materials, Inc. | Mixed frequency CVD apparatus |
US7004107B1 (en) * | 1997-12-01 | 2006-02-28 | Applied Materials Inc. | Method and apparatus for monitoring and adjusting chamber impedance |
US6136388A (en) * | 1997-12-01 | 2000-10-24 | Applied Materials, Inc. | Substrate processing chamber with tunable impedance |
CN110800376B (zh) | 2017-06-27 | 2022-04-01 | 佳能安内华股份有限公司 | 等离子体处理装置 |
KR20220031132A (ko) | 2017-06-27 | 2022-03-11 | 캐논 아네르바 가부시키가이샤 | 플라스마 처리 장치 |
SG11201912567RA (en) * | 2017-06-27 | 2020-01-30 | Canon Anelva Corp | Plasma processing apparatus |
KR102257134B1 (ko) * | 2017-06-27 | 2021-05-26 | 캐논 아네르바 가부시키가이샤 | 플라스마 처리 장치 |
SG11202009122YA (en) * | 2018-06-26 | 2020-10-29 | Canon Anelva Corp | Plasma processing apparatus, plasma processing method, program, and memory medium |
IL281747B2 (en) * | 2021-03-22 | 2024-04-01 | N T Tao Ltd | System and method for creating plasma with high efficiency |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL143199B (nl) * | 1947-11-29 | Mizusawa Industrial Chem | Werkwijze voor het bereiden van fosforzuur uit ruw fosfaat. | |
US2756393A (en) * | 1952-10-03 | 1956-07-24 | Philco Corp | Constant bandwidth coupling system |
US3436333A (en) * | 1966-08-23 | 1969-04-01 | Lab For Electronics Inc | Impedance matching network for gas reaction apparatus |
US3569777A (en) * | 1969-07-28 | 1971-03-09 | Int Plasma Corp | Impedance matching network for plasma-generating apparatus |
US3704219A (en) * | 1971-04-07 | 1972-11-28 | Mcdowell Electronics Inc | Impedance matching network for use with sputtering apparatus |
US3803019A (en) * | 1971-10-07 | 1974-04-09 | Hewlett Packard Co | Sputtering system |
US3767551A (en) * | 1971-11-01 | 1973-10-23 | Varian Associates | Radio frequency sputter apparatus and method |
US3849283A (en) * | 1972-05-01 | 1974-11-19 | Era Patents Ltd | Sputtering apparatus |
US3892650A (en) * | 1972-12-29 | 1975-07-01 | Ibm | Chemical sputtering purification process |
-
1978
- 1978-09-28 US US05/945,805 patent/US4284489A/en not_active Expired - Lifetime
-
1979
- 1979-09-28 BE BE2/58102A patent/BE879052A/nl unknown
Also Published As
Publication number | Publication date |
---|---|
US4284489A (en) | 1981-08-18 |
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