BE861311A - PLASMATIC ATTACK PROCESS, ESPECIALLY FOR THE MANUFACTURE OF SEMICONDUCTORS - Google Patents

PLASMATIC ATTACK PROCESS, ESPECIALLY FOR THE MANUFACTURE OF SEMICONDUCTORS

Info

Publication number
BE861311A
BE861311A BE183021A BE183021A BE861311A BE 861311 A BE861311 A BE 861311A BE 183021 A BE183021 A BE 183021A BE 183021 A BE183021 A BE 183021A BE 861311 A BE861311 A BE 861311A
Authority
BE
Belgium
Prior art keywords
plasmatic
semiconductors
manufacture
attack process
attack
Prior art date
Application number
BE183021A
Other languages
French (fr)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of BE861311A publication Critical patent/BE861311A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
BE183021A 1976-11-29 1977-11-29 PLASMATIC ATTACK PROCESS, ESPECIALLY FOR THE MANUFACTURE OF SEMICONDUCTORS BE861311A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762654083 DE2654083A1 (en) 1976-11-29 1976-11-29 PLASMA ETCHING

Publications (1)

Publication Number Publication Date
BE861311A true BE861311A (en) 1978-03-16

Family

ID=5994209

Family Applications (1)

Application Number Title Priority Date Filing Date
BE183021A BE861311A (en) 1976-11-29 1977-11-29 PLASMATIC ATTACK PROCESS, ESPECIALLY FOR THE MANUFACTURE OF SEMICONDUCTORS

Country Status (5)

Country Link
JP (1) JPS5368642A (en)
BE (1) BE861311A (en)
DE (1) DE2654083A1 (en)
FR (1) FR2372571A1 (en)
IT (1) IT1089040B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6025233A (en) * 1983-07-22 1985-02-08 Fujitsu Ltd Vacuum process
AT386316B (en) * 1985-11-11 1988-08-10 Voest Alpine Ag Plasma reactor for etching printed circuit boards (printed equipment cards)
US4711197A (en) * 1986-10-16 1987-12-08 Thermco Systems, Inc. Gas scavenger

Also Published As

Publication number Publication date
DE2654083A1 (en) 1978-06-01
FR2372571A1 (en) 1978-06-23
JPS5368642A (en) 1978-06-19
IT1089040B (en) 1985-06-10

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