BE832064A - METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - Google Patents

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Info

Publication number
BE832064A
BE832064A BE158891A BE158891A BE832064A BE 832064 A BE832064 A BE 832064A BE 158891 A BE158891 A BE 158891A BE 158891 A BE158891 A BE 158891A BE 832064 A BE832064 A BE 832064A
Authority
BE
Belgium
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Application number
BE158891A
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE832064A publication Critical patent/BE832064A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
    • H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
BE158891A 1974-08-02 1975-08-01 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE BE832064A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US49417874A 1974-08-02 1974-08-02

Publications (1)

Publication Number Publication Date
BE832064A true BE832064A (en) 1975-12-01

Family

ID=23963371

Family Applications (1)

Application Number Title Priority Date Filing Date
BE158891A BE832064A (en) 1974-08-02 1975-08-01 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Country Status (7)

Country Link
JP (1) JPS5140757A (en)
BE (1) BE832064A (en)
DE (1) DE2533550A1 (en)
FR (1) FR2280976A1 (en)
IN (1) IN140598B (en)
IT (1) IT1039690B (en)
SE (1) SE7508447L (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2435818A1 (en) * 1978-09-08 1980-04-04 Ibm France PROCESS FOR INCREASING THE INTERNAL TRAPPING EFFECT OF SEMICONDUCTOR BODIES

Also Published As

Publication number Publication date
JPS5140757A (en) 1976-04-05
IN140598B (en) 1976-12-04
FR2280976A1 (en) 1976-02-27
SE7508447L (en) 1976-02-03
IT1039690B (en) 1979-12-10
DE2533550A1 (en) 1976-02-19

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