BE853997A - POLYCRYSTALLINE SILICON DEPOSIT PROCESS - Google Patents

POLYCRYSTALLINE SILICON DEPOSIT PROCESS

Info

Publication number
BE853997A
BE853997A BE177052A BE177052A BE853997A BE 853997 A BE853997 A BE 853997A BE 177052 A BE177052 A BE 177052A BE 177052 A BE177052 A BE 177052A BE 853997 A BE853997 A BE 853997A
Authority
BE
Belgium
Prior art keywords
polycrystalline silicon
deposit process
silicon deposit
polycrystalline
silicon
Prior art date
Application number
BE177052A
Other languages
French (fr)
Original Assignee
Wacker Chemitronic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemitronic filed Critical Wacker Chemitronic
Publication of BE853997A publication Critical patent/BE853997A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
BE177052A 1976-04-27 1977-04-27 POLYCRYSTALLINE SILICON DEPOSIT PROCESS BE853997A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762618273 DE2618273C3 (en) 1976-04-27 1976-04-27 Process for the deposition of polycrystalline silicon

Publications (1)

Publication Number Publication Date
BE853997A true BE853997A (en) 1977-10-27

Family

ID=5976298

Family Applications (1)

Application Number Title Priority Date Filing Date
BE177052A BE853997A (en) 1976-04-27 1977-04-27 POLYCRYSTALLINE SILICON DEPOSIT PROCESS

Country Status (9)

Country Link
JP (1) JPS52155142A (en)
BE (1) BE853997A (en)
CA (1) CA1092905A (en)
DE (1) DE2618273C3 (en)
FR (1) FR2361304A1 (en)
GB (1) GB1569651A (en)
IT (1) IT1086646B (en)
NL (1) NL7702613A (en)
SE (1) SE7704805L (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354580A (en) * 1993-06-08 1994-10-11 Cvd Incorporated Triangular deposition chamber for a vapor deposition system
JP2008535758A (en) * 2005-04-10 2008-09-04 アールイーシー シリコン インコーポレイテッド Production of polycrystalline silicon

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1391792A (en) * 1962-12-19 1965-03-12 Thomson Houston Comp Francaise Improvements to processes for forming a sheet material, in particular for pyrolytic graphite sheets
DE1272801B (en) * 1965-07-14 1968-07-11 Hitco Cardena Process for charring cellulosic fibrous material
DE2022025C3 (en) * 1970-05-05 1980-03-20 Siemens Ag, 1000 Berlin Und 8000 Muenchen Device for producing a hollow body from semiconductor material
GB1292534A (en) * 1970-06-04 1972-10-11 Pfizer Method for making a continuous film of pyrolytic graphite having bi-directional reinforcing properties
DE2229229A1 (en) * 1972-06-15 1974-01-10 Siemens Ag PROCESS FOR PRODUCING MOLDED BODIES FROM SILICON OR SILICON CARBIDE

Also Published As

Publication number Publication date
GB1569651A (en) 1980-06-18
JPS52155142A (en) 1977-12-23
JPS5635604B2 (en) 1981-08-18
DE2618273A1 (en) 1977-11-03
DE2618273C3 (en) 1984-04-19
SE7704805L (en) 1977-10-28
IT1086646B (en) 1985-05-28
CA1092905A (en) 1981-01-06
FR2361304A1 (en) 1978-03-10
FR2361304B1 (en) 1981-01-09
NL7702613A (en) 1977-10-31
DE2618273B2 (en) 1978-11-09

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: WACKER-CHEMITRONIC GESELLSCHAFT FUR ELEKTRONIK-GR

Effective date: 19880430